SHADOW FRAME AND MANUFACTURING METHOD THEREOF
    11.
    发明申请
    SHADOW FRAME AND MANUFACTURING METHOD THEREOF 审中-公开
    阴影框架及其制造方法

    公开(公告)号:US20110304086A1

    公开(公告)日:2011-12-15

    申请号:US13075174

    申请日:2011-03-29

    Abstract: A shadow frame and a method of manufacturing the shadow frame are disclosed. The shadow frame is utilized in photoelectrical semiconductor manufacturing processes and is utilized for fixing a glass substrate by combing with a support base used to carry the glass substrate. The shadow frame has a plurality of frame components and welding parts, and the frame components are adjoined at the welding parts to form the shadow frame. The provided shadow frame and its manufacturing method are capable of improving the utility rate of the substrate used to manufacture the shadow frame, avoiding a waste of the substrate, and thereby capable of reducing the manufacturing cost.

    Abstract translation: 公开了一种阴影框架和一种制造阴影框架的方法。 阴影框架用于光电半导体制造工艺中,并且用于通过与用于承载玻璃基板的支撑基座结合来固定玻璃基板。 阴影框架具有多个框架部件和焊接部件,并且框架部件在焊接部分处邻接以形成阴影框架。 提供的阴影框架及其制造方法能够提高用于制造阴影框架的基板的利用率,避免了基板的浪费,从而能够降低制造成本。

    Fluoride-releasing strips for caries prevention
    15.
    发明申请
    Fluoride-releasing strips for caries prevention 审中-公开
    用于防止龋齿的氟化物释放条

    公开(公告)号:US20090257964A1

    公开(公告)日:2009-10-15

    申请号:US12487896

    申请日:2009-06-19

    CPC classification number: A61K8/21 A61Q11/00

    Abstract: The present invention discloses fluoride-releasing strips for caries prevention, wherein the fluoride-releasing strips comprises a colloidal fluoride-containing solution for releasing fluorine ion and a support substrate. A colloidal fluoride-containing solution comprises a fluoride solution, at least one buffer, at least one moisturizer and a carboxymethyl cellulose (CMC). The concentration of fluoride ions in said colloidal fluoride-containing solution ranges from 2500 ppm to ppm. The support substrate is waterproof material and the colloidal fluoride-containing solution is applied on the support substrate.

    Abstract translation: 本发明公开了一种用于防止龋齿的氟化物释放条,其中氟化物释放条包括用于释放氟离子的胶态含氟化物溶液和支撑基底。 含胶态氟化物的溶液包含氟化物溶液,至少一种缓冲剂,至少一种保湿剂和羧甲基纤维素(CMC)。 所述胶体状含氟化物溶液中的氟离子的浓度为2500ppm〜ppm。 支撑基板是防水材料,并且将含胶体的氟化物溶液施加在支撑基板上。

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