Process for preparing photosensitive outer layer
    19.
    发明授权
    Process for preparing photosensitive outer layer 有权
    光敏外层制备方法

    公开(公告)号:US08017294B2

    公开(公告)日:2011-09-13

    申请号:US11900679

    申请日:2007-09-13

    IPC分类号: G03G5/147

    摘要: The presently disclosed embodiments are directed to an improved overcoat for an imaging member having a substrate, a charge transport layer, and an overcoat positioned on the charge transport layer, and a process for making the same including combining a resin having a reactive group selected from the group consisting of hydroxyl, carboxylic acid and amide groups, a melamine formaldehyde crosslinking agent, a crosslinkable fluoro additive, an acid catalyst, and a crosslinkable, alcohol-soluble charge transport molecule to form an overcoat solution, and subsequently providing the overcoat solution onto the charge transport layer to form an overcoat layer.

    摘要翻译: 目前公开的实施例涉及用于具有衬底,电荷传输层和位于电荷传输层上的外涂层的成像构件的改进外涂层,以及制备该成膜构件的方法,包括将具有反应性基团的树脂 由羟基,羧酸和酰胺基组成的组,三聚氰胺甲醛交联剂,可交联的氟添加剂,酸催化剂和可交联的醇可溶电荷转运分子,以形成外涂层溶液,随后将外涂层溶液 电荷输送层以形成外涂层。