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    Electron beam lithography apparatus and a method thereof
    1.
    发明授权
    Electron beam lithography apparatus and a method thereof 失效
    电子束光刻设备及其方法

    公开(公告)号：US5384466A

    公开(公告)日：1995-01-24

    申请号：US64685

    申请日：1993-05-20

    Applicant: Kazumitsu Nakamura ,  Rikio Tomiyoshi

    Inventor： Kazumitsu Nakamura ,  Rikio Tomiyoshi

    IPC: H01J37/30 ,  H01J37/302 ,  H01L21/027 ,  H01L21/30

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J2237/043

    Abstract: The object of the invention is to provide an electron beam lithography apparatus and a method thereof which, while maintaining a predetermined pattern drawing accuracy, enables the pattern drawing speed to be improved still further. An electron beam lithography apparatus comprising exposing an electron beam 2 from an electron gun 1, interrupting the electron beam 2 by means of a blanker 6, further deflecting the electron beam 2 by applying a voltage to a deflector 7, wherein the electron beam lithography apparatus is characterized by selecting one of a first predetermined period of time required for the voltage of the deflector 7 to be stabilized and a second period of time which is shorter than the foregoing first period of time, and wherein the blanker 6 is operated according to the result of the foregoing selection.

    Abstract translation: 本发明的目的是提供一种电子束光刻设备及其方法，在保持预定的图形绘制精度的同时，能够进一步提高图形绘制速度。 一种电子束光刻设备，包括从电子枪1暴露电子束2，通过消隐器6中断电子束2，通过向偏转器7施加电压进一步偏转电子束2，其中电子束光刻设备 其特征在于，选择要稳定的偏转器7的电压所需的第一预定时间段和比上述第一时间段短的第二时间段中的一个，并且其中，消音器6根据 上述选择的结果。

    Pattern forming apparatus and pattern forming method
    2.
    发明授权
    Pattern forming apparatus and pattern forming method 有权
    图案形成装置和图案形成方法

    公开(公告)号：US08153996B2

    公开(公告)日：2012-04-10

    申请号：US12547958

    申请日：2009-08-26

    Applicant: Takayuki Abe ,  Rikio Tomiyoshi ,  Hiroshi Nozue

    Inventor： Takayuki Abe ,  Rikio Tomiyoshi ,  Hiroshi Nozue

    IPC: G21K5/10 ,  H01L21/027 ,  H01J37/305

    CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0453

    Abstract: A pattern forming apparatus using lithography technique includes a stage configured to allow a target object to be placed thereon; a plurality of columns configured to form patterns on the target object by using a charged particle beam while moving relatively to the stage; a pattern forming rule setting unit configured to set a pattern forming rule depending on a position of broken one of the plurality of columns; a region setting unit configured to set regions so that unbroken ones of the plurality of columns respectively form a pattern in one of the regions; a plurality of control circuits each configured to control any one of the plurality of columns different from others of the plurality of columns controlled by others of the plurality of control circuits; and a pattern forming data processing unit configured to perform a converting process on pattern forming data for the regions set to output a corresponding data generated by the converting process to the control circuit of a corresponding one of the unbroken ones of the plurality of columns respectively.

    Abstract translation: 使用光刻技术的图案形成装置包括：被配置为允许将目标物体放置在其上的台; 多个列，被配置为通过在相对于所述载物台移动的同时使用带电粒子束在所述目标物体上形成图案; 图案形成规则设定单元，被配置为根据所述多个列中的断开的一个的位置来设置图案形成规则; 区域设定单元，被配置为设置区域，使得所述多个列中的不间断的列分别在所述区域之一中形成图案; 每个控制电路被配置为控制与多个控制电路中的其他控制电路控制的多个列中的其他列不同的多个列中的任一个; 以及图案形成数据处理单元，被配置为对所设置的区域的图案形成数据执行转换处理，以将分别对应的多个列中的不间断的相应数据的转换处理生成的相应数据输出到对应的一个。

    Semiconductor manufacturing apparatus
    3.
    发明授权
    Semiconductor manufacturing apparatus 有权
    半导体制造装置

    公开(公告)号：US07218985B2

    公开(公告)日：2007-05-15

    申请号：US11371677

    申请日：2006-03-08

    Applicant: Hidemitsu Naya ,  Koji Hashimoto ,  Masamichi Kawano ,  Rikio Tomiyoshi

    Inventor： Hidemitsu Naya ,  Koji Hashimoto ,  Masamichi Kawano ,  Rikio Tomiyoshi

    IPC: G06F19/00

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G05B19/41855 ,  G05B2219/31323 ,  G05B2219/45028 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/30411 ,  H01J2237/3175 ,  H01J2237/31762 ,  Y02P90/185 ,  Y02P90/24

    Abstract: A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.

    Abstract translation: 半导体制造装置包括：计算单元，具有至少一个用于处理半导体设计信息的计算机; 控制单元，用于根据半导体设计信息的处理结果控制电子辐射; 用于根据控制单元的指令发射电子的写入单元; 和至少一个存储设备。 半导体制造装置允许存储装置，计算单元，控制单元和写入单元之间的通信。 半导体制造装置还包括可以控制存储装置的通信通路。

    Semiconductor production system
    4.
    发明申请
    Semiconductor production system 有权

    公开(公告)号：US20060265099A1

    公开(公告)日：2006-11-23

    申请号：US11495637

    申请日：2006-07-31

    Applicant: Hidemitsu Naya ,  Rikio Tomiyoshi

    Inventor： Hidemitsu Naya ,  Rikio Tomiyoshi

    IPC: G06F19/00

    CPC classification number: G06F17/50

    Abstract: A semiconductor production system has storage devices for storage of all kinds of information including, but not limited to, the information concerning semiconductor design and information as to semiconductor manufacture along with information relating to semiconductor inspection processes, while representing as a class an instance added with meta data indicative of the role of the information in accordance with a logical expressive form. The system has a network for the storage device use, called the storage area network or “SAN”. The SAN is for interconnection between respective ones of the storage devices, semiconductor manufacturing apparatuses and a semiconductor inspection apparatus. The storage devices are seamlessly accessible from any one of the semiconductor manufacture apparatuses and the semiconductor inspection apparatus and also from a semiconductor design environment associated therewith.

    Semiconductor production system
    5.
    发明申请
    Semiconductor production system 有权
    半导体生产系统

    公开(公告)号：US20050015165A1

    公开(公告)日：2005-01-20

    申请号：US10887976

    申请日：2004-07-12

    Applicant: Hidemitsu Naya ,  Rikio Tomiyoshi

    Inventor： Hidemitsu Naya ,  Rikio Tomiyoshi

    IPC: G03F1/68 ,  G03F7/20 ,  G06F17/50 ,  G06F19/00 ,  G06K9/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/027

    CPC classification number: G06F17/50

    Abstract: A semiconductor production system has storage devices for storage of all kinds of information including, but not limited to, the information concerning semiconductor design and information as to semiconductor manufacture along with information relating to semiconductor inspection processes, while representing as a class an instance added with meta data indicative of the role of the information in accordance with a logical expressive form. The system has a network for the storage device use, called the storage area network or “SAN”. The SAN is for interconnection between respective ones of the storage devices, semiconductor manufacturing apparatuses and a semiconductor inspection apparatus. The storage devices are seamlessly accessible from any one of the semiconductor manufacture apparatuses and the semiconductor inspection apparatus and also from a semiconductor design environment associated therewith.

    Abstract translation: 半导体生产系统具有用于存储各种信息的存储装置，包括但不限于有关半导体制造的信息以及关于半导体制造的信息以及与半导体检查过程有关的信息，同时将类似于实例添加到实例 表示信息的逻辑表现形式的元数据的元数据。 该系统具有用于存储设备使用的网络，称为存储区域网络或“SAN”。 SAN用于各个存储装置，半导体制造装置和半导体检查装置之间的互连。 存储装置可以从半导体制造装置和半导体检查装置中的任何一个以及与其相关联的半导体设计环境无缝地访问。

    Semiconductor production system
    8.
    发明授权
    Semiconductor production system 有权
    半导体生产系统

    公开(公告)号：US07177718B2

    公开(公告)日：2007-02-13

    申请号：US11495637

    申请日：2006-07-31

    Applicant: Hidemitsu Naya ,  Rikio Tomiyoshi

    Inventor： Hidemitsu Naya ,  Rikio Tomiyoshi

    IPC: G06F19/00

    CPC classification number: G06F17/50

    Abstract: A semiconductor production system has storage devices for storage of all kinds of information including, but not limited to, the information concerning semiconductor design and information as to semiconductor manufacture along with information relating to semiconductor inspection processes, while representing as a class an instance added with meta data indicative of the role of the information in accordance with a logical expressive form. The system has a network for the storage device use, called the storage area network or “SAN”. The SAN is for interconnection between respective ones of the storage devices, semiconductor manufacturing apparatuses and a semiconductor inspection apparatus. The storage devices are seamlessly accessible from any one of the semiconductor manufacture apparatuses and the semiconductor inspection apparatus and also from a semiconductor design environment associated therewith.

    Abstract translation: 半导体生产系统具有用于存储各种信息的存储装置，包括但不限于有关半导体制造的信息以及关于半导体制造的信息以及与半导体检查过程有关的信息，同时将类似于实例添加到实例 表示信息的逻辑表现形式的元数据的元数据。 该系统具有用于存储设备使用的网络，称为存储区域网络或“SAN”。 SAN用于各个存储装置，半导体制造装置和半导体检查装置之间的互连。 存储装置可以从半导体制造装置和半导体检查装置中的任何一个以及与其相关联的半导体设计环境无缝地访问。

    Semiconductor production system
    9.
    发明授权
    Semiconductor production system 有权
    半导体生产系统

    公开(公告)号：US07099733B2

    公开(公告)日：2006-08-29

    申请号：US10887976

    申请日：2004-07-12

    Applicant: Hidemitsu Naya ,  Rikio Tomiyoshi

    Inventor： Hidemitsu Naya ,  Rikio Tomiyoshi

    IPC: G06F19/00

    CPC classification number: G06F17/50

    Abstract: A semiconductor production system has storage devices for storage of all kinds of information including, but not limited to, the information concerning semiconductor design and information as to semiconductor manufacture along with information relating to semiconductor inspection processes, while representing as a class an instance added with meta data indicative of the role of the information in accordance with a logical expressive form. The system has a network for the storage device use, called the storage area network or “SAN”. The SAN is for interconnection between respective ones of the storage devices, semiconductor manufacturing apparatuses and a semiconductor inspection apparatus. The storage devices are seamlessly accessible from any one of the semiconductor manufacture apparatuses and the semiconductor inspection apparatus and also from a semiconductor design environment associated therewith.

    Abstract translation: 半导体生产系统具有用于存储各种信息的存储装置，包括但不限于有关半导体制造的信息以及关于半导体制造的信息以及与半导体检查过程有关的信息，同时将类似于实例添加到实例 表示信息的逻辑表现形式的元数据的元数据。 该系统具有用于存储设备使用的网络，称为存储区域网络或“SAN”。 SAN用于各个存储装置，半导体制造装置和半导体检查装置之间的互连。 存储装置可以从半导体制造装置和半导体检查装置中的任何一个以及与其相关联的半导体设计环境无缝地访问。

    Electron-beam drawing apparatus and electron-beam drawing method
    10.
    发明申请
    Electron-beam drawing apparatus and electron-beam drawing method 审中-公开
    电子束描绘装置和电子束拉制法

    公开(公告)号：US20060033050A1

    公开(公告)日：2006-02-16

    申请号：US11251807

    申请日：2005-10-18

    Applicant: Kimiaki Ando ,  Haruo Yoda ,  Rikio Tomiyoshi ,  Masamichi Kawano

    Inventor： Kimiaki Ando ,  Haruo Yoda ,  Rikio Tomiyoshi ,  Masamichi Kawano

    IPC: G21K5/10

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/31776

    Abstract: In the case of drawing an oblique figure pattern, when drawing an oblique figure by using a slender rectangular beam, a problem occurs that edge roughness occurs at an oblique-side portion to deteriorate the drawing accuracy. The present invention solves the above problem and provides an electron-beam drawing apparatus and an electron-beam drawing method capable of accurately drawing even an oblique figure. A first rectangular aperture and a second parallelogrammatic aperture are used and a variable parallelogrammatic electron beam formed by two apertures is used to draw a desired pattern on the surface of a sample. Moreover, oblique-side-portion-contour decomposition means is used to draw an oblique-side portion by a variable parallelogram and the inside of an oblique side by a triangle and a quadrangle (rectangle).

    Abstract translation: 在绘制斜图形图形的情况下，当使用细长矩形波束绘制斜图时，会出现在倾斜侧部分发生边缘粗糙度以降低绘图精度的问题。 本发明解决了上述问题，并且提供了能够精确地绘制斜图的电子束描绘装置和电子束描绘方法。 使用第一矩形孔和第二平行四边形孔，并且使用由两个孔形成的可变平行四边形电子束来在样品的表面上画出期望的图案。 此外，倾斜侧部分轮廓分解装置用于通过可变的平行四边形和斜边的内侧以三角形和四边形（矩形）绘制斜侧部分。

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