公开(公告)号：US20100093955A1

公开(公告)日：2010-04-15

申请号：US12450314

申请日：2008-03-21

Applicant: Dai-Seung Choi ,  Hye-Young Jung ,  Sung-Ho Chun ,  Heon Kim ,  Sung-Don Hong ,  Dong-Woo Yoo

Inventor： Dai-Seung Choi ,  Hye-Young Jung ,  Sung-Ho Chun ,  Heon Kim ,  Sung-Don Hong ,  Dong-Woo Yoo

IPC: C08F4/44 ,  C08F4/00 ,  C08F4/06 ,  C08F24/00 ,  C08F18/02 ,  C07D311/02 ,  C07C69/00

CPC classification number: C08F290/00 ,  C08F210/02 ,  C08F290/14 ,  C08F297/00 ,  C08F297/06 ,  C08F232/00 ,  C08F2500/25 ,  C08F2500/26

Abstract: The present invention relates to a photoreactive polymer that comprises a multi-cyclic compound in a main chain, and a polymerization method thereof. Since the photoreactive polymer according to the present invention comprises a multi-cyclic compound having a high glass transition temperature as a main chain, the thermal stability is excellent, and since the mobility of the main chain is relatively high as compared to that of an additional polymer, a photoreactive group can be freely moved in the main chain of the polymer. Accordingly, it is possible to overcome a slow photoreactive rate that is considered a disadvantage of a polymer material used to prepare an alignment film for known liquid crystal display devices.

Abstract translation: 本发明涉及在主链中包含多环化合物的光反应性聚合物及其聚合方法。 由于根据本发明的光反应性聚合物包含具有高玻璃化转变温度作为主链的多环化合物，因此热稳定性优异，并且由于主链的迁移率与附加的相比高， 聚合物，光反应性基团可以在聚合物的主链中自由移动。 因此，可以克服被认为是用于制备用于已知液晶显示装置的取向膜的聚合物材料的缺点的缓慢的光反应速率。

公开(公告)号：US20100041237A1

公开(公告)日：2010-02-18

申请号：US12442607

申请日：2007-09-20

Applicant: Sang-Yu Lee ,  Jee-Heum Paik ,  Soo-Hong Kim ,  Chang-Woo Yoo ,  Sung-Woon Yoon

Inventor： Sang-Yu Lee ,  Jee-Heum Paik ,  Soo-Hong Kim ,  Chang-Woo Yoo ,  Sung-Woon Yoon

IPC: H01L21/306

CPC classification number: H01L23/48 ,  H01L21/31111 ,  H01L21/31144 ,  H01L21/32134 ,  H01L2924/0002 ,  H05K3/06 ,  H05K3/064 ,  H05K2203/0597 ,  H05K2203/1476 ,  H01L2924/00

Abstract: A method for forming a fine pattern using isotropic etching, includes the steps of forming an etching layer on a semiconductor substrate, and coating a photoresist layer on the etching layer, performing a lithography process with respect to the etching layer coated with the photoresist layer, and performing a first isotropic etching process with respect to the etching layer including a photoresist pattern formed through the lithography process, depositing a passivation layer on the etching layer including the photoresist pattern, and performing a second isotropic etching process with respect to the passivation layer. The second isotropic etching process is directly performed without removing the predetermined portion of the passivation layer.

Abstract translation: 使用各向同性蚀刻形成精细图案的方法包括以下步骤：在半导体衬底上形成蚀刻层，并在蚀刻层上涂覆光致抗蚀剂层，对涂覆有光致抗蚀剂层的蚀刻层进行光刻处理， 以及对包括通过光刻工艺形成的光致抗蚀剂图案的蚀刻层执行第一各向同性蚀刻工艺，在包括光致抗蚀剂图案的蚀刻层上沉积钝化层，并对钝化层执行第二各向同性蚀刻工艺。 在不去除钝化层的预定部分的情况下直接进行第二各向同性蚀刻处理。

公开(公告)号：US20090231815A1

公开(公告)日：2009-09-17

申请号：US12402593

申请日：2009-03-12

Applicant: Duk-Yong KIM ,  Jung-Pil Lee ,  Kyoung-Seuk Kim ,  Chang-Woo Yoo ,  Sung-Ho Jang

Inventor： Duk-Yong KIM ,  Jung-Pil Lee ,  Kyoung-Seuk Kim ,  Chang-Woo Yoo ,  Sung-Ho Jang

IPC: H05K7/20

CPC classification number: H05K7/20409 ,  H05K7/20163

Abstract: An enclosure device of a wireless communication apparatus, which has a tubular structure with increased heat dissipation not unknown heretofore. A section of the enclosure device has a polygonal or circular shape, such as a substantially cylindrical structure, and the enclosure, which has a plurality of radiation fins arranged on an outer surface of the enclosure in a vertical direction, is formed integrally with the radiation fins by using a compression method. Various communication devices of the wire communication apparatus are mounted on the interior of the enclosure. The structure is preferably formed by the radiation fins and exhibits an increased radiation effect than that of a structure where radiation fins are arranged side by side on a flat plane.

Abstract translation: 一种无线通信装置的封闭装置，其具有以往未知的具有增加的热耗散的管状结构。 封闭装置的一部分具有多边形或圆形形状，例如基本上圆柱形的结构，并且具有沿垂直方向布置在外壳的外表面上的多个辐射翅片的外壳与辐射一体地形成 翅片采用压缩法。 有线通信装置的各种通信装置安装在外壳的内部。 该结构优选地由辐射翅片形成，并且与在平面上并排布置散热片的结构相比表现出增加的辐射效果。

公开(公告)号：USD562286S1

公开(公告)日：2008-02-19

申请号：US29271379

申请日：2007-01-18

Applicant: Seung Jae Lim ,  Hyun Woo Yoo ,  Hyung Gon Ryu

Designer： Seung Jae Lim ,  Hyun Woo Yoo ,  Hyung Gon Ryu

公开(公告)号：US20070127898A1

公开(公告)日：2007-06-07

申请号：US11674048

申请日：2007-02-12

Applicant: Woo Yoo

Inventor： Woo Yoo

IPC: F26B19/00

CPC classification number: H01L21/68764 ,  H01L21/67109 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67745

Abstract: A process chamber includes an opening, two or more stacked cold plates adjacent the opening, two or more stacked hot plates adjacent the cold plates, and a rotatable wafer transport capable of moving a wafer between the cold plates and between the hot plates for processing of the wafer. The wafer can be rapidly heated while between the hot plates. The wafer transport has perpendicular walls about a pivot such that when the wafer is between the cold plates or between the hot plates, one of the walls separates the cold and hot portions, thereby increasing the efficiency of cooling and heating.

公开(公告)号：US20070121105A1

公开(公告)日：2007-05-31

申请号：US11291246

申请日：2005-11-30

Applicant: Woo Yoo

Inventor： Woo Yoo

IPC: G01N21/88 ,  G01B11/24

CPC classification number: G01B11/2513 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95615

Abstract: Systems and techniques for characterizing samples using optical techniques. Coherent light may be incident on a sample, and a diffraction pattern detected. Information indicative of diffraction pattern intensity may be used to determine one or more sample characteristics and/or one or more pattern characteristics. For example, sample characteristics such as stress, warpage, curvature, and contamination may be determined. The coherent light may be light of a single wavelength, or may be light of multiple wavelengths.

Abstract translation: 使用光学技术表征样品的系统和技术。 相干光可能入射到样品上，并且检测到衍射图。 可以使用指示衍射图强度的信息来确定一个或多个样品特性和/或一个或多个图案特征。 例如，可以确定应力，翘曲，曲率和污染等样品特性。 相干光可以是单个波长的光，或者可以是多个波长的光。

公开(公告)号：US20060291830A1

公开(公告)日：2006-12-28

申请号：US11144359

申请日：2005-06-03

Applicant: Woo Yoo

Inventor： Woo Yoo

IPC: A21B2/00 ,  F26B19/00

CPC classification number: H01L21/68764 ,  H01L21/67109 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67745

Abstract: A process chamber includes an opening, two or more stacked cold plates adjacent the opening, two or more stacked hot plates adjacent the cold plates, and a rotatable wafer transport capable of moving a wafer between the cold plates and between the hot plates for processing of the wafer. The wafer can be rapidly heated while between the hot plates. The wafer transport has perpendicular walls about a pivot such that when the wafer is between the cold plates or between the hot plates, one of the walls separates the cold and hot portions, thereby increasing the efficiency of cooling and heating.

Abstract translation: 处理室包括开口，邻近开口的两个或多个堆叠的冷板，与冷板相邻的两个或多个堆叠的热板，以及能够在冷板之间和热板之间移动晶片的可旋转的晶片输送器，用于处理 晶圆。 可以在热板之间快速加热晶片。 晶片输送器具有围绕枢轴的垂直壁，使得当晶片位于冷板之间或热板之间时，其中一个壁分离冷热部分，从而提高冷却和加热的效率。

公开(公告)号：US20060154458A1

公开(公告)日：2006-07-13

申请号：US11366121

申请日：2006-03-02

Applicant: Woo Yoo

Inventor： Woo Yoo

IPC: H01L21/425

CPC classification number: H01L21/26513 ,  H01L29/66575 ,  H01L29/6659

Abstract: A method of forming ultra shallow junctions in p-type devices uses aluminum ion to implant n-doped silicon, followed a low temperature anneal to activate and diffuse the aluminum. The use of aluminum provides numerous advantages over boron such as the ability to form shallower junctions, lower resistivity, and the ability to use lower temperature annealing.

公开(公告)号：US20060128160A1

公开(公告)日：2006-06-15

申请号：US11009764

申请日：2004-12-10

Applicant: Woo Yoo

Inventor： Woo Yoo

IPC: H01L21/302 ,  H01L21/461 ,  H01L21/306

CPC classification number: H01L21/31138 ,  G03F7/427

Abstract: Photoresist is removed from a wafer or substrate during various stages of processing by introducing a solvent vapor, along with heat, into the processing chamber. The solvent vapor chemically reacts with the photoresist to quickly and cleanly strip away the exposed photoresist.

Abstract translation: 通过将溶剂蒸气与加热一起引入处理室，在各个处理阶段将光致抗蚀剂从晶片或基材上除去。 溶剂蒸汽与光致抗蚀剂发生化学反应，以快速且干净地剥离暴露的光致抗蚀剂。

公开(公告)号：US20050074324A1

公开(公告)日：2005-04-07

申请号：US10677511

申请日：2003-10-01

Applicant: Woo Yoo

Inventor： Woo Yoo

IPC: F03D1/02 ,  F03D1/04 ,  F03D7/02

CPC classification number: F03D1/04 ,  F03D1/02 ,  F03D9/11 ,  F03D9/25 ,  F03D13/20 ,  F05B2240/40 ,  Y02E10/72

Abstract: A wind power system is provided including at least one motor fan having a front face and a rear face. The system also includes a first wind capturing device positioned proximate to the front face. The wind capturing device can be configured to capture wind to create a first pressure proximate to the front face that is greater than a second pressure proximate to the rear face. The pressure difference causes the captured wind to flow across the at least one motor fan from the front face to the rear face.

Abstract translation: 提供一种风力发电系统，其包括具有前表面和后表面的至少一个电动机风扇。 该系统还包括靠近前表面定位的第一风力捕获装置。 风力捕获装置可被配置成捕获风以产生靠近前表面的第一压力，该第一压力大于靠近后表面的第二压力。 压力差导致所捕获的风从前表面到后表面流过至少一个电动机风扇。