公开(公告)号：US5384466A

公开(公告)日：1995-01-24

申请号：US64685

申请日：1993-05-20

Applicant: Kazumitsu Nakamura ,  Rikio Tomiyoshi

Inventor： Kazumitsu Nakamura ,  Rikio Tomiyoshi

IPC: H01J37/30 ,  H01J37/302 ,  H01L21/027 ,  H01L21/30

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J2237/043

Abstract: The object of the invention is to provide an electron beam lithography apparatus and a method thereof which, while maintaining a predetermined pattern drawing accuracy, enables the pattern drawing speed to be improved still further. An electron beam lithography apparatus comprising exposing an electron beam 2 from an electron gun 1, interrupting the electron beam 2 by means of a blanker 6, further deflecting the electron beam 2 by applying a voltage to a deflector 7, wherein the electron beam lithography apparatus is characterized by selecting one of a first predetermined period of time required for the voltage of the deflector 7 to be stabilized and a second period of time which is shorter than the foregoing first period of time, and wherein the blanker 6 is operated according to the result of the foregoing selection.

Abstract translation: 本发明的目的是提供一种电子束光刻设备及其方法，在保持预定的图形绘制精度的同时，能够进一步提高图形绘制速度。 一种电子束光刻设备，包括从电子枪1暴露电子束2，通过消隐器6中断电子束2，通过向偏转器7施加电压进一步偏转电子束2，其中电子束光刻设备 其特征在于，选择要稳定的偏转器7的电压所需的第一预定时间段和比上述第一时间段短的第二时间段中的一个，并且其中，消音器6根据 上述选择的结果。

公开(公告)号：US4710640A

公开(公告)日：1987-12-01

申请号：US757285

申请日：1985-07-22

Applicant: Katsuhiro Kawasaki

Inventor： Katsuhiro Kawasaki

IPC: H01L21/027 ,  G03F7/20 ,  H01J37/317 ,  H01J37/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/31776

Abstract: An electron beam lithograhy apparatus capable of uniformly exposing the surface of a sample by an electron beam including a generator for generating the electron beam, members for shaping the electron beam, members for focusing the shaped electron beam on the surface of the sample, devices for permitting the focused electron beam to scan the surface of the sample, and devices for deflecting the electron beam to blank, unblank and blank in turn, wherein when the electrom beam is deflected in one direction, a sequence of blanking, unblanking and blanking is made of the beam.

Abstract translation: 一种电子束光刻装置，其能够通过包括用于产生电子束的发生器的电子束均匀地暴露样品的表面，用于使电子束成形的构件，用于将成形电子束聚焦在样品表面上的构件，用于 允许聚焦的电子束扫描样品的表面，以及用于依次将电子束偏转到空白，非空白和空白的装置，其中当电磁波束在一个方向上偏转时，进行一系列的消隐，非白化和消隐 的梁。

公开(公告)号：US4634871A

公开(公告)日：1987-01-06

申请号：US691255

申请日：1985-01-14

Applicant: Wolfgang Knauer

Inventor： Wolfgang Knauer

IPC: H01J37/147 ,  H01J37/21 ,  H01J37/30 ,  H01J37/317 ,  H01L21/027 ,  H01J3/14 ,  H01J3/26

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/31776

Abstract: Charged particle source (14) delivers beam (20) which is collimated onto first aperture plate having first aperture (28). The beam passing therethrough is deflected by deflection plates (32, 34, 38 and 40) with respect to second aperture (46) in second aperture plate (44). The image (50) of the second aperture (46) is focused on the target plane (16) and the projected image of the footprint (58) of the deflected beam is focused on the target plane (16). When these images overlap, a shaped beam (56) passes through. Scanning of the beam across the target plane by deflection plates (52 and 54) permits exposure of sharp-edged features (62) by positioning the image (60a) inside the margin (64) and then scanning the image (50b) thereacross to expose the sharp edge and thereupon picking up the image (60) so that they both scan across the feature to be exposed.

Abstract translation: 带电粒子源（14）传送光束（20），其被准直到具有第一孔径（28）的第一孔板上。 穿过其中的光束相对于第二孔板（44）中的第二孔（46）由偏转板（32,34,38和40）偏转。 第二孔径（46）的图像（50）聚焦在目标平面（16）上，并且偏转光束的足迹（58）的投影图像被聚焦在目标平面（16）上。 当这些图像重叠时，成形梁（56）穿过。 通过偏转板（52和54）将光束扫过目标平面允许通过将图像（60a）定位在边缘（64）内部然后扫描其上的图像（50b）而暴露出尖锐边缘（62） 锋利的边缘并随后拾取图像（60），使得它们都扫描要暴露的特征。