公开(公告)号：US20110159760A1

公开(公告)日：2011-06-30

申请号：US13042254

申请日：2011-03-07

Applicant: Rainer Liebald ,  Wolfram Beier ,  Jochen Alkemper ,  Ulrich Schiffner

Inventor： Rainer Liebald ,  Wolfram Beier ,  Jochen Alkemper ,  Ulrich Schiffner

IPC: B32B17/02 ,  C03C14/00

CPC classification number: F41H5/0492 ,  C03C13/00 ,  F41H5/0471 ,  Y10T442/2623 ,  Y10T442/30 ,  Y10T442/40 ,  Y10T442/60

Abstract: The invention is based on the object of providing armoring that is lightweight and exhibits a denser microstructure that is improved as against ceramic composite materials. To this end, armoring against high dynamic impulsive loads is provided that comprises a composite material having at least two phases, the first phase forming a matrix for the second phase, and the first phase being a glass or a glass ceramic, and the second phase being embedded and distributed in the form of particles and/or fibers in the matrix formed by the material of the first phase.

Abstract translation: 本发明基于提供轻质的铠装的目的，并且具有相对于陶瓷复合材料改进的更密集的微结构。 为此，提供了抵抗高动态冲击载荷的装甲，其包括具有至少两相的复合材料，第一相形成用于第二相的基体，第一相为玻璃或玻璃陶瓷，第二相 在由第一相的材料形成的基体中以颗粒和/或纤维的形式嵌入和分布。

公开(公告)号：US07476623B2

公开(公告)日：2009-01-13

申请号：US11243443

申请日：2005-10-04

Applicant: Bianca Schreder ,  Rainer Liebald ,  Edgar Pawlowski ,  Dirk Sprenger ,  Dietrich Mund ,  Juergen Leib

Inventor： Bianca Schreder ,  Rainer Liebald ,  Edgar Pawlowski ,  Dirk Sprenger ,  Dietrich Mund ,  Juergen Leib

IPC: H01L21/302

CPC classification number: C03C15/00

Abstract: In the method for microstructuring flat glass substrates a substrate surface of a glass substrate is coated with at least one structured mask layer and subsequently exposed to a chemically reactive ion etching process (RIE) with at least one chemical etching gas. In order to provide the same or a higher quality etching and etching rate even for economical types of glass the chemical etching gas is mixed with at least one noble gas, so that the proportion of sputtering etching in the ion etching process is significantly increased.

Abstract translation: 在用于微结构化平板玻璃基板的方法中，玻璃基板的基板表面涂覆有至少一个结构化掩模层，随后用至少一种化学蚀刻气体暴露于化学反应离子蚀刻工艺（RIE）。 为了提供相同或更高质量的蚀刻和蚀刻速率，即使对于经济类型的玻璃，化学蚀刻气体与至少一种惰性气体混合，使得离子蚀刻工艺中溅射蚀刻的比例显着增加。

公开(公告)号：US20080257860A1

公开(公告)日：2008-10-23

申请号：US12107371

申请日：2008-04-22

Applicant: Bianca Schreder ,  Rainer Liebald ,  Edgar Pawlowski ,  Dirk Sprenger ,  Dietrich Mund ,  Juergen Leib

Inventor： Bianca Schreder ,  Rainer Liebald ,  Edgar Pawlowski ,  Dirk Sprenger ,  Dietrich Mund ,  Juergen Leib

IPC: B29D11/00

CPC classification number: C03C15/00

Abstract: In the method for microstructuring flat glass substrates a substrate surface of a glass substrate is coated with at least one structured mask layer and subsequently exposed to a chemically reactive ion etching process (RIE) with at least one chemical etching gas. In order to provide the same or a higher quality etching and etching rate even for economical types of glass the chemical etching gas is mixed with at least one noble gas, so that the proportion of sputtering etching in the ion etching process is significantly increased.

Abstract translation: 在用于微结构化平板玻璃基板的方法中，玻璃基板的基板表面涂覆有至少一个结构化掩模层，随后用至少一种化学蚀刻气体暴露于化学反应离子蚀刻工艺（RIE）。 为了提供相同或更高质量的蚀刻和蚀刻速率，即使对于经济类型的玻璃，化学蚀刻气体与至少一种惰性气体混合，使得离子蚀刻工艺中溅射蚀刻的比例显着增加。

公开(公告)号：US06698242B1

公开(公告)日：2004-03-02

申请号：US09504230

申请日：2000-02-15

Applicant: Wolfram Beier ,  Ulrike Beer ,  Roland Schnabel ,  Evelin Weiss ,  Stefan Hubert ,  Patrik Schober ,  Rainer Liebald

Inventor： Wolfram Beier ,  Ulrike Beer ,  Roland Schnabel ,  Evelin Weiss ,  Stefan Hubert ,  Patrik Schober ,  Rainer Liebald

IPC: C03C824

CPC classification number: C03C27/08 ,  Y10S228/903

Abstract: In the method according to the invention cold or unheated hardened glass and/or glass-ceramic parts are bonded together with a metallic ductile joining material, preferably silver, copper, aluminum or an alloy of those metals, to form a brittle article. The parts to be joined in an initial unheated state are placed with the metallic ductile joining material between them in a high frequency alternating field with frequencies preferably from 100 to 500 kHz. Then the joining material is inductively heated locally to melt it by means of the alternating field and the parts are pressed together to form a sufficiently strong bond between the parts.

Abstract translation: 在根据本发明的方法中，冷或未加热的硬化玻璃和/或玻璃 - 陶瓷部件用金属延性接合材料（优选银，铜，铝或这些金属的合金）粘合在一起，以形成脆性制品。 要在初始未加热状态下接合的部件在它们之间的金属延性接合材料放置在频率优选为100至500kHz的高频交变场中。 然后，接合材料被局部地感应加热，通过交变场熔化，并将这些部件压在一起以在部件之间形成足够牢固的结合。

公开(公告)号：US20120057337A1

公开(公告)日：2012-03-08

申请号：US12990355

申请日：2009-04-29

Applicant: Rainer Liebald ,  Claudia Stolz ,  Peter Brix ,  Simone Monika Ritter ,  Peter Nass ,  Dieter Goedeke ,  Sabine Pichler-Wilhelm ,  Sabrina Wimmer

Inventor： Rainer Liebald ,  Claudia Stolz ,  Peter Brix ,  Simone Monika Ritter ,  Peter Nass ,  Dieter Goedeke ,  Sabine Pichler-Wilhelm ,  Sabrina Wimmer

IPC: F21V9/00 ,  B05D5/06 ,  C09K11/80

CPC classification number: C03C14/006 ,  C03C3/068 ,  C03C3/091 ,  C03C3/093 ,  C03C3/095 ,  C03C3/16 ,  C03C4/12 ,  C03C2214/16 ,  C09K11/02 ,  C09K11/7774

Abstract: The invention relates to a conversion material, in particular for a white or colored light source comprising a semiconductor light source as primary light source, comprising a matrix glass that, as bulk material, for a thickness d of about 1 mm, has a pure transmission τi of greater than 80% in the wavelength region from 350 to 800 nm and in the region in which the primary light source emits light, wherein the sum of transmission and reflection of the sintered matrix glass without luminophore is at least greater than 80% in the spectral region from 350 nm to 800 nm and in the spectral region in which the primary light source emits light.

Abstract translation: 本发明涉及一种转换材料，特别是对于包含半导体光源作为主光源的白色或彩色光源，包括基体玻璃，其作为大体材料，厚度d为约1mm，具有纯传输 在350〜800nm的波长范围内和初级光源发光的区域中，τi大于80％，其中不含发光体的烧结基体玻璃的透射和反射总和至少大于80％ 从350nm到800nm的光谱区域和一次光源发光的光谱区域。

公开(公告)号：US07906444B2

公开(公告)日：2011-03-15

申请号：US12063701

申请日：2006-08-02

Applicant: Rainer Liebald ,  Wolfram Beier ,  Jochen Alkemper ,  Thilo Zachau ,  Dirk Sprenger

Inventor： Rainer Liebald ,  Wolfram Beier ,  Jochen Alkemper ,  Thilo Zachau ,  Dirk Sprenger

IPC: C03C10/04 ,  C03C10/08 ,  C03C10/02 ,  C03C14/00

CPC classification number: C03C10/0045 ,  C03C10/0054 ,  C03C14/002 ,  C03C2214/02 ,  C03C2214/20 ,  F41H5/0435

Abstract: The invention relates to a glass ceramic armour material consisting (in % by weight in relation to oxide base) of 5-33 SiO2, 20-50 Al2O3, 5-40 MgO, 0-15 B2O3, 0.1-30 Y2O3, Ln2O3, As2O3, Nb2O3 and/or Sc2O3 and 0-10 P2O5. The inventive armour material can also be reinforced with inorganic reinforcing fibres in a quantity of 5-65% by weight, preferably consisting of C, SiC, Si3N4, Al2O3, ZrO2 or Sialon. Said armour material is characterised in that it exhibits a high elasticity modulus and is producible from green glass without to fear a premature crystallisation.

Abstract translation: 本发明涉及一种由5-33SiO 2，20-50 Al 2 O 3，5-40MgO，0-15B 2 O 3，0.1-30 Y 2 O 3，L 2 O 3，As 2 O 3组成（相对于氧化物基的重量％）的玻璃陶瓷装甲材料 ，Nb 2 O 3和/或Sc 2 O 3和0-10 P 2 O 5。 本发明的装甲材料还可以用5-65重量％的量的无机增强纤维来增强，优选由C，SiC，Si 3 N 4，Al 2 O 3，ZrO 2或赛隆组成。 所述装甲材料的特征在于其显示出高弹性模量并且可以从绿色玻璃制造而不用担心过早结晶。

公开(公告)号：US20080248707A1

公开(公告)日：2008-10-09

申请号：US11940306

申请日：2007-11-14

Applicant: Rainer Liebald ,  Wolfram Beier ,  Jochen Alkemper ,  Ulrich Schiffner

Inventor： Rainer Liebald ,  Wolfram Beier ,  Jochen Alkemper ,  Ulrich Schiffner

IPC: C04B35/195 ,  B32B17/12 ,  C04B35/18 ,  C03B19/00

CPC classification number: F41H5/0492 ,  C03C13/00 ,  F41H5/0471 ,  Y10T442/2623 ,  Y10T442/30 ,  Y10T442/40 ,  Y10T442/60

Abstract: The invention is based on the object of providing armoring that is lightweight and exhibits a denser microstructure that is improved as against ceramic composite materials. To this end, armoring against high dynamic impulsive loads is provided that comprises a composite material having at least two phases, the first phase forming a matrix for the second phase, and the first phase being a glass or a glass ceramic, and the second phase being embedded and distributed in the form of particles and/or fibers in the matrix formed by the material of the first phase.

Abstract translation: 本发明基于提供轻质的铠装的目的，并且具有相对于陶瓷复合材料改进的更密集的微结构。 为此，提供了抵抗高动态冲击载荷的装甲，其包括具有至少两相的复合材料，第一相形成用于第二相的基体，第一相为玻璃或玻璃陶瓷，第二相 在由第一相的材料形成的基体中以颗粒和/或纤维的形式嵌入和分布。

公开(公告)号：US20070078048A1

公开(公告)日：2007-04-05

申请号：US11487620

申请日：2006-07-17

Applicant: Wolfgang Pannhorst ,  Ulf Dahlmann ,  Ulrich Fotheringham ,  Juergen Leib ,  Rainer Liebald

Inventor： Wolfgang Pannhorst ,  Ulf Dahlmann ,  Ulrich Fotheringham ,  Juergen Leib ,  Rainer Liebald

IPC: C03C3/097 ,  C03C21/00 ,  C03B13/00 ,  C03C23/00

CPC classification number: C03C3/068 ,  C03C3/064 ,  C03C3/097

Abstract: The glass is advantageous for microstructuring, especially reactive ion etching with fluorine and fluorine compounds, and has a glass composition based on oxide content and expressed in mol % of: SiO2, 40-70; GeO2, 0-30; B2O3, 5-20; P2O5, 5-20; WO3, 0-10; As2O3, 0-10; Yb2O3, 0-5; and Lu2O3, 0-5. Microstructure components, such as micro arrays, Fresnel lenses, micro wafers, or micro lens wafers, made by a method including reactive ion etching from the glass are also part of the present invention.

Abstract translation: 该玻璃有利于微结构化，特别是氟和氟化合物的反应离子蚀刻，并且具有基于氧化物含量并以摩尔％表示的玻璃组合物：SiO 2，40-70; GeO 2，0-30; B 2 O 3，5-20; P 5 5，5-20; WO 3，0-10; 作为2 3，0-10; Yb 2 O 3，0-5; 和Lu 2 O 3，0-5。 通过包括从玻璃进行反应离子蚀刻的方法制造的微结构组件，例如微阵列，菲涅耳透镜，微晶片或微透镜晶片也是本发明的一部分。

公开(公告)号：US20060079094A1

公开(公告)日：2006-04-13

申请号：US11243443

申请日：2005-10-04

Applicant: Bianca Schreder ,  Rainer Liebald ,  Edgar Pawlowski ,  Dirk Sprenger ,  Dietrich Mund ,  Juergen Leib

Inventor： Bianca Schreder ,  Rainer Liebald ,  Edgar Pawlowski ,  Dirk Sprenger ,  Dietrich Mund ,  Juergen Leib

IPC: H01L21/302 ,  C03C25/68 ,  C03B32/00 ,  C23C14/32

CPC classification number: C03C15/00

Abstract: In the method for microstructuring flat glass substrates a substrate surface of a glass substrate is coated with at least one structured mask layer and subsequently exposed to a chemically reactive ion etching process (RIE) with at least one chemical etching gas. In order to provide the same or a higher quality etching and etching rate even for economical types of glass the chemical etching gas is mixed with at least one noble gas, so that the proportion of sputtering etching in the ion etching process is significantly increased.

公开(公告)号：US20050096208A1

公开(公告)日：2005-05-05

申请号：US10953693

申请日：2004-09-29

Applicant: Thilo Zachau ,  Rainer Liebald ,  Dirk Sprenger ,  Meike Schneider

Inventor： Thilo Zachau ,  Rainer Liebald ,  Dirk Sprenger ,  Meike Schneider

IPC: C03C10/08 ,  C03C3/087 ,  C03C3/091 ,  C03C10/00 ,  C03C10/02 ,  G02F1/1333 ,  H01L29/786 ,  H01L31/04

CPC classification number: C03C10/0045 ,  C03C10/0054 ,  G02F2001/133302

Abstract: A glass ceramic comprises (in wt.-% on oxide basis): SiO2 35 to 60, B2O3>4 to 10, P2O5 0 to 10, Al2O3 16.5 to 40, TiO2 1 to 10, Ta2O5 0 to 8, Y2O3 0 to 6, ZrO21 to 10, MgO 6 to 20, CaO 0 to 10, SrO 0 to 4, BaO 0 to 8, ZnO 0 to 4, SnO2+CeO2 0 to 4, SO42−+Cl− 0 to 4, wherein the total content (SnO2+CeO2+S042−+Cl−) is between 0.01 and 4 wt.-%. The glass ceramic may be processed by the float glass method, may be transparent and is, inter alia, suitable as a substrate for thin film semiconductors, in particular for display applications, solar cells etc.

Abstract translation: 玻璃陶瓷包含（以氧化物为基准的重量％）：SiO 2→35〜60，B 2 O 3→4〜10 ，P 2 O <0> 0至10，Al 2 O 3 16.5至40，TiO 2 1〜10，Ta 2 O 5，0〜8，Y 2 O 3→0〜 6，ZrO 2 1〜10，MgO 6〜20，CaO 0〜10，SrO 0〜4，BaO 0〜8，ZnO 0〜4，SnO 2 + 0至4，SO 4，SO 2 - ，SO 2 - ， - SO 2 - ， - SO 2 - ， - SO 2 - SnO 2 + C 2 O 2 + S 0 4 - - - - - - - - - - - - - - - - - - - 在0.01至4重量％之间。 玻璃陶瓷可以通过浮法玻璃法处理，可以是透明的，并且尤其适合作为薄膜半导体的衬底，特别是用于显示器应用，太阳能电池等。