公开(公告)号：US06754140B2

公开(公告)日：2004-06-22

申请号：US09962907

申请日：2001-09-25

申请人： Tsutomu Tanaka

发明人： Tsutomu Tanaka

IPC分类号： G11B1100

CPC分类号： G11B11/10584 ,  G11B11/10586

摘要： A magneto-optical recording medium for recording and reproducing data through light irradiation on a magnetic film side of the medium, the medium including at least one magnetic film which is formed on a substrate and has an easy axis of magnetization in a perpendicular direction and an in-plane magnetic film which is formed between the substrate and the magnetic film and has an easy axis of magnetization in an in-plane direction.

摘要翻译： 一种磁光记录介质，用于通过在介质的磁性膜侧上的光照射来记录和再现数据，所述介质包括至少一个磁性膜，所述至少一个磁性膜形成在基板上并且具有易于垂直方向的磁化轴和 面内磁性膜，其形成在基板和磁性膜之间，并且在面内方向具有容易的磁化轴。

公开(公告)号：US06682366B2

公开(公告)日：2004-01-27

申请号：US09898187

申请日：2001-07-03

申请人： Tsutomu Tanaka

发明人： Tsutomu Tanaka

IPC分类号： H01R1340

CPC分类号： H01R13/4223 ,  H01R13/4364

摘要： A housing (10) is formed with resin locks (15) that cantilever forward along inner walls of cavities (13) into which terminal fittings (30) can be inserted, and a mold-removal space (17) extends from the resin locks (15) to the front end surface of the housing (10). A loose movement restricting member (20) is fit into the mold-removal space (17) and contacts the terminal fittings (30) to restrict loose movement of the terminal fittings (30). The width of the mold-removal space (17) can be set freely because a part separate from the housing (10) is fitted into the mold-removal space (17) for restricting the loose movements of the terminal fittings (30). Therefore, the resin locks (15) can be wide and sufficiently strong.

摘要翻译： 壳体（10）形成有树脂锁（15），所述树脂锁（15）沿着空腔（13）的内壁向前悬伸，端子接头（30）可以插入其中，并且脱模空间（17）从树脂锁（ 15）连接到壳体（10）的前端表面。 松动件限制构件（20）装配到取模空间（17）中并与端子接头（30）接触以限制端子接头（30）的松动。 脱模空间（17）的宽度可以自由设定，因为与壳体（10）分离的部分被装配到去模腔（17）中，以限制端子接头（30）的松动。 因此，树脂锁（15）可以宽且足够坚固。

公开(公告)号：US06674106B2

公开(公告)日：2004-01-06

申请号：US09792080

申请日：2001-02-26

申请人： Tsutomu Tanaka ,  Minoru Nakano ,  Masahiro Fujino

发明人： Tsutomu Tanaka ,  Minoru Nakano ,  Masahiro Fujino

IPC分类号： H01L27148

CPC分类号： H01L27/3244 ,  G02F1/133345 ,  G02F1/136227 ,  H01L27/12 ,  H01L27/1248 ,  H01L27/3248 ,  H01L51/5262

摘要： A display device includes pixels disposed in a matrix on a transparent base plate. Each pixel includes an opening region, in which an electro-optic element for emitting light through the base plate is formed, and a non-opening region, in which a thin film transistor for driving the electro-optic element is formed. The non-opening region has a first film structure including the thin film transistor. The opening region has a second film structure extending from the first film structure and existing between the electro-optic element and the base plate. The second film structure is different from the first film structure so as to adjust the light passing through the opening region.

摘要翻译： 显示装置包括设置在透明基板上的矩阵中的像素。 每个像素包括其中形成用于发射通过基板的光的电光元件的开口区域和形成用于驱动电光元件的薄膜晶体管的非开口区域。 非开口区域具有包括薄膜晶体管的第一膜结构。 开口区域具有从第一膜结构延伸并存在于电光元件和基板之间的第二膜结构。 第二膜结构与第一膜结构不同，以调节通过开口区域的光。

公开(公告)号：US06592411B2

公开(公告)日：2003-07-15

申请号：US10178309

申请日：2002-06-21

申请人： Tsuyoshi Mase ,  Tsutomu Tanaka

发明人： Tsuyoshi Mase ,  Tsutomu Tanaka

IPC分类号： H01R13514

CPC分类号： H01R13/4362 ,  H01R13/4223

摘要： Locks (13) and securing portions (48) of a retainer (40) have slanted guide surfaces (15, 49) aligned oblique both to resiliently deforming directions of the locks (13) and moving directions of the retainer (40) between partial and full locking positions. Portions of the securing portions (48) enter deformation permitting spaces (17) when the retainer (40) displaced toward the full locking position from the partial locking position. However, since the locks (13) are resiliently deformable to enter the deformation permitting spaces (17) while being held in sliding contact with the first securing portions (48) via the slanted guide surfaces (15, 49), inserting movements of the terminal fittings are not hindered.

公开(公告)号：US06551446B1

公开(公告)日：2003-04-22

申请号：US09637174

申请日：2000-08-11

申请人： Hiroji Hanawa ,  Yan Ye ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Tsutomu Tanaka

发明人： Hiroji Hanawa ,  Yan Ye ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Tsutomu Tanaka

IPC分类号： C23C1600

CPC分类号： H01J37/321 ,  H01J37/32082

摘要： A plasma reactor for processing a workpiece includes a vacuum enclosure, including a wall, defining a vacuum chamber, the vacuum chamber having a main chamber portion on one side of the wall and a plenum on another side of the wall, the plenum communicating with the chamber portion through at least one opening in the wall, a workpiece support within the main chamber portion and facing the wall. A gas distribution plate is adjacent the wall and faces the workpiece support and is coupled to a reactive process gas supply for injecting reactive process gases directly into a process region adjacent the workpiece support. A gas injection port at the plenum is coupled to a diluent gas supply for injecting diluent gases into the plenum. A coil antenna adapted to accept RF power is inductively coupled to the interior of said plenum, and is capable of maintaining a plasma in a reentrant path through the plenum and across the process region.

摘要翻译： 用于处理工件的等离子体反应器包括真空封壳，其包括限定真空室的壁，所述真空室具有在壁的一侧上的主室部分和在壁的另一侧上的增压室， 室部分通过壁中的至少一个开口，主室部分内的工件支撑件并面向壁。 气体分配板邻近壁并且面向工件支撑件并且与反应性工艺气体供应件相连接，用于将反应性工艺气体直接注入到与工件支撑件相邻的工艺区域中。 增压室处的气体注入口与稀释气体供应装置连接，用于将稀释气体注入气室。 适于接收RF功率的线圈天线感应耦合到所述增压室的内部，并且能够将等离子体维持在通过充气室并且跨越过程区域的折返路径中。

公开(公告)号：US06488547B2

公开(公告)日：2002-12-03

申请号：US09907319

申请日：2001-07-17

申请人： Tsutomu Tanaka

发明人： Tsutomu Tanaka

IPC分类号： H01R13514

CPC分类号： H01R13/4362

摘要： A connector (F) includes two partial locks (41) for holding a terminal retainer (15) in a partial locking position with respect to a housing (Fh) and two full locks (42) for holding the terminal retainer (15) in a full locking position. Terminal fittings (5) can be inserted longitudinally into the housing (Fh) when the retainer (15) is in the partial locking position, but are a locked in the housing (Fh) when the retainer (15) is in the full locking position. The partial locks (41) are on opposite sides of the housing (Fh) and are spaced longitudinally. Similarly, the full locks (42) are on opposite sides of the housing (Fh) and are spaced apart longitudinally. The spaced disposition of the locks (41, 42) stabilizes the retainer (15) in response to forces exerted longitudinally of the terminal fittings (5).

摘要翻译： 连接器（F）包括用于将端子保持器（15）相对于壳体（Fh）保持在部分锁定位置的两个部分锁（41）和用于将端子保持器（15）保持在壳体 完全锁定位置。 当保持器（15）处于部分锁定位置时，当保持器（15）处于完全锁定位置时，端子接头（5）可纵向插入外壳（Fh） 。 部分锁（41）在壳体（Fh）的相对侧上并且纵向隔开。 类似地，完整的锁（42）在壳体（Fh）的相对侧上并且纵向隔开。 锁定件（41,42）的间隔布置使得保持器（15）响应于端子接头（5）纵向施加的力而稳定。

公开(公告)号：US06453842B1

公开(公告)日：2002-09-24

申请号：US09636700

申请日：2000-08-11

申请人： Hiroji Hanawa ,  Yan Ye ,  Kenneth S Collins ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Tsutomu Tanaka

发明人： Hiroji Hanawa ,  Yan Ye ,  Kenneth S Collins ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Tsutomu Tanaka

IPC分类号： C23C1600

CPC分类号： H01J37/321 ,  H01J37/32082

摘要： A plasma chamber defining an evacuated interior environment for processing a substrate includes a substrate support, an apertured gas distribution plate in spaced facing relationship to the substrate support, and adapted to flow process gases into the chamber interior environment adjacent the substrate support, the gas distribution plate and substrate support defining a substrate processing region therebetween, a hollow reentrant conduit having respective ends opening into the substrate processing region on opposite sides of the gas distribution plate, with the interior of said conduit sharing the interior environment. The conduit is adapted to accept irradiation of processing gases within the conduit to sustain a plasma in a path extending around the conduit interior and across the substrate processing region within the chamber interior environment.

摘要翻译： 限定用于处理衬底的抽空的内部环境的等离子体室包括衬底支撑件，与衬底支撑件间隔开的面对关系的多孔气体分配板，并且适于将工艺气体流入邻近衬底支撑件的腔室内部环境中，气体分布 板和基板支撑件，其间限定了其间的基板加工区域，中空折痕导管，其相应的端部通向气体分配板的相对侧上的基板处理区域，所述导管的内部共享内部环境。 导管适于接受管道内的处理气体的照射，以在围绕导管内部延伸并且在腔室内部环境内的衬底处理区域上延伸的路径中维持等离子体。

公开(公告)号：US06447651B1

公开(公告)日：2002-09-10

申请号：US09800798

申请日：2001-03-07

申请人： Tetsuya Ishikawa ,  Kaveh Niazi ,  Tsutomu Tanaka ,  Canfeng Lai ,  Robert Duncan

发明人： Tetsuya Ishikawa ,  Kaveh Niazi ,  Tsutomu Tanaka ,  Canfeng Lai ,  Robert Duncan

IPC分类号： C23C1435

CPC分类号： C23C16/45508 ,  C23C16/507 ,  C23C16/52

摘要： A method and apparatus for forming a layer on a substrate in a process chamber during a plasma deposition process are provided. A plasma is formed in a process chamber, a process gas with precursor gases suitable for depositing the layer are flowed into the process chamber, and a magnetic field having a strength less than about 0.5 gauss is attenuated within the process chamber. Attenuation of such a magnetic field results in an improvement in the degree of process uniformity achieved during the deposition.

摘要翻译： 提供了一种用于在等离子体沉积工艺期间在处理室中在衬底上形成层的方法和装置。 在处理室中形成等离子体，具有适于沉积层的前体气体的工艺气体流入处理室，并且具有小于约0.5高斯的强度的磁场在处理室内衰减。 这种磁场的衰减导致在沉积期间实现的工艺均匀度的改善。

公开(公告)号：US06410449B1

公开(公告)日：2002-06-25

申请号：US09636436

申请日：2000-08-11

申请人： Hiroji Hanawa ,  Yan Ye ,  Kenneth S Collins ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Tsutomu Tanaka

发明人： Hiroji Hanawa ,  Yan Ye ,  Kenneth S Collins ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Tsutomu Tanaka

IPC分类号： H01L21302

CPC分类号： H01J37/321 ,  H01J37/32082

摘要： A method of processing a workpiece in a plasma reactor includes establishing a torroidal path for a plasma current to flow that passes near and transverse to the surface of said workpiece, maintaining a plasma current in the torroidal path by applying RF power to a portion of the torroidal path away from the surface of the workpiece, and increasing the ion density of the plasma current in the vicinity of the workpiece by constricting the area of a portion of the torroidal path overlying the workpiece.

摘要翻译： 在等离子体反应器中处理工件的方法包括建立用于等离子体电流的环形路径，其流过靠近和横向于所述工件的表面的流动，通过将RF功率施加到环形路径的一部分来维持在环形路径中的等离子体电流 环形路径远离工件的表面，并且通过收缩覆盖工件的一部分环形路径的面积来增加工件附近的等离子体电流的离子密度。

公开(公告)号：US06397258B1

公开(公告)日：2002-05-28

申请号：US09395171

申请日：1999-09-14

申请人： Atsuhiro Tsuji ,  Shinzo Doi ,  Yukiko Ito ,  Tsutomu Tanaka

发明人： Atsuhiro Tsuji ,  Shinzo Doi ,  Yukiko Ito ,  Tsutomu Tanaka

IPC分类号： G06F1300

CPC分类号： H04L47/25 ,  G06F17/30067 ,  H04L47/19 ,  Y10S707/99931

摘要： A file system capable of performing bandwidth setting is realized. Further, a bandwidth assuring function and a prefetching function are added thereto, and are organically coupled to a bandwidth setting function, thereby realizing a real-time remote file system. For these purposes, a bandwidth setting request issued by an application 302 is fed to a bandwidth setting part 305 through an extended API 313. The bandwidth setting part 305 sets bandwidths, respectively, for transmission bandwidth control parts 311 and 314 and a prefetching amount control part 310. The transmission bandwidth control parts 311 and 314 and the prefetching amount control part 310 respectively control a transmission bandwidth and control the amount of prefetching on the basis of the bandwidths respectively set.

摘要翻译： 实现能够进行带宽设定的文件系统。 此外，增加了带宽保证功能和预取功能，并且有机地耦合到带宽设置功能，从而实现实时的远程文件系统。 为了这些目的，应用程序302发出的带宽设置请求通过扩展API 313被馈送到带宽设置部分305.带宽设置部分305分别为传输带宽控制部分311和314以及预取量控制 部分310.传输带宽控制部分311和314以及预取量控制部分310分别控制传输带宽并且基于分别设置的带宽来控制预取量。