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公开(公告)号：US08767172B2
公开(公告)日：2014-07-01
申请号：US12926159
申请日：2010-10-28
申请人： Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
发明人： Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70808 , G03F7/70833 , G03F7/70891
摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.
摘要翻译： 投影光学装置包括投影图案的投影光学系统，附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。 联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。 投影光学装置可以包括框架，每个联接构件的一端被附接到框架，使得投影光学系统经由支撑构件和联接构件从框架悬挂。 投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。
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公开(公告)号：US08705001B2
公开(公告)日：2014-04-22
申请号：US12923717
申请日：2010-10-05
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. A liquid retaining member is replaced with a table member that holds the substrate at an opposite position to the projection system while the liquid is maintained in contact with the projection system so as to transit from a first state to a second state, the first state in which the liquid is maintained between the projection system and the liquid retaining member, the second state in which the liquid is maintained between the projection system and the table member.
摘要翻译： 将浸没液体供应到投影系统和基板之间的空间，并且使用投影系统将图案化的辐射束通过液体投射到基板的目标部分上。 液体保持构件被替换为将基板保持在与投影系统相对的位置的台面构件，同时液体保持与投影系统接触以便从第一状态转移到第二状态， 液体保持在投影系统和液体保持构件之间的液体保持在投影系统和台面构件之间的第二状态。
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公开(公告)号：US08027027B2
公开(公告)日：2011-09-27
申请号：US11785716
申请日：2007-04-19
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A lithographic projection apparatus includes a substrate table that holds a substrate, a projection system that projects a patterned beam of radiation onto the substrate, and a liquid confinement structure that confines a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.
摘要翻译： 光刻投影装置包括：保持基板的基板台，将图案化的辐射束投影到基板上的投影系统，以及将液体限制在投影系统和基板之间的空间中的液体限制结构， 衬底台或两者，以形成空间的边界的一部分。 此外，当基本上不干扰液体，液体限制结构或两者时，闭合板形成空间的边界的一部分来代替基板，基板台或两者。
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公开(公告)号：US07812925B2
公开(公告)日：2010-10-12
申请号：US11339683
申请日：2006-01-26
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.
摘要翻译： 光刻投影设备包括调节辐射束的照明系统，保持图案形成装置的支撑结构，图案形成装置能够赋予辐射束图案。 保持衬底的衬底台，以及将图案化的辐射束投影到衬底的目标部分上的投影系统。 此外，液体供应系统向投影系统和基板之间的空间提供液体，液体供应系统具有一个构件。 液体密封装置在构件和衬底之间形成液体密封。
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公开(公告)号：US20100164326A1
公开(公告)日：2010-07-01
申请号：US12654546
申请日：2009-12-22
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
摘要： A motor device includes a rotor, a transmission member wound around at least a portion of an outer periphery of the rotor, a moving part connected to the transmission member to move the transmission member, and a control unit which makes the moving part perform the driving operation of moving the transmission member by a predetermined distance in a state where a torque transmission state is brought between the rotor and the transmission member, and the returning operation of returning the transmission member to a predetermined position in a state where the torque transmission state is released.
摘要翻译： 电动机装置包括转子，绕转子的外周的至少一部分卷绕的传动部件，连接到传动部件以移动传动部件的移动部件，以及使运动部件进行驱动的控制部 在转子和传动部件之间转矩传递状态的状态下使传动部件移动预定距离的动作，以及在转矩传递状态为 释放
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公开(公告)号：US20090190112A1
公开(公告)日：2009-07-30
申请号：US12382807
申请日：2009-03-24
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/32
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.
摘要翻译： 光刻投影设备包括调节辐射束的照明系统，保持图案形成装置的支撑结构，图案形成装置能够赋予辐射束图案。 保持衬底的衬底台，以及将图案化的辐射束投影到衬底的目标部分上的投影系统。 此外，液体供应系统向投影系统和基板之间的空间提供液体，液体供应系统具有一个构件。 液体密封装置在构件和衬底之间形成液体密封。
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7.发明申请Utility transfer apparatus, stage apparatus, exposure apparatus, and device manufacturing method 审中-公开实用转移装置，舞台装置，曝光装置和装置制造方法公开(公告)号：US20070095739A1
公开(公告)日：2007-05-03
申请号：US11584633
申请日：2006-10-23
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
摘要： A utility transfer apparatus includes: a magnetic member being secured to a first member; a first coil provided on the first member and wound on the magnetic member; and a second coil provided on a second member and wound on the magnetic member so that the second member is movable relative to the first member. The magnetic member forms a magnetic circuit that does not have an air gap.
摘要翻译： 一种公用事业转移装置，包括：磁性部件固定于第一部件; 设置在第一构件上并缠绕在磁性构件上的第一线圈; 以及设置在第二构件上并缠绕在磁性构件上的第二线圈，使得第二构件相对于第一构件是可移动的。 磁性部件形成不具有气隙的磁路。
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公开(公告)号：US20070064214A1
公开(公告)日：2007-03-22
申请号：US11602371
申请日：2006-11-21
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/58
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a table on which the substrate is mounted and that can move two-dimensionally while holding the substrate. The exposure apparatus also includes a hydrostatic bearing unit arranged on an image plane side of the projection optical system. The hydrostatic bearing unit includes at least one hydrostatic bearing that supplies liquid in a space between a bearing surface facing the substrate mounted on the table and the substrate so as to maintain the distance between the bearing surface and the surface of the substrate by static pressure of the liquid.
摘要翻译： 曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。 曝光装置包括安装基板并且可以在保持基板的同时二维地移动的工作台。 曝光装置还包括设置在投影光学系统的像面侧的静液压轴承单元。 静压轴承单元包括至少一个静压轴承，其在面向安装在工作台上的基板的支承面与基板之间的空间中供应液体，以便通过静态压力保持轴承表面和基板表面之间的距离 液体。
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公开(公告)号：US06969966B2
公开(公告)日：2005-11-29
申请号：US10974787
申请日：2004-10-28
申请人： Akimitsu Ebihara , Thomas Novak
发明人： Akimitsu Ebihara , Thomas Novak
IPC分类号： B64C17/06 , G03B27/42 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70766 , G03F7/20 , G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/709 , G03F7/70991 , G03F9/00 , Y10S414/135 , Y10S414/136
摘要： In a scanning exposure method, a mask stage that holds a mask is moved in a scanning direction by a first electromagnetic driver having a first portion coupled to the mask stage, and a second portion. A position of the mask stage is detected by a position detector that cooperates with a reflective portion of the mask stage that is positioned along the scanning direction. A counter weight having a bearing and at least one beam extending along the scanning direction moves in a direction opposite to a movement direction of the mask stage in response to a reaction force generated by movement of the mask stage by the first electromagnetic driver. The counter weight preferably is heavier than the mask stage, and a length of the at least one beam along the scanning direction preferably is longer than a length of the reflective portion along the scanning direction.
摘要翻译： 在扫描曝光方法中，保持掩模的掩模台通过具有耦合到掩模台的第一部分的第一电磁驱动器和第二部分在扫描方向上移动。 通过与沿扫描方向定位的掩模台的反射部分配合的位置检测器来检测掩模台的位置。 具有轴承和沿着扫描方向延伸的至少一个光束的配重响应于由第一电磁驱动器通过掩模台的移动产生的反作用力而沿与掩模台的移动方向相反的方向移动。 所述配重优选地比所述掩模台重，并且沿所述扫描方向的所述至少一个光束的长度优选地比所述反射部分沿着所述扫描方向的长度长。
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公开(公告)号：US20050088133A1
公开(公告)日：2005-04-28
申请号：US10986958
申请日：2004-11-15
申请人： Akimitsu Ebihara , Thomas Novak
发明人： Akimitsu Ebihara , Thomas Novak
CPC分类号： G03F7/70766 , G03F7/20 , G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/709 , G03F7/70991 , G03F9/00 , Y10S414/135 , Y10S414/136
摘要： A scanning exposure method moves a mask stage in a scanning direction by a driver having a first portion coupled to the mask stage, which includes a reflective portion positioned along the scanning direction. A counter weight having at least one beam extending along the scanning direction, moves in a direction opposite to the mask stage in response to a reaction force generated by movement of the mask stage by the driver. The at least one beam of the counter weight is coupled to a second portion of the driver. The counter weight is movably supported via a first bearing by a base member. The movement of the counter weight is guided in the scanning direction via a second bearing by a guide mounted on the base member and extending along the scanning direction. A length of the guide is longer than a length of the reflective portion.
摘要翻译： 扫描曝光方法通过具有耦合到掩模台的第一部分的驱动器在扫描方向上移动掩模台，该驱动器包括沿着扫描方向定位的反射部分。 具有沿着扫描方向延伸的至少一个光束的配重响应于由驱动器通过掩模台的移动产生的反作用力而沿与掩模台相反的方向移动。 所述计重器的所述至少一个梁联接到所述驾驶员的第二部分。 配重通过第一轴承由基座构件可移动地支撑。 平衡重的运动通过安装在基座上并沿着扫描方向延伸的导轨经由第二轴承在扫描方向上被引导。 引导件的长度比反射部分的长度长。
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