摘要:
A surface relief structure includes a recording medium configured to be structurally modified when exposed to interfering and non-interfering portions of radiation beams, the structurally modified recording medium including, when viewed in a two-dimensional cross-section along one of the axes of the recording medium a plurality of equally spaced steps of fine-sized periodicity superimposed upon a plurality of deep depressions of substantially coarse-sized periodicity. The structurally modified recording medium is configured to produce in reflection single and multiple colors in a broad spectral range when illuminated by a source of light.
摘要:
A hologram is fabricated by opening a volume phase reflection hologram formed in a recording medium such as a positive photoresist. The opening occurs by forming a second hologram, such as an off-axis hologram, in the same recording medium. The opened hologram can be replicated in metal and the metal can be used to emboss the fringe pattern of the opened hologram into plastic. A full range of colors in the visible spectrum may be obtained by metallizing the embossed plastic structure and then by overcoating it with appropriate clear dielectric layers.
摘要:
An interference lithography system is described that is capable of exposing high resolution patterns in photosensitive media and employing yield increasing active stabilization techniques needed in production environments. The inventive device utilizes a division-of-wavefront interference lithography configuration which divides a single large field size optical beam using one or more mirrors, and is actively stabilized with a subsystem employing; a phase modulator operating on each divided wavefront section; a novel feedback apparatus for observing the relative phase shifts between interfering wavefront sections; and a control system for holding the relative phase shifts constant. The present invention also includes; a method for shaping the illumination beam's intensity distribution for more efficient power utilization and greater feature size uniformity; a horizontal substrate loading configuration compatible with robotic handling; an automated pattern pitch calibration for simple, flexible system reconfiguration; a compact clean-room compatible superstructure for increased passive stability in high vibration manufacturing environments; and a method for optimizing the polarization state of the interfering beam sections in a multiple mirror system.
摘要:
A hologram is fabricated by opening a volume phase reflection hologram formed in a recording medium such as a positive photoresist. The opening occurs by forming a second hologram, such as an off-axis hologram, in the same recording medium. The opened hologram can be replicated in metal and the metal can be used to emboss the fringe pattern of the opened hologram into plastic. A full range of colors in the visible spectrum may be obtained by metallizing the embossed plastic structure and then by overcoating it with appropriate clear dielectric layers.
摘要:
A hologram is fabricated by opening a volume phase reflection hologram formed in a recording medium such as a positive photoresist. The opening occurs by forming a second hologram, such as an off-axis hologram, in the same recording medium. The opened hologram can be replicated in metal and the metal can be used to emboss the fringe pattern of the opened hologram into plastic. A full range of colors in the visible spectrum may be obtained by metallizing the embossed plastic structure and then by overcoating it with appropriate clear dielectric layers.
摘要:
Exposure patterns are formed in photosensitive material by multiple beam laser interferometry by a method which involves exposing said photosensitive material simultaneously to at least three coherent beams of exposing radiation wherein the sources of said beams are arranged substantially symmetrically around an axis perpendicular to the plane of said photosensitive material. Preferably, surface relief patterns are formed by developing said exposed material. Apparatus for providing such multiple coherent beams is also disclosed.