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    Ceramic Ion Source Chamber
    5.
    发明申请
    Ceramic Ion Source Chamber 审中-公开

    公开(公告)号：US20170309434A1

    公开(公告)日：2017-10-26

    申请号：US15644896

    申请日：2017-07-10

    Applicant: Varian Semiconductor Equipment Associates, Inc.

    Inventor： Craig R. Chaney ,  Neil J. Bassom

    IPC: H01J27/20 ,  H01J27/02

    CPC classification number: H01J27/205 ,  H01J27/022 ,  H01J27/024

    Abstract: The IHC ion source comprises an ion source chamber having a cathode and a repeller on opposite ends. The ion source chamber is constructed of a ceramic material having very low electrical conductivity. An electrically conductive liner may be inserted into the ion source chamber and may cover three sides of the ion source chamber. The liner may be electrically connected to the faceplate, which contains the extraction aperture. The electrical connections for the cathode and repeller pass through apertures in the ceramic material. In this way, the apertures may be made smaller than otherwise possible as there is no risk of arcing. In certain embodiments, the electrical connections are molded into the ion source chamber or are press fit in the apertures. Further, the ceramic material used for the ion source chamber is more durable and introduces less contaminants to the extracted ion beam.

    Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus
    6.
    发明授权
    Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus 有权
    带电粒子束产生装置，带电粒子束装置，高压发生装置和高电位装置

    公开(公告)号：US09548182B2

    公开(公告)日：2017-01-17

    申请号：US14406909

    申请日：2013-05-08

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Takashi Onishi ,  Shunichi Watanabe ,  Minoru Kaneda

    IPC: H01J37/04 ,  H01J37/073 ,  H01J37/02 ,  H01J37/067 ,  H01J37/248 ,  H01J37/24 ,  H01J27/02 ,  H01J29/48 ,  H01J37/16

    CPC classification number: H01J37/04 ,  H01J27/024 ,  H01J29/485 ,  H01J37/026 ,  H01J37/067 ,  H01J37/073 ,  H01J37/16 ,  H01J37/241 ,  H01J37/248 ,  H01J2237/16

    Abstract: An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.

    Abstract translation: 根据本发明的产生带电粒子束的仪器具有：带电粒子源; 多个第一电极，其沿带电粒子源的带电粒子的照射方向设置; 设置在所述第一电极之间的多个绝缘构件; 以及围绕所述多个第一电极安装的壳体。 壳体由绝缘固体材料形成，并且包括设置在靠近多个第一电极的位置处的多个第二电极。 所述多个第二电极中的至少一个电连接到所述多个第一电极中的至少一个，所述多个第二电极中的每一个具有与所述第一电极中的所述第一电极的电位相同的电位。

    Techniques for improving the performance and extending the lifetime of an ion source
    7.
    发明授权
    Techniques for improving the performance and extending the lifetime of an ion source 有权
    提高离子源性能和延长使用寿命的技术

    公开(公告)号：US09530615B2

    公开(公告)日：2016-12-27

    申请号：US13955852

    申请日：2013-07-31

    Applicant: Varian Semiconductor Equipment Associates, Inc.

    Inventor： Peter F. Kurunczi ,  Neil J. Bassom ,  Wilhelm P. Platow

    IPC: H01J37/30 ,  H01J37/04 ,  B08B7/00 ,  H01J27/02 ,  H01J37/02 ,  H01J37/08

    CPC classification number: H01J37/3002 ,  B08B7/0021 ,  H01J27/024 ,  H01J37/02 ,  H01J37/045 ,  H01J37/08 ,  H01J2237/022

    Abstract: A system and method of improving the performance and extending the lifetime of an ion source is disclosed. The ion source includes an ion source chamber, a suppression electrode and a ground electrode. In the processing mode, the ion source chamber may be biased to a first positive voltage, while the suppression electrode is biased to a negative voltage to attract positive ions from within the chamber through an aperture and toward the workpiece. In the cleaning mode, the ion source chamber may be grounded, while the suppression electrode is biased using a power supply having a high current capability. The voltage applied to the suppression electrode creates a plasma between the suppression electrode and the ion source chamber, and between the suppression electrode and the ground electrode.

    Abstract translation: 公开了改进离子源的性能和延长寿命的系统和方法。 离子源包括离子源室，抑制电极和接地电极。 在处理模式中，离子源室可以被偏置到第一正电压，而抑制电极被偏压到负电压，以通过孔径朝向工件吸引室内的正离子。 在清洁模式中，离子源室可以接地，而使用具有高电流能力的电源对抑制电极进行偏置。 施加到抑制电极的电压在抑制电极和离子源室之间以及在抑制电极和接地电极之间产生等离子体。

    SOURCE HOUSING ASSEMBLY FOR CONTROLLING ION BEAM EXTRACTION STABILITY AND ION BEAM CURRENT
    8.
    发明申请
    SOURCE HOUSING ASSEMBLY FOR CONTROLLING ION BEAM EXTRACTION STABILITY AND ION BEAM CURRENT 有权
    用于控制离子束提取稳定性和离子束电流的源壳体组件

    公开(公告)号：US20160336138A1

    公开(公告)日：2016-11-17

    申请号：US14713573

    申请日：2015-05-15

    Applicant: Varian Semiconductor Equipment Associates, Inc.

    Inventor： Shengwu Chang ,  Jeff Burgess ,  William Leavitt ,  Michael St Peter ,  Matt Mosher ,  Joe Olson ,  Frank Sinclair

    IPC: H01J27/08 ,  H01J9/18 ,  H01J9/385 ,  H01J27/02

    CPC classification number: H01J27/08 ,  H01J3/04 ,  H01J5/02 ,  H01J9/18 ,  H01J9/385 ,  H01J27/024 ,  H01J37/08

    Abstract: Provided herein are approaches for improving ion beam extraction stability and ion beam current for an ion extraction system. In one approach, a source housing assembly may include a source housing surrounding an ion source including an arc chamber, the source housing having an extraction aperture plate mounted at a proximal end thereof. The source housing assembly further includes a vacuum liner disposed within an interior of the source housing to form a barrier around a set of vacuum pumping apertures. As configured, openings in the source housing assembly, other than an opening in the extraction aperture plate, are enclosed by the extraction aperture plate and the vacuum liner, thus ensuring appendix arcs or extraneous ions produced outside the arc chamber remain within the source housing. Just those ions produced within the arc chamber exit the source housing through the opening of the extraction aperture plate.

    Abstract translation: 本文提供了用于改进离子提取系统的离子束提取稳定性和离子束电流的方法。 在一种方法中，源壳体组件可以包括围绕包括电弧室的离子源的源壳体，源壳体具有安装在其近端处的抽吸孔板。 源壳体组件还包括设置在源壳体的内部中以在一组真空泵浦孔周围形成屏障的真空衬套。 根据构造，源壳体组件中除了抽吸孔板中的开口之外的开口被提取孔板和真空衬套包围，从而确保在电弧室外产生的附加电弧或外来离子保留在源壳体内。 恰好在电弧室内产生的那些离子通过提取孔板的开口离开源壳体。

    Ion propulsion thruster including a plurality of ion optic electrode pairs
    9.
    发明授权
    Ion propulsion thruster including a plurality of ion optic electrode pairs 有权
    离子推进推进器包括多个离子光电极对

    公开(公告)号：US09494143B1

    公开(公告)日：2016-11-15

    申请号：US14152125

    申请日：2014-01-10

    Applicant: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration

    Inventor： Michael J. Patterson

    IPC: F03H1/00 ,  H01J27/02 ,  B64G1/40

    CPC classification number: F03H1/0037 ,  B64G1/405 ,  F03H1/0043 ,  F03H1/0075 ,  H01J27/024

    Abstract: Ion optics for use in a conventional or annular or other shaped ion thruster are disclosed including a plurality of planar, spaced apart ion optic electrode pairs sized to include a diameter smaller than the diameter of thruster exhaust and retained in, on or otherwise associated with a frame across the thruster exhaust. An electrical connection may be provided for establishing electrical connectivity among a set of first upstream electrodes and an electrical connection may be provided for establishing electrical connectivity among the second downstream electrodes.

    Abstract translation: 公开了用于常规或环形或其他形状离子推进器的离子光学器件，其包括多个平面间隔开的离子光电极对，其尺寸被设计成包括直径小于推进器排气的直径并且保持在其中或与其相关联 框架横跨推进器排气。 可以提供电连接以在一组第一上游电极之间建立电连接，并且可以提供用于在第二下游电极之间建立电连接性的电连接。

    Vacuum ultraviolet photoionization and chemical ionization combined ion source for mass spectrometry
    10.
    发明授权
    Vacuum ultraviolet photoionization and chemical ionization combined ion source for mass spectrometry 有权
    真空紫外光电离和化学电离组合离子源进行质谱分析

    公开(公告)号：US09412577B2

    公开(公告)日：2016-08-09

    申请号：US13884081

    申请日：2011-02-17

    Applicant: Haiyang Li ,  Lei Hua ,  Qinghao Wu ,  Huapeng Cui ,  Keyong Hou

    Inventor： Haiyang Li ,  Lei Hua ,  Qinghao Wu ,  Huapeng Cui ,  Keyong Hou

    IPC: H01J49/16 ,  G01N27/64 ,  H01J49/26 ,  G01N30/72 ,  H01J27/24 ,  H01J49/00 ,  H01J49/10 ,  H01J27/02 ,  H01J49/14

    CPC classification number: H01J49/161 ,  G01N27/64 ,  G01N30/72 ,  G01N2560/00 ,  H01J27/024 ,  H01J27/24 ,  H01J49/00 ,  H01J49/107 ,  H01J49/145 ,  H01J49/162 ,  H01J49/26

    Abstract: This invention relates to the field of mass spectrometry, and more specifically to a vacuum ultraviolet photoionization and chemical ionization combined ion source, which consists of a vacuum ultraviolet light source and an ion source chamber. An ion acceleration electrode, an ion repulsion electrode, an ion extraction electrode, and a differential interface electrode positioned inside the ion source chamber are arranged along the exit direction of the vacuum ultraviolet light beam in sequence and spaced, coaxial, and parallel from each other. The ion acceleration electrode, the ion repulsion electrode, the ion extraction electrode, and the differential interface electrode are all plate structures with central through holes. The vacuum ultraviolet light beam passes through the central through holes of the electrodes along the axial direction. By utilizing a single vacuum ultraviolet light source, the ion source is feasible to switch between two ionization modes, vacuum ultraviolet photoionization (VUV PI) and chemical ionization (CI), under suitable ion source pressure, thus greatly expanding the range of detectable samples.

    Abstract translation: 本发明涉及质谱领域，更具体地涉及由真空紫外光源和离子源室组成的真空紫外光电离和化学电离组合离子源。 位于离子源室内部的离子加速电极，离子斥力电极，离子引出电极和差动接口电极沿着真空紫外光束的排出方向依次排列并且彼此同轴并平行 。 离子加速电极，离子斥力电极，离子提取电极和差分界面电极都是具有中心通孔的板结构。 真空紫外光束沿着轴向穿过电极的中心通孔。 通过利用单一真空紫外光源，离子源可以在合适的离子源压力下在两种电离模式之间切换真空紫外光电离（VUV PI）和化学电离（CI），从而大大扩大可检测样品的范围。

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