公开(公告)号：US20110170092A1

公开(公告)日：2011-07-14

申请号：US13069091

申请日：2011-03-22

申请人： Sachio UTO ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

发明人： Sachio UTO ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

IPC分类号： G01N21/956

CPC分类号： G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/151 ,  G01N2021/95615 ,  G01N2201/06113 ,  G01N2201/1035

摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.

摘要翻译： 用于检查缺陷的方法和装置包括从紫外光源发射紫外光，用受紫外光的偏振条件的紫外线照射样本，控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。 紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

公开(公告)号：US07528942B2

公开(公告)日：2009-05-05

申请号：US11472426

申请日：2006-06-22

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括：载置基板试样的载台部分，其可以在XYZ-θ方向中任意移动;照射系统，用于利用来自倾斜方向的光照射电路图案;以及图像形成 光学系统，用于从上下方向在检测器上形成照射的检测区域的图像。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US20080068593A1

公开(公告)日：2008-03-20

申请号：US11853050

申请日：2007-09-11

申请人： HIROYUKI NAKANO ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Taketo Ueno

发明人： HIROYUKI NAKANO ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Taketo Ueno

IPC分类号： G01N21/00

CPC分类号： G01N21/95623 ,  G01N21/21 ,  G01N21/95607 ,  G01N2201/0655

摘要： A defect detecting apparatus for detecting defects on a substrate sample (wafer) having circuit patterns such as interconnections. The defect detecting apparatus is provided with stages that can be moved arbitrarily in each of the X, Y, Z, and θ directions in a state that the substrate sample is mounted thereon, an illumination optical system for illuminating the circuit patterns from one or plural directions, and a detection optical system for detecting reflection light, diffraction light, or scattered light coming from an inspection region being illuminated through almost the entire hemispherical surface having the substrate sample as the bottom surface. The NA (numerical aperture) thereby falls within a range of 0.7 to 1.0. Harmful defects or foreign substances can be detected so as to be separated from non-defects such as surface roughness of interconnections.

摘要翻译： 一种用于检测具有诸如互连之类的电路图案的衬底样品（晶片）上的缺陷的缺陷检测装置。 该缺陷检测装置设置有可以在其上安装衬底样品的状态下在X，Y，Z和θ方向中的任一个中任意移动的阶段，用于从一个或多个照明电路图案的照明光学系统 方向，以及用于检测来自检查区域的反射光，衍射光或散射光的检测光学系统，该检查区域被基底样品的几乎整个半球形表面照射作为底面。 NA（数值孔径）因此落在0.7至1.0的范围内。 可以检测有害的缺陷或异物，以便与诸如互连的表面粗糙度的无缺陷分离。

公开(公告)号：US07217573B1

公开(公告)日：2007-05-15

申请号：US09678652

申请日：2000-10-04

申请人： Yoshitada Oshida ,  Toshihiko Nakata ,  Tomoaki Sakata ,  Kenji Yasuda ,  Satoshi Takahashi

发明人： Yoshitada Oshida ,  Toshihiko Nakata ,  Tomoaki Sakata ,  Kenji Yasuda ,  Satoshi Takahashi

IPC分类号： G01N33/00 ,  G01N33/53 ,  C12Q1/68 ,  C12M3/00 ,  C07H21/04 ,  H01J3/14

CPC分类号： G01N21/6428 ,  G01N21/6452 ,  G01N21/6456 ,  Y10S436/80 ,  Y10T436/143333

摘要： A method of inspecting a DNA chip and an apparatus therefor that allow a picture to be reconstructed in the following steps: A plurality of irradiation spots are formed on a DNA probe array mounted on a stage. Then, the stage is displaced in X, Y directions so as to execute a scanning, thereby irradiating substantially all the entire surface of the DNA probe array. Next, a plurality of emitted fluorescent lights, which are generated from the plurality of irradiation spot portions on the DNA probe array, are converged and are then detected simultaneously by multi detectors. Finally, a data processing apparatus processes the detected signals, thereby reconstructing the picture.

摘要翻译： 一种用于检查DNA芯片的方法及其装置，其允许以下列步骤重建图像：在安装在平台上的DNA探针阵列上形成多个照射点。 然后，在X，Y方向上移位台，以进行扫描，从而基本上照射DNA探针阵列的整个表面。 接下来，从DNA探针阵列上的多个照射点部分产生的多个发射荧光灯被会聚，然后由多个检测器同时检测。 最后，数据处理装置处理检测到的信号，从而重建图像。

公开(公告)号：US20070041410A1

公开(公告)日：2007-02-22

申请号：US11588387

申请日：2006-10-27

申请人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

发明人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

IPC分类号： H01S3/10 ,  G02B27/10

CPC分类号： H01L21/02683 ,  H01L21/0268 ,  H01L21/02691 ,  H01L21/2026 ,  H01L21/268 ,  H01L27/1285 ,  H01L29/04 ,  H01L29/66757

摘要： Apparatus for fabricating a display device includes a stage capable of mounting an insulating substrate of the display device and moving the insulating substrate, linear scales which detect a position or moving distance of the substrate, a laser oscillator which generates continuous-waves laser light, a modulator which turns ON/OFF the continuous-wave laser light, a beam forming optic which shapes the continuous-wave laser light passing through the modulator into a linear or rectangular form, an objective lens which projects the at least one of the laser light on the insulating substrate so as to irradiate the insulating substrate with the laser light. The controller counts signals generated by the linear scales for every movement of the stage for a given distance, causes the modulator to turn the generated continuous-wave laser light in an ON state at time when a position of the insulating substrate on which the laser light irradiation is to be started reaches an area on which the laser light is projected, and causes the modulator to turn the generated continuous-wave laser light in an OFF state at another time.

摘要翻译： 用于制造显示装置的装置包括能够安装显示装置的绝缘基板并移动绝缘基板的台，检测基板的位置或移动距离的线性标尺，产生连续波激光的激光振荡器， 将连续波激光切换为ON / OFF的调制器，将通过调制器的连续波激光成形为直线或矩形的光束形成光学器件，将至少一个激光投射到的物镜 绝缘基板，以激光照射绝缘基板。 控制器对于给定距离的级的每次移动来对由线性标尺产生的信号进行计数，使得调制器将产生的连续波激光在其上的激光的绝缘基板的位置处于接通状态 照射开始到达投射激光的区域，并且使得调制器在另一时间将所产生的连续波激光转为OFF状态。

公开(公告)号：US06943876B2

公开(公告)日：2005-09-13

申请号：US10223423

申请日：2002-08-20

申请人： Minoru Yoshida ,  Sachio Uto ,  Shunji Maeda ,  Toshihiko Nakata

发明人： Minoru Yoshida ,  Sachio Uto ,  Shunji Maeda ,  Toshihiko Nakata

IPC分类号： G01B11/30 ,  G01N21/956 ,  H01L21/66 ,  G02N21/88

CPC分类号： G01N21/95684

摘要： A method and apparatus for detecting pattern defects which includes annularly scanning of a laser beam emitted from a laser light source on a pupil of an objective lens, illuminating the scanned laser beam, through the objective lens, onto a sample on which there is formed a pattern coated with an optically transparent thin film, acquiring an optical image of the illuminated sample, and processing the acquired image to find defects in the pattern. The annular scan diameter of the laser beam is determined based on the thickness of the optically transparent thin film.

摘要翻译： 一种用于检测图案缺陷的方法和装置，其包括从物镜的瞳孔上的激光光源发射的激光束的环状扫描，将扫描的激光束通过物镜照射到其上形成有 涂覆有光学透明薄膜的图案，获取照射样品的光学图像，以及处理所获取的图像以发现图案中的缺陷。 基于光学透明薄膜的厚度确定激光束的环形扫描直径。

公开(公告)号：US06825437B2

公开(公告)日：2004-11-30

申请号：US10231267

申请日：2002-08-30

申请人： Hiroyuki Nakano ,  Takeshi Arai ,  Toshihiko Nakata

发明人： Hiroyuki Nakano ,  Takeshi Arai ,  Toshihiko Nakata

IPC分类号： B23K1000

CPC分类号： G01N21/51 ,  G01N21/94 ,  H01J2237/0225

摘要： When determining the presence of foreign particles in a processing chamber by radiating a laser beam inside a processing chamber and detecting scattered light from foreign particles within the processing chamber, the detection of scattered light is performed using a detecting lens having a wide field angle and deep focal depth. Accordingly, the detection of foreign particles floating in the processing chamber can be performed across a wide range, and with uniform sensitivity, with a detecting optical system having a simple constitution.

摘要翻译： 当通过在处理室内辐射激光束并且检测处理室内的异物的散射光来确定处理室中外来颗粒的存在时，使用具有宽场角和深度的检测透镜来执行散射光的检测 焦点深度 因此，利用具有简单结构的检测光学系统，可以在宽范围内以及具有均匀灵敏度的方式对漂浮在处理室中的异物进行检测。

公开(公告)号：US06765201B2

公开(公告)日：2004-07-20

申请号：US09764457

申请日：2001-01-19

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

IPC分类号： G21K700

CPC分类号： G01N21/956 ,  G01N21/33 ,  G02F2001/3505 ,  G02F2001/3542 ,  H01S3/0092

摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.

摘要翻译： 一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗 并且在其中安装波长转换器装置，其中容器被气​​密密封，并在其中填充有惰性气体，例如氮气或氩气。

公开(公告)号：US06355570B1

公开(公告)日：2002-03-12

申请号：US09260074

申请日：1999-03-02

申请人： Toshihiko Nakata ,  Takanori Ninomiya ,  Sachio Uto ,  Hiroyuki Nakano

发明人： Toshihiko Nakata ,  Takanori Ninomiya ,  Sachio Uto ,  Hiroyuki Nakano

IPC分类号： H01L21302

CPC分类号： G01N21/53 ,  G01N21/94 ,  G01N21/9501

摘要： The present invention provides a semiconductor manufacturing method, a plasma processing method and a plasma processing apparatus for generating a plasma in a processing chamber and carrying out processing on material to be processed by using the plasma, comprising a floating-foreign-particle measuring apparatus including: a light radiating optical system for radiating a light having a desired wavelength and completing intensity modulation at a desired frequency to the processing chamber; a scattered-light detecting optical system for separating a component with the desired wavelength from scattered lights obtained from the processing chamber as a result of radiation of the light by the light radiating optical system, for optically receiving the component and for converting the component into a first signal; and a foreign-particle-signal extracting unit which separates a second signal representing foreign particle floating in the plasma or in an area in proximity to the plasma from a third signal obtained by emission of the plasma for detection of the second signal by extraction of a component with the desired frequency used for the intensity modulation from the first signal obtained from the scattered-light detecting optical system.

公开(公告)号：US5046847A

公开(公告)日：1991-09-10

申请号：US262573

申请日：1988-10-25

申请人： Toshihiko Nakata ,  Nobuyuki Akiyama ,  Yoshihiko Yamuchi ,  Mitsuyoshi Koizumi ,  Yoshimasa Oshima

发明人： Toshihiko Nakata ,  Nobuyuki Akiyama ,  Yoshihiko Yamuchi ,  Mitsuyoshi Koizumi ,  Yoshimasa Oshima

IPC分类号： G01N21/21 ,  G01N21/94 ,  G03F9/00

CPC分类号： G03F9/70 ,  G01N21/94 ,  G01N21/95623 ,  G01N2021/473 ,  G01N21/21

摘要： A method and apparatus for detecting foreign matter on a sample by illuminating a stripe-shaped region with linearly polarized light. Some of the light reflected by the sample is intercepted by a light intercepting stage, and the rest of the light reflected by the sample, which passes through the light intercepting stage is directed to a detecting optical system, to be detected by a photo-detector. The sample is illuminated obliquely at a predetermined angle with respect to a group of straight lines constituting a primary pattern on the sample. The angle is selected so that the diffraction light reflected by the group of straight lines does not enter the detecting optical system. A polarizing spatial filter using a liquid crystal element may be disposed in a predetermined restricted region in a spacial frequency region, or Fourier transformation plane, within the detecting optical system. The light scattered by the sample may further be separated in the detecting optical system into partial beams having different wave orientation characteristics, which characteristics are detected by a number of one-dimensional solid state imaging elements. The signals are processed by a driver, adder, and quantizer in synchronism with the one-dimensional solid state imaging elements.

摘要翻译： 一种通过用线性偏振光照射条形区域来检测样品上的异物的方法和装置。 由样品反射的一些光被遮光阶段遮挡，并且通过遮光台的由样品反射的其余光指向检测光学系统，由光检测器检测 。 样品相对于构成样品上的主要图案的一组直线以预定角度倾斜照射。 选择该角度使得由直线组反射的衍射光不进入检测光学系统。 使用液晶元件的偏振空间滤光片可以设置在检测光学系统内的空间频率区域或傅立叶变换平面的预定限制区域中。 由样本散射的光可以在检测光学系统中进一步分离成具有不同波取向特性的部分光束，该特征由多个一维固态成像元件检测。 信号由驱动器，加法器和量化器与一维固态成像元件同步处理。