公开(公告)号：US20100214543A1

公开(公告)日：2010-08-26

申请号：US12697583

申请日：2010-02-01

申请人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

发明人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。

公开(公告)号：US08405817B2

公开(公告)日：2013-03-26

申请号：US12697583

申请日：2010-02-01

申请人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

发明人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。

公开(公告)号：US08614784B2

公开(公告)日：2013-12-24

申请号：US12886956

申请日：2010-09-21

申请人： Michel Riepen ,  Nicolaas Rudolf Kemper ,  Johannes Catharinus Hubertus Mulkens ,  Rogier Hendrikus Magdalena Cortie ,  Ralph Joseph Meijers ,  Fabrizio Evangelista

发明人： Michel Riepen ,  Nicolaas Rudolf Kemper ,  Johannes Catharinus Hubertus Mulkens ,  Rogier Hendrikus Magdalena Cortie ,  Ralph Joseph Meijers ,  Fabrizio Evangelista

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.

摘要翻译： 提供了一种用于光刻设备的流体处理结构，该光刻设备在包含浸没流体的空间和流体处理结构外部的区域之间的边界处，多个开口布置在第一条线中，第一气刀装置具有孔 第二线，第三线中的一个或多个开口和具有第四线中的孔的第二气刀装置。

公开(公告)号：US20110090472A1

公开(公告)日：2011-04-21

申请号：US12886956

申请日：2010-09-21

申请人： Michel RIEPEN ,  Nicolaas Rudolf Kemper ,  Johannes Catharinus Hubertus Mulkens ,  Rogier Hendrikus Magdalena Cortie ,  Ralph Joseph Meijers ,  Fabrizio Evangelista

发明人： Michel RIEPEN ,  Nicolaas Rudolf Kemper ,  Johannes Catharinus Hubertus Mulkens ,  Rogier Hendrikus Magdalena Cortie ,  Ralph Joseph Meijers ,  Fabrizio Evangelista

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.

摘要翻译： 提供了一种用于光刻设备的流体处理结构，该光刻设备在包含浸没流体的空间和流体处理结构外部的区域之间的边界处，多个开口布置在第一条线中，第一气刀装置具有孔 第二线，第三线中的一个或多个开口和具有第四线中的孔的第二气刀装置。

公开(公告)号：US20110194084A1

公开(公告)日：2011-08-11

申请号：US13022319

申请日：2011-02-07

申请人： Michel RIEPEN ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

发明人： Michel RIEPEN ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被构造成包括浸没流体到所述流体处理结构外部的区域的空间的边界处连续地具有：提取器，其具有布置在第一行中的至少一个开口， 在使用中指向基底和/或桌子; 以及在使用中面向基板和/或表的表面上的液体操纵器，以减少表面上的液滴的聚结机会。

公开(公告)号：US09625828B2

公开(公告)日：2017-04-18

申请号：US13022319

申请日：2011-02-07

申请人： Michel Riepen ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

发明人： Michel Riepen ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

公开(公告)号：US09256136B2

公开(公告)日：2016-02-09

申请号：US13090311

申请日：2011-04-20

申请人： Rogier Hendrikus Magdalena Cortie ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

发明人： Rogier Hendrikus Magdalena Cortie ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

摘要翻译： 公开了一种用于光刻设备的流体处理结构，流体处理结构在从被配置为将浸没流体包含在流体处理结构外部区域的空间的边界处依次具有：细长开口或多个开口 在使用中的第一线指向被配置为支撑衬底的衬底和/或衬底台; 气刀设备，其具有在第二线中的细长孔; 以及与气刀装置相邻的细长开口或多个开口。

公开(公告)号：US20110261332A1

公开(公告)日：2011-10-27

申请号：US13090311

申请日：2011-04-20

申请人： Rogier Hendrikus Magdalena CORTIE ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

发明人： Rogier Hendrikus Magdalena CORTIE ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

摘要翻译： 公开了一种用于光刻设备的流体处理结构，流体处理结构在从被配置为将浸没流体包含在流体处理结构外部区域的空间的边界处依次具有：细长开口或多个开口， 在使用中的第一线指向被配置为支撑衬底的衬底和/或衬底台; 气刀设备，其具有在第二线中的细长孔; 以及与气刀装置相邻的细长开口或多个开口。

公开(公告)号：US09383654B2

公开(公告)日：2016-07-05

申请号：US12506565

申请日：2009-07-21

申请人： Daniel Jozef Maria Direcks ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

发明人： Daniel Jozef Maria Direcks ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70991

摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

摘要翻译： 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。

公开(公告)号：US20100085545A1

公开(公告)日：2010-04-08

申请号：US12506565

申请日：2009-07-21

申请人： Daniel Jozef Maria DIRECKS ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

发明人： Daniel Jozef Maria DIRECKS ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70991

摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

摘要翻译： 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。