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    Microwave choke apparatus for microwave oven
    11.
    发明授权
    Microwave choke apparatus for microwave oven 失效
    微波炉微波扼流器

    公开(公告)号：US5750969A

    公开(公告)日：1998-05-12

    申请号：US777403

    申请日：1996-12-27

    Applicant: Ho Kyeong Lee

    Inventor： Ho Kyeong Lee

    IPC: H05B6/76

    CPC classification number: H05B6/763

    Abstract: A microwave choke apparatus for a microwave oven includes an inner door panel having a plurality of multi-pronged and double-stepped portions extended outwardly therefrom, between which multi-pronged and double-stepped toothed portions there are alternately formed a plurality of slots, an outer door panel having an upwardly bent portion at an outer periphery thereof, and a choke cover for closing an opening formed between an inner side of the bent portion of the outer door panel and respective outer flat portions of the multi-pronged and double-stepped toothed portions of the inner door panel. The apparatus effectively prevents microwaves from leaking externally through a gap between a door frame and a front panel of the microwave oven by broadening a bandwidth of a choke resonant frequency of a choke channel.

    Abstract translation: 一种用于微波炉的微波扼流器装置包括：内门面板，具有从其向外延伸的多个多插脚和双阶梯部分，多个插脚和双阶齿状部分之间交替地形成多个狭槽， 外门板在其外周具有向上弯曲部分，以及阻风门盖，用于封闭形成在外门板的弯曲部分的内侧之间的开口和多管脚和双阶梯的相应的外平坦部分 内门板的齿形部分。 该装置通过扩大扼流圈的扼流圈共振频率的带宽，有效地防止微波从门框与微波炉前面板之间的间隙泄漏。

    NOVEL BIPHENYL DERIVATIVE OR PHARMACEUTICALLY ACCEPTABLE SALT THEREOF, AND PHARMACEUTICAL COMPOSITION FOR PREVENTING OR TREATING INFLAMMATORY DISEASES OR AUTOIMMUNE DISEASES COMPRISING THE SAME AS ACTIVE INGREDIENT
    12.
    发明申请
    NOVEL BIPHENYL DERIVATIVE OR PHARMACEUTICALLY ACCEPTABLE SALT THEREOF, AND PHARMACEUTICAL COMPOSITION FOR PREVENTING OR TREATING INFLAMMATORY DISEASES OR AUTOIMMUNE DISEASES COMPRISING THE SAME AS ACTIVE INGREDIENT 有权
    新颖的联苯衍生物或药物可接受的盐，以及用于预防或治疗包含其作为活性成分的炎症性疾病或自身免疫性疾病的药物组合物

    公开(公告)号：US20150291509A1

    公开(公告)日：2015-10-15

    申请号：US14237256

    申请日：2012-08-06

    Applicant: Chang Hoon Lee ,  Kyeong Lee

    Inventor： Chang Hoon Lee ,  Kyeong Lee

    IPC: C07C233/47 ,  C07D295/195

    CPC classification number: C07C233/47 ,  C07D295/192 ,  C07D295/195

    Abstract: The present invention relates to a novel biphenyl derivative or a pharmaceutically acceptable salt thereof, a pharmaceutical composition for preventing or treating inflammatory diseases or autoimmune diseases comprising the same as an active ingredient, and methods for treating inflammatory disease or autoimmune diseases with the pharmaceutical composition. Novel biphenyl derivatives according to the present invention promote the phagocytosis of macrophages and inhibit the chemotaxis to exhibit excellent inflammation terminating and anti-inflammatory effects and thus can be effectively used as therapeutic agents for inflammatory diseases or autoimmune diseases.

    Abstract translation: 本发明涉及一种新型的联苯衍生物或其药学上可接受的盐，用于预防或治疗炎性疾病的药物组合物或包含其作为活性成分的自身免疫性疾病，以及用药物组合物治疗炎性疾病或自身免疫性疾病的方法。 根据本发明的新型联苯衍生物促进巨噬细胞的吞噬作用并抑制趋化性表现出优异的炎症终止和抗炎作用，因此可以有效地用作炎性疾病或自身免疫性疾病的治疗剂。

    Systems, methods and computer program products for forming photomasks with reduced likelihood of feature collapse, and photomasks so formed
    13.
    发明授权
    Systems, methods and computer program products for forming photomasks with reduced likelihood of feature collapse, and photomasks so formed 有权
    用于形成具有降低特征崩溃可能性的光掩模的系统，方法和计算机程序产品以及如此形成的光掩模

    公开(公告)号：US08484584B2

    公开(公告)日：2013-07-09

    申请号：US13281787

    申请日：2011-10-26

    Applicant: Mi-kyeong Lee ,  Seong-woon Choi

    Inventor： Mi-kyeong Lee ,  Seong-woon Choi

    IPC: G06F17/50 ,  G03F1/00 ,  G03C5/00

    CPC classification number: G03F1/70

    Abstract: At least one pattern of a photomask is identified that has a likelihood of causing collapse of a microelectronic device feature that is formed using the photomask, due to surface tension of a solution that is applied to the feature during manufacture of the microelectronic device. The patterns of the photomask are then modified to reduce the likelihood of the collapse. The photomask may be formed and the photomask may be used to manufacture microelectronic devices. Related methods, systems, devices and computer program products are described.

    Abstract translation: 由于在微电子器件的制造期间由于施加到特征的溶液的表面张力，识别出具有导致由光掩模形成的微电子器件特征崩溃的可能性的至少一个光掩模图案。 然后修改光掩模的图案以减少崩溃的可能性。 可以形成光掩模，并且可以使用光掩模来制造微电子器件。 描述相关方法，系统，设备和计算机程序产品。

    SYSTEMS, METHODS AND COMPUTER PROGRAM PRODUCTS FOR FORMING PHOTOMASKS WITH REDUCED LIKELIHOOD OF FEATURE COLLAPSE, AND PHOTOMASKS SO FORMED
    16.
    发明申请
    SYSTEMS, METHODS AND COMPUTER PROGRAM PRODUCTS FOR FORMING PHOTOMASKS WITH REDUCED LIKELIHOOD OF FEATURE COLLAPSE, AND PHOTOMASKS SO FORMED 有权
    系统，方法和计算机程序产品，用于形成具有减少特征褶皱的光子，并形成光电子

    公开(公告)号：US20120210278A1

    公开(公告)日：2012-08-16

    申请号：US13281787

    申请日：2011-10-26

    Applicant: Mi-kyeong Lee ,  Seong-woon Choi

    Inventor： Mi-kyeong Lee ,  Seong-woon Choi

    IPC: G06F17/50

    CPC classification number: G03F1/70

    Abstract: At least one pattern of a photomask is identified that has a likelihood of causing collapse of a microelectronic device feature that is formed using the photomask, due to surface tension of a solution that is applied to the feature during manufacture of the microelectronic device. The patterns of the photomask are then modified to reduce the likelihood of the collapse. The photomask may be formed and the photomask may be used to manufacture microelectronic devices. Related methods, systems, devices and computer program products are described.

    Abstract translation: 由于在微电子器件的制造期间由于施加到特征的溶液的表面张力，识别出具有导致由光掩模形成的微电子器件特征崩溃的可能性的至少一个光掩模图案。 然后修改光掩模的图案以减少崩溃的可能性。 可以形成光掩模，并且可以使用光掩模来制造微电子器件。 描述相关方法，系统，设备和计算机程序产品。

    Thin film transistor substrate and display device having electrode plates on storage capacitors
    18.
    发明授权
    Thin film transistor substrate and display device having electrode plates on storage capacitors 有权
    薄膜晶体管基板和在存储电容器上具有电极板的显示装置

    公开(公告)号：US07968881B2

    公开(公告)日：2011-06-28

    申请号：US11945067

    申请日：2007-11-26

    Applicant: Jae Kyeong Lee ,  Hyo Taek Lim ,  Young Goo Song ,  Sahng Ik Jun ,  Ja Hee Woo

    Inventor： Jae Kyeong Lee ,  Hyo Taek Lim ,  Young Goo Song ,  Sahng Ik Jun ,  Ja Hee Woo

    IPC: H01L29/04 ,  H01L29/10 ,  H01L21/00 ,  G02F1/1343

    CPC classification number: G02F1/13624 ,  G02F1/136204 ,  G02F1/136286

    Abstract: The invention relates to a thin film transistor substrate and a display device including the same, and provides a thin film transistor substrate and a display device including the same, which can prevent damage of elements due to static electricity by forming, in each unit pixel region where a pair of first and second pixel electrodes, a pair of first and second drain electrode plates that are connected to the first and second pixel electrodes and to connected to drain terminals of thin film transistors, and can obtain a dot inversion driving effect through line inversion driving by connecting the first drain electrode in one pixel region to the first drain electrode plate, connecting the second drain electrode in the one unit pixel region to the second drain electrode plate, connecting a first drain electrode in another unit pixel region neighboring the one unit pixel region to the second drain electrode plate, and connecting a second drain electrode in another unit pixel region to the first drain electrode plate.

    Abstract translation: 本发明涉及一种薄膜晶体管基板和包括该薄膜晶体管基板的显示装置，并且提供一种薄膜晶体管基板及包括该薄膜晶体管基板的显示装置，其能够通过在每个单位像素区域中形成来防止由静电引起的元件的损坏 其中一对第一和第二像素电极，一对第一和第二漏极电极板，其连接到第一和第二像素电极并连接到薄膜晶体管的漏极端子，并且可以通过线路获得点反转驱动效应 通过将一个像素区域中的第一漏电极连接到第一漏电极板，将一个单位像素区域中的第二漏电极连接到第二漏极电极板，将第一漏电极连接在与该一个像素区域相邻的另一单位像素区域中的第一漏电极 单元像素区域连接到第二漏电极板，并且将另一单位像素区域中的第二漏电极连接到第二漏电极板 e第一个漏电极板。

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