公开(公告)号：US4828392A

公开(公告)日：1989-05-09

申请号：US837766

申请日：1986-03-10

申请人： Noboru Nomura ,  Kazuhiro Yamashita ,  Takayoshi Matsumura ,  Midori Yamaguchi

发明人： Noboru Nomura ,  Kazuhiro Yamashita ,  Takayoshi Matsumura ,  Midori Yamaguchi

IPC分类号： G03F9/00

CPC分类号： G03F9/7049 ,  G03F9/7076

摘要： A reduction projection type alignment and exposure apparatus which comprises a light source, a reticle having a first grating, first lens system, a spatial filter disposed around a Fourier spectral plane of the first lens system, second lens system, a substrate having a second grating, and a plurality of photo-detectors for detecting light intensities of a plurality of spectrums appearing on the spatial filter.The light beam generated from the light source is applied to the reticle at which it is divided into a plurality of diffracted light beams by the first grating, and the diffracted light beams are applied through the first lens system, the spatial filter and the second lens system onto the substrate so that the diffracted light beams are re-diffracted by the second grating, and the re-diffracted light beams appear as a plurality of spectrums on the spatial filter. These spectrums are detected by photo-detectors and used for alignment of the reticle and the substrate.

摘要翻译： 一种还原投影型取向曝光装置，包括光源，具有第一光栅的掩模版，第一透镜系统，设置在第一透镜系统的傅立叶光谱平面附近的空间滤光器，第二透镜系统，具有第二光栅的基板 以及用于检测出现在空间滤波器上的多个光谱的光强度的多个光检测器。 从光源产生的光束被施加到光掩模，在该掩模版处，由第一光栅将其分成多个衍射光束，衍射光束通过第一透镜系统，空间滤光器和第二透镜 系统到基板上，使得衍射光束被第二光栅重衍射，并且再衍射光束在空间滤光器上表现为多个光谱。 这些光谱由光电检测器检测并用于对准标线片和基板。

公开(公告)号：US4757354A

公开(公告)日：1988-07-12

申请号：US43620

申请日：1987-04-28

申请人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atsushi Ueno ,  Shotaro Yoshida

发明人： Takeo Sato ,  Nobuhiro Araki ,  Koichi Kawata ,  Noboru Nomura ,  Atsushi Ueno ,  Shotaro Yoshida

IPC分类号： G02B17/08 ,  G03F7/20 ,  G03B27/42 ,  G02B17/00

CPC分类号： G02B17/0852 ,  G02B17/0808 ,  G02B17/0892 ,  G03F7/70225

摘要： A projection optical system for photolithography includes a refraction sub-system and a cata-dioptric sub-system optically connected to each other. The refraction sub-system extends at an object side. The cata-dioptric sub-system extends at an image side. The refraction sub-system is generally composed of refracting members. The cata-dioptric sub-system is generally composed of a phase compensating member, a concave mirror, and a convex mirror. The phase compensating member adjoins the refraction sub-system. At least the concave mirror has a central opening through which light passes. The light forms an image at a rear of the concave mirror.

摘要翻译： 用于光刻的投影光学系统包括彼此光学连接的折射子系统和cata度数子系统。 折射子系统在物体侧延伸。 cata-indiopt子系统在图像侧延伸。 折射子系统通常由折射构件组成。 数位子系统通常由相位补偿构件，凹面镜和凸面镜组成。 相位补偿构件邻接折射子系统。 至少凹面镜具有光通过的中心开口。 光在凹面镜的后部形成图像。

公开(公告)号：US4685198A

公开(公告)日：1987-08-11

申请号：US758962

申请日：1985-07-25

申请人： Kenji Kawakita ,  Noboru Nomura ,  Toyoki Takemoto

发明人： Kenji Kawakita ,  Noboru Nomura ,  Toyoki Takemoto

IPC分类号： H01L21/762 ,  H01L21/763 ,  H01L29/06

CPC分类号： H01L21/76264 ,  H01L21/762 ,  H01L21/763 ,  H01L21/76281 ,  H01L21/76283 ,  Y10S148/05 ,  Y10S148/115 ,  Y10S438/973

摘要： Disclosed is a method of isolating a transistor perfectly by employing a selective oxidation technology (LOCOS technology). More particularly, vertical openings are formed in the surface of {100} silicon substrate, and oxidation resistant films are formed of this surface and in part of the side walls of these openings. In succession, by etching with an etchant having an orientation anisotropy, dents are formed at high precision in the side walls of the openings. By oxidizing using the oxidation resistant film as the mask, an oxide film growing out from a dent in the opening side wall is connected with another oxide film growing out from an adjacent dent. The transistor thus formed in the active region of the silicon electrically isolated from the substrate is small in parasitic capacitance and may be formed into a small size, so that it possesses the features suited to VLSI, that is, high speed, low power consumption, and processability to high density integration.

摘要翻译： 公开了通过采用选择氧化技术（LOCOS技术）将晶体管完全隔离的方法。 更具体地，在{100}硅衬底的表面中形成垂直开口，并且由该表面和这些开口的一部分侧壁形成抗氧化膜。 相继地，通过用具有取向各向异性的蚀刻剂进行蚀刻，在开口的侧壁中以高精度形成凹痕。 通过使用抗氧化膜作为掩模进行氧化，从开口侧壁中的凹陷生长的氧化膜与从相邻凹坑生长的另一氧化膜连接。 因此，在与衬底电隔离的硅的有源区中形成的晶体管的寄生电容小，并且可以形成为小尺寸，使得其具有适合于VLSI的特征，即高速度，低功耗， 和可加工性的高密度集成。

公开(公告)号：US4660113A

公开(公告)日：1987-04-21

申请号：US448058

申请日：1982-12-09

申请人： Noboru Nomura ,  Yasuharu Shimeki

发明人： Noboru Nomura ,  Yasuharu Shimeki

IPC分类号： G11B5/39 ,  G11B5/30

CPC分类号： G11B5/3964 ,  G11B5/399

摘要： A magnetoresistive type thin film magnetic head is completely unaffected by external noise and produces only low interference with a recording medium. A magnetoresistive element which constitutes the thin film magnetic head has three terminals constituted by two end terminals and an intermediate terminal. Constant currents which flow in opposite directions are respectively supplied to the two end terminals. A magnetic field of a signal recorded on and reproduced from a single track of the recording medium is applied to the magnetoresistive element, and reproduction outputs of opposite phases appear at the two end terminals. These outputs are differentially amplified by a differential amplifier. Furthermore, the magnetoresistive element is biased by an induced magnetic anisotropy means in a predetermined direction.

摘要翻译： 磁阻型薄膜磁头完全不受外部噪声的影响，并且仅对记录介质产生低干扰。 构成薄膜磁头的磁阻元件具有由两个端子和中间端子构成的三个端子。 沿相反方向流动的恒定电流分别提供给两个端子。 记录在记录介质的单个轨道上并从其再现的信号的磁场被施加到磁阻元件，并且在两个端子端出现相反相位的再现输出。 这些输出由差分放大器差分放大。 此外，磁阻元件被感应磁各向异性装置沿预定方向偏置。