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131.发明授权Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply 有权流体处理结构，光刻设备和装置制造方法，涉及供气公开(公告)号：US08614784B2
公开(公告)日：2013-12-24
申请号：US12886956
申请日：2010-09-21
申请人： Michel Riepen , Nicolaas Rudolf Kemper , Johannes Catharinus Hubertus Mulkens , Rogier Hendrikus Magdalena Cortie , Ralph Joseph Meijers , Fabrizio Evangelista
发明人： Michel Riepen , Nicolaas Rudolf Kemper , Johannes Catharinus Hubertus Mulkens , Rogier Hendrikus Magdalena Cortie , Ralph Joseph Meijers , Fabrizio Evangelista
CPC分类号： G03F7/70341
摘要： A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.
摘要翻译： 提供了一种用于光刻设备的流体处理结构，该光刻设备在包含浸没流体的空间和流体处理结构外部的区域之间的边界处，多个开口布置在第一条线中，第一气刀装置具有孔 第二线，第三线中的一个或多个开口和具有第四线中的孔的第二气刀装置。
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132.发明申请FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权流体处理结构，平面设备和设备制造方法公开(公告)号：US20110090472A1
公开(公告)日：2011-04-21
申请号：US12886956
申请日：2010-09-21
申请人： Michel RIEPEN , Nicolaas Rudolf Kemper , Johannes Catharinus Hubertus Mulkens , Rogier Hendrikus Magdalena Cortie , Ralph Joseph Meijers , Fabrizio Evangelista
发明人： Michel RIEPEN , Nicolaas Rudolf Kemper , Johannes Catharinus Hubertus Mulkens , Rogier Hendrikus Magdalena Cortie , Ralph Joseph Meijers , Fabrizio Evangelista
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.
摘要翻译： 提供了一种用于光刻设备的流体处理结构，该光刻设备在包含浸没流体的空间和流体处理结构外部的区域之间的边界处，多个开口布置在第一条线中，第一气刀装置具有孔 第二线，第三线中的一个或多个开口和具有第四线中的孔的第二气刀装置。
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公开(公告)号：US20110019168A1
公开(公告)日：2011-01-27
申请号：US12881960
申请日：2010-09-14
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus and method are disclosed in which measures are taken to account for dissolution of resist components, such as photo-acids or photo-acid generators, in immersion liquid. This may involve ensuring that each relevant part of the substrate is covered by liquid the same amount of time and/or by compensating for the differing amounts of time each relevant part of the substrate is covered by liquid by varying exposure intensity or duration based on the amount of time the substrate is covered by liquid.
摘要翻译： 公开了一种浸没式光刻设备和方法，其中采取措施考虑抗蚀剂组分如光酸或光酸产生剂在浸没液中的溶解。 这可能涉及确保基板的每个相关部分以相同的时间量被液体覆盖和/或通过基于以下方式补偿基板的相关部分被液体覆盖的不同的时间量：通过改变曝光强度或持续时间来补偿不同的时间量 衬底被液体覆盖的时间量。
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公开(公告)号：US07843551B2
公开(公告)日：2010-11-30
申请号：US11984934
申请日：2007-11-26
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70058 , G03F7/70108 , G03F7/70225 , G03F7/70358 , G03F2007/2067
摘要： In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
摘要翻译： 在一个实施例中，光刻投影设备具有离轴图像场和凹折射透镜作为投影系统的最终元件。 凹透镜可以被切割成未被光学地使用的部分，以防止气泡被捕获在透镜下方。
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公开(公告)号：US07817245B2
公开(公告)日：2010-10-19
申请号：US11984060
申请日：2007-11-13
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus and method are disclosed in which measures are taken to account for dissolution of resist components, such as photo-acids or photo-acid generators, in immersion liquid. This may involve ensuring that each relevant part of the substrate is covered by liquid the same amount of time and/or by compensating for the differing amounts of time each relevant part of the substrate is covered by liquid by varying exposure intensity or duration based on the amount of time the substrate is covered by liquid.
摘要翻译： 公开了一种浸没式光刻设备和方法，其中采取措施考虑抗蚀剂组分如光酸或光酸产生剂在浸没液中的溶解。 这可能涉及确保基板的每个相关部分以相同的时间量被液体覆盖和/或通过基于以下方式补偿基板的相关部分被液体覆盖的不同的时间量：通过改变曝光强度或持续时间来补偿不同的时间量 衬底被液体覆盖的时间量。
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136.发明申请公开(公告)号：US20100214543A1
公开(公告)日：2010-08-26
申请号：US12697583
申请日：2010-02-01
申请人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
发明人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。
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137.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07508487B2
公开(公告)日：2009-03-24
申请号：US10719065
申请日：2003-11-24
申请人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Willem Van Schaik , Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Heine Melle Mulder
发明人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Willem Van Schaik , Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Heine Melle Mulder
CPC分类号： G03F7/70558 , G03F7/70883 , G03F7/70933 , G03F7/70941
摘要： In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.
摘要翻译： 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。
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公开(公告)号：US20080057440A1
公开(公告)日：2008-03-06
申请号：US11512434
申请日：2006-08-30
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
摘要翻译： 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。
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公开(公告)号：US07245355B2
公开(公告)日：2007-07-17
申请号：US11246549
申请日：2005-10-11
CPC分类号： G03F7/70341 , G02B5/3091 , G02B27/0043 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.
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公开(公告)号：US07245353B2
公开(公告)日：2007-07-17
申请号：US10961408
申请日：2004-10-12
申请人： Johannes Catharinus Hubertus Mulkens , Wil{acute over (h)}elmus Petrus De Boeij , Carsten Andreas Kohler
发明人： Johannes Catharinus Hubertus Mulkens , Wil{acute over (h)}elmus Petrus De Boeij , Carsten Andreas Kohler
CPC分类号： G03F7/70341 , G02B5/3091 , G02B27/0043 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.
摘要翻译： 为了补偿光刻投影装置中的掩模的双折射，测量掩模的双折射并将其作为双折射数据存储在数据存储装置中。 双折射补偿元件设置在光刻投影设备的光路中。 将补偿元件的适当调整确定为最佳地减小掩模双折射对基板水平的偏振状态的影响。
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