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公开(公告)号：US20180112808A1
公开(公告)日：2018-04-26
申请号：US15568295
申请日：2016-04-25
Applicant: General Plasma, Inc.
Inventor： John E. MADOCKS
IPC: F16L37/23
CPC classification number: F16L37/23
Abstract: A quick coupling for connecting fluid lines with one-handed push-to-connect and pull-to-disconnect operation is provided. The quick coupling achieves this preferred functionality with a minimum number parts, the quick coupling having only one spring and one dynamic seal. In addition to fluid carrying applications the quick coupling can be used for tool holding and power transmission.
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公开(公告)号：US11092245B2
公开(公告)日：2021-08-17
申请号：US15568223
申请日：2016-04-22
Applicant: General Plasma, Inc.
Inventor： John E. Madocks
Abstract: A chamber valve (100) for use in processes requiring vacuum pressures has a compact design which minimizes the space needed for the valve in the travel direction. The chamber valve gate (116) is moveable between a first position in which the gate is offset from the portal (110), and a second position in which the gate is aligned with the portal. The gate will move into alignment with the portal while remaining within a plane parallel or nearly parallel to the portal.
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公开(公告)号：US20160133426A1
公开(公告)日：2016-05-12
申请号：US14897229
申请日：2014-06-12
Applicant: GENERAL PLASMA, INC.
Inventor： John E. Madocks
CPC classification number: H01J27/14 , H01J27/024 , H01J27/10 , H01J37/08
Abstract: A duoplasmatron is provided having a cathode, an anode with linear slit, and an intermediate electrode (IE) between the cathode and the anode where the IE has an opening that is aligned with the anode slit. A magnet forms a magnetic field that passes through the anode slit. A discharge passes from the cathode to the anode through the IE opening and the anode slit. The discharge is constricted through the IE opening and the magnetic field in the anode slit. An extractor external to the anode accelerates ions through an ion emitting slit aligned with the anode slit. A process of generating an accelerated ion beam is provided that includes flowing a gas into the IE and then energizing at least one power supply to induce electron flow to the anode. Ionizing the gas in the gap between the IE and anode. The ions are accelerated from the anode through the extractor ion emitting slit forming a linear ion beam.
Abstract translation: 提供了一种具有阴极，具有线性狭缝的阳极和在阴极和阳极之间的中间电极（IE）的双质子体，其中IE具有与阳极狭缝对准的开口。 磁体形成通过阳极狭缝的磁场。 放电通过IE开口和阳极狭缝从阴极传递到阳极。 放电通过IE开口和阳极狭缝中的磁场而收缩。 阳极外部的提取器通过与阳极狭缝对准的离子发射狭缝加速离子。 提供了产生加速离子束的过程，其包括使气体流入IE中，然后给至少一个电源通电以诱导电子流向阳极。 电离IE和阳极之间的间隙中的气体。 离子通过形成线性离子束的提取器离子发射狭缝从阳极加速。
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14.发明申请公开(公告)号：US20150299470A1
公开(公告)日：2015-10-22
申请号：US14699963
申请日：2015-04-29
Applicant: General Plasma, Inc.
Inventor： Phong Ngo , John Madocks
CPC classification number: C09D5/006 , G02B1/118 , G02B27/0006 , G06F1/1643 , G06F3/0412 , G06F2203/04107
Abstract: A scratch-resistant anti-reflective film in accordance with a particular embodiment includes an anti-reflective stack and a protective layer overlying the anti-reflective stack. The anti-reflective stack has at least six stack layers of alternating higher and lower refractive indexes. The protective layer is at least primarily composed of diamond-like carbon and has a thickness of not more than 5 nm. At least a 15 cm2 region of the film is continuous and has an average nanoindentation hardness of at least 8 GPa using the Continuous Stiffness Measurement Technique. An average reflectance off the film at the region from normal incident light of wavelengths from 425 nm to 675 nm is not more than 1%. Average a* and b* in CIELAB color space for reflectance off the film at the region from −45° to 45° incident visible light are within a range from −2.0 to 2.0.
Abstract translation: 根据特定实施例的耐刮擦抗反射膜包括抗反射叠层和覆盖防反射叠层的保护层。 抗反射叠层具有至少六个交叠的较高和较低折射率的堆叠层。 保护层至少主要由类金刚石碳组成，厚度不大于5nm。 使用连续刚度测量技术，膜的至少15cm 2区域是连续的并且具有至少8GPa的平均纳米压痕硬度。 在从425nm到675nm的波长的正常入射光的区域处的膜的平均反射率不大于1％。 CIELAB颜色空间中的平均值a *和b *在-45°至45°的区域内的入射可见光的反射率在-2.0至2.0的范围内。
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