ARRAY SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY PANEL
    115.
    发明申请
    ARRAY SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY PANEL 有权
    阵列基板,其制造方法和显示面板

    公开(公告)号:US20160246097A1

    公开(公告)日:2016-08-25

    申请号:US14388677

    申请日:2013-12-03

    Abstract: A method for manufacturing an array substrate includes steps of: forming a pattern which includes a scanning line and a gate on a base substrate (301); forming a gate insulating layer on the pattern which includes the scanning line and the gate; forming a pattern which includes an active layer, a data line and a spacer matrix on the gate insulating layer; forming a passivation layer on the pattern which includes the active layer, the data line and the spacer matrix; dry etching the passivation layer to form a via hole which exposes the spacer matrix; under effect of an electric field generated between the spacer matrix exposed from the via hole and an etching gas, products obtained during the etching is induced to be deposited on the exposed surface of the spacer matrix so as to form a spacer. An array substrate and a display pane are further provided.

    Abstract translation: 一种阵列衬底的制造方法,包括以下步骤:在基底(301)上形成包括扫描线和栅极的图案; 在包括扫描线和栅极的图案上形成栅极绝缘层; 在所述栅绝缘层上形成包括有源层,数据线和间隔矩阵的图案; 在包括有源层,数据线和间隔矩阵的图案上形成钝化层; 干蚀刻钝化层以形成暴露间隔基体的通孔; 在从通孔露出的间隔基体和蚀刻气体之间产生的电场的作用下,诱导在蚀刻期间获得的产物沉积在间隔基体的暴露表面上,从而形成间隔物。 还提供阵列基板和显示窗格。

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