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公开(公告)号：US06134981A
公开(公告)日：2000-10-24
申请号：US454691
申请日：1999-12-03
CPC分类号： G03F7/707 , G03F7/70358 , G03F7/70716 , G03F7/70991 , G05G11/00 , Y10T74/20354 , Y10T74/20378
摘要： An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam. A cable follower stage moves in the Y direction on the follower stage and supports the cables connecting to the main stage, thereby reducing cable drag. An air circulation system is provided in the magnetic tracks on the follower stage to remove heat from operation of the electromagnetic motors. Air is removed from a central region of each track by a vacuum duct enhanced by air plugs fitting at the two ends of the motor coil assembly on the main stage to contain the air therein.
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公开(公告)号：US4514858A
公开(公告)日：1985-04-30
申请号：US475430
申请日：1983-03-15
申请人： W. Thomas Novak
发明人： W. Thomas Novak
CPC分类号： G03F7/70691 , B23Q1/36 , G03F9/7023 , G03F9/7049
摘要： A lithography system for X-ray or other beam printing on a substrate such as a silicon semiconductor wafer comprises a beam chamber (301), a beam source (302), means (309) for mounting a mask, means (308) for mounting an image sensing means (342) interiorly of the chamber, means (317, 318), for mounting a substrate (307) in multiple including six degrees of freedom and means (308, 292, 320-322) including the image sensing means to align the mask and substrate relative to one another utilizing alignment patterns on the mask and substrate, images of which are brought into registration and sensed by the image sensing means. In a preferred embodiment three sets of target images are provided so as to adjust the substrate and mask relative orientation in six degrees of freedom. The mask seals helium within the chamber. The mask and the substrate are aligned in situ in the same position in which the mask and substrate are to be exposed to the beam. Means (313, 314, 311, 312) are provided for loading masks, calibration assemblies and substrate-holding means. The source-to-substrate distance is adjustable as is the mask-to-substrate gap. To conserve helium volume adjustable optic objectives (342) are provided in the chamber to sense registration of alignment targets on each of the mask and substrate, with essentially the remainder of the optics outside the chamber. Improved compression optics (408) are also provided in the alignment system.
摘要翻译： 用于在诸如硅半导体晶片的衬底上进行X射线或其他光束印刷的光刻系统包括光束室（301），光束源（302），用于安装掩模的装置（309），用于安装的装置（308） 在室内部的图像感测装置（342），用于将包括六个自由度的多个基板（307）安装在一起的装置（317,318），以及包括图像感测装置的装置（308,292,320-322） 使用掩模和衬底上的对准图案相对于彼此对准掩模和衬底，其图像被图像感测装置对准和感测。 在优选实施例中，提供了三组目标图像，以便以六个自由度调节基底并掩盖相对取向。 面罩密封腔内的氦气。 掩模和基底在与掩模和基底要暴露于光束的相同位置中原位取向。 提供装置（313,314,311,312）用于加载掩模，校准组件和基板保持装置。 源到衬底的距离是可调整的，与掩模到衬底间隙一样。 为了保存氦体积可调节的光学物镜（342），设置在腔室中，以感测每个掩模和衬底上的对准靶的配准，基本上在腔室外部的光学器件的其余部分。 改进的压缩光学器件（408）也在对准系统中提供。
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公开(公告)号：US4376580A
公开(公告)日：1983-03-15
申请号：US239547
申请日：1981-03-02
申请人： W. Thomas Novak , David W. Volmer
发明人： W. Thomas Novak , David W. Volmer
CPC分类号： G03F9/70
摘要： A projection aligner is provided wherein the image position can be shifted by employing a bending mirror which makes a slight change in the magnification.
摘要翻译： 提供了一种投影对准器，其中可以通过使用稍微改变放大率的弯曲镜来移动图像位置。
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