公开(公告)号：US20080206668A1

公开(公告)日：2008-08-28

申请号：US12036692

申请日：2008-02-25

申请人： Wataru HOSHINO ,  Kenji Wada

发明人： Wataru HOSHINO ,  Kenji Wada

IPC分类号： G03F7/004 ,  G03F7/26

CPC分类号： G03F7/038 ,  G03F7/0382

摘要： A negative resist composition includes: (A) a compound having at least one episulfide structure (a three-membered ring structure comprising two C atoms and one S atom); (B) an alkali-soluble resin; and (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method using the composition.

摘要翻译： 负性抗蚀剂组合物包括：（A）具有至少一个环硫结构的化合物（包含两个C原子和一个S原子的三元环结构）; （B）碱溶性树脂; 和（C）能够在用光化射线或辐射照射时能够产生酸的化合物和使用该组合物的图案形成方法。

公开(公告)号：US08241840B2

公开(公告)日：2012-08-14

申请号：US12825088

申请日：2010-06-28

申请人： Hideaki Tsubaki ,  Shinji Tarutani ,  Kazuyoshi Mizuyoshi ,  Kenji Wada ,  Wataru Hoshino

发明人： Hideaki Tsubaki ,  Shinji Tarutani ,  Kazuyoshi Mizuyoshi ,  Kenji Wada ,  Wataru Hoshino

IPC分类号： G03F7/30 ,  G03F7/004

CPC分类号： G03F7/0397 ,  G03F7/325 ,  Y10S430/106 ,  Y10S430/111

摘要： A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.

摘要翻译： 图案形成方法包括：（a）用包含由以下通式（NGH-1）表示的重复单元的树脂的抗蚀剂组合物涂布基材，并且通过酸的作用增加极性，并降低 在负显影液中的溶解度; （b）曝光; 和（d）用负显影液显影：其中RNGH1表示氢原子或烷基; 并且RNGH 2至RNGH 4各自独立地表示氢原子或羟基，条件是RNGH 2至RNGH 4中的至少一个表示羟基。

公开(公告)号：US08088566B2

公开(公告)日：2012-01-03

申请号：US12053653

申请日：2008-03-24

申请人： Wataru Hoshino ,  Hideaki Tsubaki ,  Masahiro Yoshidome

发明人： Wataru Hoshino ,  Hideaki Tsubaki ,  Masahiro Yoshidome

IPC分类号： G03F7/26 ,  G03F7/004

CPC分类号： G03F7/2041 ,  G03F7/0035 ,  G03F7/11 ,  G03F7/40 ,  Y10T428/24802

摘要： A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.

摘要翻译： 用于形成抗蚀剂图案的表面处理剂包括：如说明书中所定义的由式（1）表示的化合物，其中所述表面处理剂用于在第一抗蚀剂上形成第一抗蚀剂图案之间的步骤 膜和第一抗蚀剂图案上形成第二抗蚀剂膜以形成第二抗蚀剂图案，并且图案形成方法使用表面处理剂。

公开(公告)号：US20110305992A1

公开(公告)日：2011-12-15

申请号：US13196530

申请日：2011-08-02

申请人： Shinji TARUTANI ,  Hideaki TSUBAKI ,  Kazuyoshi MIZUTANI ,  Kenji WADA ,  Wataru HOSHINO

发明人： Shinji TARUTANI ,  Hideaki TSUBAKI ,  Kazuyoshi MIZUTANI ,  Kenji WADA ,  Wataru HOSHINO

IPC分类号： H01L21/02 ,  H01L21/77

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

摘要： A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

摘要翻译： 一种图案形成方法，包括施加抗蚀剂组合物的步骤，所述抗蚀剂组合物在负光谱显影剂中的溶解度随着光化射线或辐射的照射而降低，并且其含有具有脂环族烃结构和分散性为1.7以下并且能够增加的树脂 通过酸的作用的极性，曝光步骤和使用负色调显影剂的显影步骤; 用于该方法的抗蚀剂组合物; 并且提供了用于该方法的显影剂和冲洗溶液，由此可以形成线边缘粗糙度降低且尺寸均匀性高的图案。

公开(公告)号：US20100040971A1

公开(公告)日：2010-02-18

申请号：US12578503

申请日：2009-10-13

申请人： Shinji TARUTANI ,  Hideaki TSUBAKI ,  Kazuyoshi MIZUTANI ,  Kenji WADA ,  Wataru HOSHINO

发明人： Shinji TARUTANI ,  Hideaki TSUBAKI ,  Kazuyoshi MIZUTANI ,  Kenji WADA ,  Wataru HOSHINO

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/40 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325

摘要： A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

公开(公告)号：US20090011366A1

公开(公告)日：2009-01-08

申请号：US12145151

申请日：2008-06-24

申请人： Hideaki TSUBAKI ,  Shinji Tarutani ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

发明人： Hideaki TSUBAKI ,  Shinji Tarutani ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

IPC分类号： G03C1/053 ,  G03F7/20

CPC分类号： G03F7/0397 ,  G03F7/325 ,  Y10S430/106 ,  Y10S430/111

摘要： A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.

摘要翻译： 图案形成方法包括：（a）用包含由以下通式（NGH-1）表示的重复单元的树脂的抗蚀剂组合物涂布基材，并且通过酸的作用增加极性，并降低 在负显影液中的溶解度; （b）曝光; 和（d）用负显影液显影：其中RNGH1表示氢原子或烷基; 并且RNGH 2至RNGH 4各自独立地表示氢原子或羟基，条件是RNGH 2至RNGH 4中的至少一个表示羟基。

公开(公告)号：US08034547B2

公开(公告)日：2011-10-11

申请号：US12145151

申请日：2008-06-24

申请人： Hideaki Tsubaki ,  Shinji Tarutani ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

发明人： Hideaki Tsubaki ,  Shinji Tarutani ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

IPC分类号： G03F7/30

CPC分类号： G03F7/0397 ,  G03F7/325 ,  Y10S430/106 ,  Y10S430/111

摘要： A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.

摘要翻译： 图案形成方法包括：（a）用包含由以下通式（NGH-1）表示的重复单元的树脂的抗蚀剂组合物涂布基材，并且通过酸的作用增加极性，并降低 在负显影液中的溶解度; （b）曝光; 和（d）用负显影液显影：其中RNGH1表示氢原子或烷基; 并且RNGH 2至RNGH 4各自独立地表示氢原子或羟基，条件是RNGH 2至RNGH 4中的至少一个表示羟基。

公开(公告)号：US20080193878A1

公开(公告)日：2008-08-14

申请号：US12029784

申请日：2008-02-12

申请人： Masaomi MAKINO ,  Wataru HOSHINO ,  Kazuyoshi MIZUTANI

发明人： Masaomi MAKINO ,  Wataru HOSHINO ,  Kazuyoshi MIZUTANI

IPC分类号： G03F7/004 ,  G03F7/26

CPC分类号： G03F7/0392 ,  G03F7/0397

摘要： A resist composition includes: (A) a resin containing a repeating unit having a specific secondary benzyl structure; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method using the composition.

摘要翻译： 抗蚀剂组合物包括：（A）含有具有特定的仲苄基结构的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物和使用该组合物的图案形成方法。