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公开(公告)号：US10811236B2
公开(公告)日：2020-10-20
申请号：US15540325
申请日：2015-10-26
Applicant: General Plasma Inc.
Inventor： Phong Ngo , John E. Madocks
IPC: H01J37/34
Abstract: A rotary sputter magnetron assembly for use in sputtering target material onto a substrate is provided. The assembly comprises a longitudinally extending target tube having a longitudinal central axis, said target tube extending about a magnet array that is configured to generate a plasma confining magnetic field adjacent the target tube, said target tube supported for rotation about its longitudinal central axis and a pair of side shunts positioned parallel to the longitudinal central axis, and on opposing lengthwise sides of said target tube.
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公开(公告)号：US20150235821A1
公开(公告)日：2015-08-20
申请号：US14429667
申请日：2013-09-19
Applicant: GENERAL PLASMA, INC.
Inventor： John E. Madocks , Ryan Lohrenz , Steven Smith, SR.
CPC classification number: H01J37/3435 , B25B5/147 , F16B2/08 , H01J37/3455 , Y10T29/49947
Abstract: A clamp is provided that incorporates a plurality of flexible links with V flexures between the links to maintain even spacing of the links before and during installation. Each link has multiple segments joined around at least one flexure point, and a floating band surrounding the links to distribute clamping pressure that is produced along a circumference of contact points. The clamp provides evenly distributed clamping pressure by increasing the number of clamping contact points between the clamp and articles being joined. The clamp has non-limiting applications for clamping target tubes or as a vacuum flange for ISO fittings. A clamp can produce a vacuum tight seal between a target tube and end block or end support flange of a rotary magnetron without resort to tools, and as such is rapidly secured in place.
Abstract translation: 提供一种夹具，其在链节之间结合有多个具有V形弯曲的柔性连接件，以在安装之前和安装期间保持连杆的均匀间距。 每个连杆具有围绕至少一个挠曲点连接的多个段，以及围绕该链节的浮动带，以分布沿着接触点的圆周产生的夹紧压力。 夹具通过增加夹具和待连接物品之间的夹紧接触点的数量来提供均匀分布的夹紧压力。 夹具具有用于夹紧目标管或ISO配件的真空法兰的非限制性应用。 夹具可以在目标管和旋转磁控管的端部支撑凸缘之间产生真空密封，而不需要使用工具，并且因此快速固定就位。
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公开(公告)号：US10989343B2
公开(公告)日：2021-04-27
申请号：US15568295
申请日：2016-04-25
Applicant: General Plasma, Inc.
Inventor： John E. Madocks
IPC: F16L37/23
Abstract: A quick coupling for connecting fluid lines with one-handed push-to-connect and pull-to-disconnect operation is described. The quick coupling achieves this preferred functionality with a minimum number parts, the quick coupling having only one spring and one dynamic seal. In addition to fluid carrying applications the quick coupling can be used for tool holding and power transmission.
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公开(公告)号：US20160148775A1
公开(公告)日：2016-05-26
申请号：US14897232
申请日：2014-06-12
Applicant: GENERAL PLASMA, INC.
Inventor： John E. Madocks
IPC: H01J27/14
CPC classification number: H01J27/14 , H01J27/024 , H01J27/10 , H01J37/08
Abstract: A linear anode layer ion source is provided that includes a top pole having a linear ion emitting slit. An anode under the top pole has a slit aligned with the top pole ion emitting slit. At least one magnet creates a magnetic field that passes through the anode slit. Wherein the width of the anode slit is 3 mm or less. A process of generating an accelerated ion beam is also provided that includes flowing a gas into proximity to said anode. By energizing a power supply electron flow is induced to the anode and the gas is ionized. Accelerating the ions from the anode through the linear ion emitting slit generates an accelerated ion beam by a process superior to that using a racetrack-shaped slit.
Abstract translation: 提供线性阳极层离子源，其包括具有线性离子发射狭缝的顶极。 顶极下的阳极具有与顶极离子发射狭缝对准的狭缝。 至少一个磁体产生通过阳极狭缝的磁场。 其中阳极狭缝的宽度为3mm以下。 还提供了产生加速离子束的过程，其包括使气体流动到所述阳极附近。 通过激励电源，电子流引入阳极并且气体被电离。 通过线性离子发射狭缝加速来自阳极的离子通过比使用跑道形狭缝的方法更高的加工离子束产生加速离子束。
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Patent Agency Ranking
公开(公告)号：US11092245B2
公开(公告)日：2021-08-17
申请号：US15568223
申请日：2016-04-22
Applicant: General Plasma, Inc.
Inventor： John E. Madocks
Abstract: A chamber valve (100) for use in processes requiring vacuum pressures has a compact design which minimizes the space needed for the valve in the travel direction. The chamber valve gate (116) is moveable between a first position in which the gate is offset from the portal (110), and a second position in which the gate is aligned with the portal. The gate will move into alignment with the portal while remaining within a plane parallel or nearly parallel to the portal.
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公开(公告)号：US20160133426A1
公开(公告)日：2016-05-12
申请号：US14897229
申请日：2014-06-12
Applicant: GENERAL PLASMA, INC.
Inventor： John E. Madocks
CPC classification number: H01J27/14 , H01J27/024 , H01J27/10 , H01J37/08
Abstract: A duoplasmatron is provided having a cathode, an anode with linear slit, and an intermediate electrode (IE) between the cathode and the anode where the IE has an opening that is aligned with the anode slit. A magnet forms a magnetic field that passes through the anode slit. A discharge passes from the cathode to the anode through the IE opening and the anode slit. The discharge is constricted through the IE opening and the magnetic field in the anode slit. An extractor external to the anode accelerates ions through an ion emitting slit aligned with the anode slit. A process of generating an accelerated ion beam is provided that includes flowing a gas into the IE and then energizing at least one power supply to induce electron flow to the anode. Ionizing the gas in the gap between the IE and anode. The ions are accelerated from the anode through the extractor ion emitting slit forming a linear ion beam.
Abstract translation: 提供了一种具有阴极，具有线性狭缝的阳极和在阴极和阳极之间的中间电极（IE）的双质子体，其中IE具有与阳极狭缝对准的开口。 磁体形成通过阳极狭缝的磁场。 放电通过IE开口和阳极狭缝从阴极传递到阳极。 放电通过IE开口和阳极狭缝中的磁场而收缩。 阳极外部的提取器通过与阳极狭缝对准的离子发射狭缝加速离子。 提供了产生加速离子束的过程，其包括使气体流入IE中，然后给至少一个电源通电以诱导电子流向阳极。 电离IE和阳极之间的间隙中的气体。 离子通过形成线性离子束的提取器离子发射狭缝从阳极加速。
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公开(公告)号：US20170345628A1
公开(公告)日：2017-11-30
申请号：US15540325
申请日：2015-10-26
Applicant: General Plasma Inc.
Inventor： Phong NGO , John E. Madocks
IPC: H01J37/34
CPC classification number: H01J37/3423 , H01J37/3405 , H01J37/3438 , H01J37/345 , H01J37/3452
Abstract: A rotary sputter magnetron assembly for use in sputtering target material onto a substrate is provided. The assembly comprises a longitudinally extending target tube having a longitudinal central axis, said target tube extending about a magnet array that is configured to generate a plasma confining magnetic field adjacent the target tube, said target tube supported for rotation about its longitudinal central axis and a pair of side shunts positioned parallel to the longitudinal central axis, and on opposing lengthwise sides of said target tube.
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8.发明授权公开(公告)号：US10273570B2
公开(公告)日：2019-04-30
申请号：US15180289
申请日：2016-06-13
Applicant: General Plasma Inc.
Inventor： John E. Madocks , Patrick Lawrence Morse , Phong Ngo
Abstract: An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.
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公开(公告)号：US10134557B2
公开(公告)日：2018-11-20
申请号：US14897232
申请日：2014-06-12
Applicant: General Plasma, Inc.
Inventor： John E. Madocks
Abstract: A linear anode layer ion source is provided that includes a top pole having a linear ion emitting slit. An anode under the top pole has a slit aligned with the top pole ion emitting slit. At least one magnet creates a magnetic field that passes through the anode slit. Wherein the width of the anode slit is 3 mm or less. A process of generating an accelerated ion beam is also provided that includes flowing a gas into proximity to said anode. By energizing a power supply electron flow is induced to the anode and the gas is ionized. Accelerating the ions from the anode through the linear ion emitting slit generates an accelerated ion beam by a process superior to that using a racetrack-shaped slit.
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