公开(公告)号：US20060249175A1

公开(公告)日：2006-11-09

申请号：US11230975

申请日：2005-09-20

申请人： Thomas Nowak ,  Juan Rocha-Alvarez ,  Andrzej Kaszuba ,  Scott Hendrickson ,  Dustin Ho ,  Sanjeev Baluja ,  Tom Cho ,  Josephine Chang ,  Hichem M'Saad

发明人： Thomas Nowak ,  Juan Rocha-Alvarez ,  Andrzej Kaszuba ,  Scott Hendrickson ,  Dustin Ho ,  Sanjeev Baluja ,  Tom Cho ,  Josephine Chang ,  Hichem M'Saad

IPC分类号： B08B3/12 ,  B08B7/00 ,  B08B9/00 ,  H01L21/306

CPC分类号： B08B7/0035 ,  C23C16/4405

摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.

摘要翻译： 紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。 串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。 每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。 紫外光可以在固化过程中被脉冲。 使用远程生成的氧自由基/臭氧和/或原位实现清洁室。 灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。

公开(公告)号：US20060160374A1

公开(公告)日：2006-07-20

申请号：US11233988

申请日：2005-09-09

申请人： Dustin Ho ,  Derek Witty ,  Helen Armer ,  Hichem M'Saad

发明人： Dustin Ho ,  Derek Witty ,  Helen Armer ,  Hichem M'Saad

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01L21/76801 ,  C23C16/401 ,  C23C16/4405 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02274 ,  H01L21/02304 ,  H01L21/02362 ,  H01L21/31633 ,  H01L21/76811 ,  H01L21/76813 ,  H01L21/7682 ,  H01L21/76828 ,  H01L2221/1047

摘要： Nano-porous low dielectric constant films are deposited utilizing materials having reactive by-products readily removed from a processing chamber by plasma cleaning. In accordance with one embodiment, an oxidizable silicon containing compound is reacted with an oxidizable non-silicon component having thermally labile groups, in a reactive oxygen ambient and in the presence of a plasma. The deposited silicon oxide film is annealed to form dispersed microscopic voids or pores that remain in the nano-porous silicon. Oxidizable non-silicon components with thermally labile groups that leave by-products readily removed from the chamber, include but are not limited to, limonene, carene, cymene, fenchone, vinyl acetate, methyl methacrylate, ethyl vinyl ether, tetrahydrofuran, furan, 2,5 Norbornadiene, cyclopentene, cyclopentene oxide, methyl cyclopentene, 2-cyclopentene-1-one, and 1-butene.