公开(公告)号：US07049613B2

公开(公告)日：2006-05-23

申请号：US11006605

申请日：2004-12-08

申请人： Masaki Yanagisawa ,  Hiroshi Akiyama ,  Koji Matsuda ,  Hisataka Fujimaki

发明人： Masaki Yanagisawa ,  Hiroshi Akiyama ,  Koji Matsuda ,  Hisataka Fujimaki

IPC分类号： H05H9/00

CPC分类号： G21K1/10 ,  A61N1/44 ,  A61N2005/1087 ,  A61N2005/1095

摘要： A particle therapy system, as one example of a particle beam irradiation system, comprises a charged particle beam generator and an irradiation field forming apparatus. An ion beam from the charged particle beam generator is irradiated to a diseased part in the body of a patient through the irradiation field forming apparatus. A scattering compensator and a range modulation wheel (RMW) are disposed on the upstream side in a direction of beam advance and are movable along a beam axis. The movement of the scattering compensator and the RMW adjusts a size of the ion beam entering a scatterer device, whereby a change in scattering intensity of the ion beam in the scatterer device is adjusted. As a result, a penumbra in dose distribution is reduced and a more uniform dose distribution in a direction perpendicular to the direction of beam advance is obtained in the diseased part.

摘要翻译： 作为粒子束照射系统的一个实例的粒子治疗系统包括带电粒子束发生器和照射场形成装置。 来自带电粒子束发生器的离子束通过照射场形成装置照射到患者体内的患病部位。 散射补偿器和范围调制轮（RMW）沿光束前进的方向设置在上游侧，并且可以沿着光束轴线移动。 散射补偿器和RMW的移动调节进入散射体装置的离子束的尺寸，由此调节散射体装置中的离子束的散射强度的变化。 结果，减少了剂量分布的半暗影，并且在病变部分中获得了在垂直于光束前进方向的方向上更均匀的剂量分布。

公开(公告)号：US20060097204A1

公开(公告)日：2006-05-11

申请号：US11302131

申请日：2005-12-14

申请人： Masaki Yanagisawa ,  Hiroshi Akiyama ,  Koji Matsuda ,  Hisataka Fujimaki

发明人： Masaki Yanagisawa ,  Hiroshi Akiyama ,  Koji Matsuda ,  Hisataka Fujimaki

IPC分类号： H01J5/18

CPC分类号： A61N5/1042 ,  A61N2005/1087 ,  A61N2005/1095 ,  G21K1/10 ,  G21K5/04

摘要： The present invention provides an increased degree of uniformity of radiation dose distribution for the interior of a diseased part. A particle beam therapy system includes a charged particle beam generation apparatus and an irradiation apparatus. An ion beam is generated by the charged particle beam generation apparatus. The irradiation apparatus exposes a diseased part to the generated ion beam. A scattering device, a range adjustment device, and a Bragg peak spreading device are installed upstream of a first scanning magnet and a second scanning magnet. The scattering device and the range adjustment device are combined together and moved along a beam axis, whereas the Bragg peak spreading device is moved independently along the beam axis. The scattering device moves to adjust the degree of ion beam scattering. The range adjustment device moves to adjust ion beam scatter changes caused by an absorber thickness adjustment. The Bragg peak spreading device moves to adjust ion beam scatter changes arising out of an SOBP device. These adjustments provide uniformity of radiation dose distribution for the diseased part.

公开(公告)号：US20060027766A1

公开(公告)日：2006-02-09

申请号：US11236621

申请日：2005-09-28

申请人： Koji Matsuda ,  Takahide Nakayama

发明人： Koji Matsuda ,  Takahide Nakayama

IPC分类号： G21F5/02

CPC分类号： H05H7/10 ,  A61N5/1043 ,  A61N5/1044 ,  A61N2005/1087 ,  G21K1/08 ,  G21K5/04 ,  H05H7/04

摘要： A particle beam irradiation apparatus includes a synchrotron, two scanning electromagnets, an beam delivery apparatus for outputting an ion beam extracted from the synchrotron, and an accelerator and transport system controller, and a scanning controller. These controllers stop the output of the ion beam from the beam delivery apparatus; in a state where the output of the ion beam is stopped, change the irradiation position of the ion beam by controlling the scanning electromagnets; and after this change, control the scanning electromagnets to start the output of the ion beam from the beam delivery apparatus and to perform irradiations of the ion beam to at least one irradiation position a plurality of times based on treatment planning information.

公开(公告)号：US20050205806A1

公开(公告)日：2005-09-22

申请号：US11128195

申请日：2005-05-13

申请人： Masahiro Tadokoro ,  Shunji Kakiuchi ,  Hiroshi Akiyama ,  Mamoru Katane ,  Koji Matsuda

发明人： Masahiro Tadokoro ,  Shunji Kakiuchi ,  Hiroshi Akiyama ,  Mamoru Katane ,  Koji Matsuda

IPC分类号： G21K1/02 ,  A61N5/10 ,  G21K5/04 ,  H05H7/10 ,  H05H13/04 ,  G21K5/10 ,  A61N5/00 ,  H05H3/02

CPC分类号： A61N5/1048 ,  A61N5/1075 ,  A61N2005/1074 ,  A61N2005/1087 ,  A61N2005/1095 ,  G21K5/04

摘要： A particle therapy system capable of measuring energy of a charged particle beam even during irradiation of the charged particle beam is provided. A beam delivery (irradiation) system comprises a block collimator constituted by a pair of collimator members, and an energy detector mounted to one of the collimator members to be disposed on the upstream side thereof. When the pair of collimator members are moved in directions away from each other, a beam passage is formed between them. The energy detector constitutes an energy measuring device together with a signal processing unit. A part of the ion beam having reached the interior of the irradiation nozzle is irradiated to a patient through the beam passage. When a part of the remaining ion beam enters the energy detector, electric charges generate in the energy detector. The signal processing unit determines energy of the ion beam based on a position within the energy detector at which electric charges have generated in maximum amount.

摘要翻译： 提供了即使在带电粒子束的照射期间也能够测量带电粒子束的能量的粒子治疗系统。 射束（照射）系统包括由一对准直器构件构成的块准直器，以及安装在准备器件中的一个待设置在其上游侧的能量检测器。 当一对准直器构件沿彼此远离的方向移动时，在它们之间形成梁通道。 能量检测器与信号处理单元一起构成能量测量装置。 已经到达照射喷嘴内部的离子束的一部分通过束通道照射到患者身上。 当剩余离子束的一部分进入能量检测器时，在能量检测器中产生电荷。 信号处理单元基于能量检测器内以最大量产生电荷的位置来确定离子束的能量。

公开(公告)号：US20050127306A1

公开(公告)日：2005-06-16

申请号：US11006605

申请日：2004-12-08

申请人： Masaki Yanagisawa ,  Hiroshi Akiyama ,  Koji Matsuda ,  Hisataka Fujimaki

发明人： Masaki Yanagisawa ,  Hiroshi Akiyama ,  Koji Matsuda ,  Hisataka Fujimaki

IPC分类号： G21K3/00 ,  A23L5/30 ,  A61N1/44 ,  A61N5/00 ,  A61N5/10 ,  G21K1/10 ,  G21K5/04 ,  G21K5/10 ,  G21G5/00

CPC分类号： G21K1/10 ,  A61N1/44 ,  A61N2005/1087 ,  A61N2005/1095

摘要： A particle therapy system, as one example of a particle beam irradiation system, comprises a charged particle beam generator and an irradiation field forming apparatus. An ion beam from the charged particle beam generator is irradiated to a diseased part in the body of a patient through the irradiation field forming apparatus. A scattering compensator and a range modulation wheel (RMW) are disposed on the upstream side in a direction of beam advance and are movable along a beam axis. The movement of the scattering compensator and the RMW adjusts a size of the ion beam entering a scatterer device, whereby a change in scattering intensity of the ion beam in the scatterer device is adjusted. As a result, a penumbra in dose distribution is reduced and a more uniform dose distribution in a direction perpendicular to the direction of beam advance is obtained in the diseased part.

摘要翻译： 作为粒子束照射系统的一个实例的粒子治疗系统包括带电粒子束发生器和照射场形成装置。 来自带电粒子束发生器的离子束通过照射场形成装置照射到患者体内的患病部位。 散射补偿器和范围调制轮（RMW）沿光束前进的方向设置在上游侧，并且可以沿着光束轴线移动。 散射补偿器和RMW的移动调节进入散射体装置的离子束的尺寸，由此调节散射体装置中的离子束的散射强度的变化。 结果，减少了剂量分布的半暗影，并且在病变部分中获得了在垂直于光束前进方向的方向上更均匀的剂量分布。

公开(公告)号：US20050051740A1

公开(公告)日：2005-03-10

申请号：US10917458

申请日：2004-08-13

申请人： Masaki Yanagisawa ,  Hiroshi Akiyama ,  Koji Matsuda ,  Hisataka Fujimaki

发明人： Masaki Yanagisawa ,  Hiroshi Akiyama ,  Koji Matsuda ,  Hisataka Fujimaki

IPC分类号： A61N5/10 ,  G21G5/00

CPC分类号： G21K1/10 ,  A61N2005/1087 ,  A61N2005/1095 ,  G21K1/043

摘要： The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target includes an RMW device. The RMW device comprises a housing and an RMW disposed within the housing. A rotary shaft of the RMW is rotatably mounted to the housing. The RMW device is detachably installed in an RMW holding member provided in a casing of the irradiation filed forming apparatus. The housing can be placed in contact with the RMW holding member, and hence positioning of the rotary shaft of the RMW to a predetermined position can be performed in a short time. This contributes to cutting a time required for treatment per patient and increasing the number of patients treated.

摘要翻译： 本发明提供一种能够增加治疗患者数量的带电粒子治疗系统。 用于将从带电粒子束发生器提取的带电粒子束照射到照射目标的照射成像装置包括RMW装置。 RMW装置包括壳体和设置在壳体内的RMW。 RMW的旋转轴可旋转地安装在壳体上。 RMW装置可拆卸地安装在设置在照射区域形成装置的壳体中的RMW保持构件中。 壳体可以放置成与RMW保持构件接触，因此可以在短时间内将RMW的旋转轴定位到预定位置。 这有助于减少患者治疗所需的时间并增加治疗患者的数量。

公开(公告)号：US20050024630A1

公开(公告)日：2005-02-03

申请号：US10833038

申请日：2004-04-28

申请人： Toshiki Ohno ,  Hirotoshi Ise ,  Masato Toyota ,  Toshio Komemura ,  Hidefumi Sakita ,  Suekazu Nakashima ,  Koji Matsuda

发明人： Toshiki Ohno ,  Hirotoshi Ise ,  Masato Toyota ,  Toshio Komemura ,  Hidefumi Sakita ,  Suekazu Nakashima ,  Koji Matsuda

IPC分类号： G01B11/00 ,  G01N21/89 ,  G01N21/95 ,  H01L21/66 ,  G01N21/88

CPC分类号： G01N21/9503

摘要： A device for examining an end part according to the present invention includes a light projecting portion, a light receiving portion, a displacement sensor amplifier, and a data processing apparatus. The light projecting portion projects light on the end part of a semiconductor wafer. The light receiving portion receives specular reflected light reflected from the end part of the semiconductor wafer. The displacement sensor amplifier and the data processing apparatus calculate the displacement amount of the end part of the semiconductor wafer by a change in the distribution of the quantity of the specular reflected light received by the light receiving portion. Thus, the device for examining an end part can be reduced in size and simplified. Additionally, the device for examining an end part can be obtained, with which a change of the material of the end part of a measurement target is hardly detected as defects falsely.

摘要翻译： 根据本发明的用于检查端部的装置包括光投射部分，光接收部分，位移传感器放大器和数据处理装置。 光投射部分在半导体晶片的端部上投射光。 光接收部分接收从半导体晶片的端部反射的镜面反射光。 位移传感器放大器和数据处理装置通过光接收部分接收的镜面反射光量的分布变化来计算半导体晶片的端部的位移量。 因此，用于检查端部的装置可以减小尺寸并简化。 此外，可以获得用于检查端部的装置，由此几乎不能将测量对象的端部的材料的变化几乎不被错误地检测为缺陷。

公开(公告)号：US06498276B2

公开(公告)日：2002-12-24

申请号：US10066727

申请日：2002-02-06

申请人： Koji Matsuda ,  Katsuyoshi Hara ,  Minoru Akamatsu

发明人： Koji Matsuda ,  Katsuyoshi Hara ,  Minoru Akamatsu

IPC分类号： C07D26332

CPC分类号： C07D263/32

摘要： The present invention relates to a method for producing a compound of the formula [71] wherein R1 is an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted heterocyclic group, R2 is a lower alkyl or a halogenated lower alkyl and R3 is a halogen atom or a hydrogen atom. The method of the present invention includes reacting compound [1] with thionyl chloride to give compound [2] and obtaining the objective compound [7] at a high yield via intermediate [5], and is utilizable for industrial production.

摘要翻译： 本发明涉及制备式[71]化合物的方法，其中R 1为任选取代的环烷基，任选取代的芳基或任选取代的杂环基，R 2为低级烷基或卤代低级烷基，R 3 是卤素原子或氢原子。 本发明的方法包括使化合物[1]与亚硫酰氯反应，得到化合物[2]，通过中间体[5]以高收率得到目标化合物[7]，可用于工业生产。

公开(公告)号：US6018049A

公开(公告)日：2000-01-25

申请号：US319704

申请日：1999-06-10

申请人： Makoto Hajima ,  Yoshiyuki Takeuchi ,  Koji Matsuda

发明人： Makoto Hajima ,  Yoshiyuki Takeuchi ,  Koji Matsuda

IPC分类号： C07D233/84 ,  C07D401/06

CPC分类号： C07D233/84

摘要： The present invention provides a process for the preparation of a compound of the formula (III): ##STR1## wherein R.sup.1 is an optionally substituted alkyl or an optionally substituted aryl; R.sup.2 is an optionally substituted alkyl: R.sup.3 is an optionally substituted alkyl, an optionally substituted alkenyl, an optionally substituted aralkyl, or an optionally substituted heteroarylalkyl; and n is an integer of 1-3,which comprises reacting a compound of the formula (I): ##STR2## wherein R.sup.1, R.sup.2, and n are as defined above, with a compound of the formula (II):R.sup.3 OH (II)wherein R.sup.3 is as defined above, in the presence of phosphine and either of dialkyl azodicarboxylate and tetraalkyl azodicarboxamide.

摘要翻译： PCT No.PCT / JP97 / 04706 Sec。 371日期1999年6月10日第 102（e）1999年6月10日PCT 1997年12月19日PCT公布。 公开号WO98 / 29394 日期：1998年7月9日本发明提供制备式（III）化合物的方法：其中R 1为任选取代的烷基或任选取代的芳基; R2是任选取代的烷基：R 3是任选取代的烷基，任选取代的烯基，任选取代的芳烷基或任选取代的杂芳基烷基; 并且n是1-3的整数，其包括使式（I）化合物：其中R 1，R 2和n如上所定义，与式（II）化合物反应：其中R 3 在磷化氢和偶氮二羧酸二烷基酯和四烷基偶氮二甲酰胺的存在下，如上所定义。