Abstract:
The invention can provide a method of processing a substrate using Gate-Optimization processing sequences and evaluation libraries that can include gate-etch procedures, COR-etch procedures, and evaluation procedures.
Abstract:
The invention can provide a method of processing a substrate using Gate-Optimization processing sequences and evaluation libraries that can include gate-etch procedures, COR-etch procedures, and evaluation procedures.
Abstract:
The invention relates to controlling a semiconductor processing system. Among other things, the invention relates to a run-to-run controller to create virtual modules to control a multi-pass process performed by a multi-chamber tool during the processing of a semiconductor wafer.
Abstract:
A method for managing collected data in a semiconductor processing environment. The collected data can include: raw data collected during a process, trace file data received during a process, and process log file data received during a process. The raw data is synchronized with the trace file data and process log file data to create wafer data and summary data, and a file is created containing the wafer data and the summary data.
Abstract:
A method of processing a wafer is presented that includes creating a pre-processing measurement map using measured metrology data for the wafer including metrology data for at least one isolated structure on the wafer, metrology data for at least one nested structure on the wafer, bi-layer mask data, and BARC layer data. At least one pre-processing prediction map is calculated for the wafer. A pre-processing confidence map is calculated for the wafer. The pre-processing confidence map includes a set of confidence data for the plurality of dies on the wafer. A prioritized measurement site is determined when the confidence data for one or more dies is not within the confidence limits. A new measurement recipe that includes the prioritized measurement site is then created.
Abstract:
The invention relates to controlling a semiconductor processing system. Among other things, the invention relates to a run-to-run controller to create virtual modules to control a multi-pass process performed by a multi-chamber tool during the processing of a semiconductor wafer.
Abstract:
This method includes a method for etch processing that allows the bias between isolated and nested structures/features to be adjusted, correcting for a process wherein the isolated structures/features need to be smaller than the nested structures/features and wherein the nested structures/features need to be reduced relative to the isolated structures/features, while allowing for the critical control of trimming.
Abstract:
A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has a transfer opening located at the interface. An insulating plate is located on one of the first chamber and the second chamber at the interface and is configured to have a low thermal conductivity such that the first chamber and the second chamber can be independently controlled at different temperatures when the first chamber and the second chamber are coupled together. Additionally, the apparatus may include an alignment device and/or a fastening device for fastening the first chamber to the second chamber. In embodiments, the insulating plate may be constructed of Teflon. Further, the first chamber may be a chemical oxide removal treatment chamber and the second chamber may be a heat treatment chamber.
Abstract:
A method for managing data in a semiconductor processing environment. Raw data is collected during a process. Also, trace file data and process log file data are received. The raw data is synchronized with the trace file data and process log file data to create wafer data summary data is calculated from the raw data and a file is created containing the wafer data and the summary data.
Abstract:
A GUI is presented for configuring and initializing a semiconductor processing system, which includes a number of processing tools, a number of processing modules, a number of sensors, a number of processing models, and an alarm management system. The graphical display is organized so that all significant parameters are clearly and logically displayed so that the user is able to perform the desired configuration, initialization, and troubleshooting tasks with as little input as possible. The GUI is web-based and is viewable by a user using a web browser.