Patterning method for preparing top-gate, bottom-contact organic field effect transistors

    公开(公告)号:US11690236B2

    公开(公告)日:2023-06-27

    申请号:US17672621

    申请日:2022-02-15

    Applicant: Clap Co., Ltd.

    Abstract: The present invention relates to a process for the preparation of a top-gate, bottom-contact organic field effect transistor on a substrate, which organic field effect transistor comprises source and drain electrodes, a semiconducting layer, a cured first dielectric layer and a gate electrode, and which process comprises the steps of: i) applying a composition comprising an organic semiconducting material to form the semiconducting layer, ii) applying a composition comprising a first dielectric material and a crosslinking agent carrying at least two azide groups to form a first dielectric layer, iii) curing portions of the first dielectric layer by light treatment, iv) removing the uncured portions of the first dielectric layer, and v) removing the portions of the semiconducting layer that are not covered by the cured first dielectric layer, wherein the first dielectric material comprises a star-shaped polymer consisting of at least one polymer block A and at least two polymer blocks B, wherein each polymer block B is attached to the polymer block A, and wherein at least 60 mol % of the repeat units of polymer block B are selected from the group consisting of Formulas (1A), (1B), (1C), (1D), (1E) and (1F), wherein R1, R2, R3, R4, R5, R6, R7 and R8 are independently and at each occurrence H or C1-C10-alkyl.

    Naphthoindacenodithiophenes and polymers

    公开(公告)号:US10793668B2

    公开(公告)日:2020-10-06

    申请号:US16060728

    申请日:2016-12-08

    Applicant: CLAP Co., Ltd.

    Abstract: Polymers comprising at least one unit of formula 1 and compounds of the formula 1′ wherein, in formulae 1 and 1′ n is 0, 1, 2, 3 or 4 m is 0, 1, 2, 3 or 4 X is at each occurrence selected from the group consisting of O, S, Se or Te, Q is at each occurrence selected from the group consisting of C, Si or Ge R is at each occurrence selected from the group consisting of hydrogen, C1-30-alkyl, C2-30-alkenyl, C2-30-alkynyl, C5-12-cycloalkyl, C6-18-aryl, R2, R2′, R* are at each occurrence independently selected from the group consisting of hydrogen, C1-30-alkyl, C2-30-alkenyl, C2-30-alkynyl, C5-12-cycloalkyl, C6-18-aryl, 5 to 20 membered hetero-aryl, OR21, OC(O)—R21, C(O)—OR21, C(O)—R21, NR21R22, NR21—C(O)R22, C(O)—NR21R22, N[C(O)R21][C(O)R22], SR21, halogen, CN, SiRSisRSitRSiu and OH, L1 and L2 are independently from each other and at each occurrence selected from the group consisting of C6-30-arylene, 5 to 30 membered heteroarylene.

    Patterning method for preparing top-gate, bottom-contact organic field effect transistors

    公开(公告)号:US11296290B2

    公开(公告)日:2022-04-05

    申请号:US16978659

    申请日:2019-02-27

    Applicant: Clap Co., Ltd.

    Abstract: The present invention relates to a process for the preparation of a top-gate, bottom-contact organic field effect transistor on a substrate, which organic field effect transistor comprises source and drain electrodes, a semiconducting layer, a cured first dielectric layer and a gate electrode, and which process comprises the steps of: i) applying a composition comprising an organic semiconducting material to form the semiconducting layer, ii) applying a composition comprising a first dielectric material and a crosslinking agent carrying at least two azide groups to form a first dielectric layer, iii) curing portions of the first dielectric layer by light treatment, iv) removing the uncured portions of the first dielectric layer, and v) removing the portions of the semiconducting layer that are not covered by the cured first dielectric layer, wherein the first dielectric material comprises a star-shaped polymer consisting of at least one polymer block A and at least two polymer blocks B, wherein each polymer block B is attached to the polymer block A, and wherein at least 60 mol % of
    the repeat units of polymer block B are selected from the group consisting of Formulas (1A), (1B), (1C), (1D), (1E) and (1F), wherein R1, R2, R3, R4, R5, R6, R7 and R8 are independently and at each occurrence H or C1-C10-alkyl.

    Method for the deposition of an organic material

    公开(公告)号:US10741762B2

    公开(公告)日:2020-08-11

    申请号:US14394348

    申请日:2013-04-30

    Applicant: CLAP Co., Ltd.

    Abstract: The present invention relates to a method for the deposition of at least one layer of an organic material on a substrate by (a) providing a source of a solid organic material in an atmosphere at a pressure comprised between 50 and 200 kPa, (b) heating said organic material to a first temperature to produce a vapor of said organic material, (c) exposing at least one surface of a substrate having a second temperature lower than said first temperature to said vapor to deposit organic material from said vapor onto said at least one surface of said substrate.

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