Abstract:
An image reading apparatus has a reading unit including a light source lamp mounted on a unit frame arranged in a document reading portion. The image reading apparatus comprised as a lamp frame supporting the light source lamp. The lamp frame has a pin. Projections are pivotally arranged on a back side surface of the lamp frame at an interval in a longitudinal direction of the light source lamp. An upper end of the projections has a grip for grasping. One of the projections has an elongated hole for receiving the pin. The pin regulates an pivoting angle of the projection. Slit holes, in which the projections are fitted, are formed in the unit frame.
Abstract:
A paper feed roller (5) is divided into a first roller (5a) and a second roller (5b); a slit (58) through which about 10 to 20 sheets of documents can pass is formed between the first roller and a gate plate (57) opposite to this; and the paper fed out therefrom is fed out to a space between the second roller (5b) and a separation pad (7) in contact with this.Also, there is adopted a construction in which the pressing force of a paper conveyance spring is transformed by a slide cam sliding in a direction parallel to the paper feed roller; and the paper width detection sensor is assembled by a fitting construction.
Abstract:
In a method of fabricating a semiconductor device according to the present invention, a semiconductor film is formed on a substrate, and an insulator film is formed so as to cover the semiconductor film. Then, a dopant source is arranged on the insulator film and then, a region for electrical contact is irradiated with a high-energy beam through the dopant source. Consequently, the insulator film and the semiconductor film in the irradiated region are melted, to form a polycrystalline contact region having impurities supplied from the dopant source doped therein. Thus, the high-energy beam is irradiated to the region for electrical contact through the dopant source to form the polycrystalline contact region, thereby to make it possible to omit the patterning process such as etching processing for providing a contact hole.