Method of delivering gas into reaction chamber and shower head used to deliver gas
    11.
    发明授权
    Method of delivering gas into reaction chamber and shower head used to deliver gas 有权
    将气体输送到用于输送气体的反应室和淋浴喷头中的方法

    公开(公告)号:US06478872B1

    公开(公告)日:2002-11-12

    申请号:US09467313

    申请日:1999-12-20

    CPC classification number: C30B25/14 C23C16/45548 C23C16/45565 C23C16/45574

    Abstract: A method of delivering two or more mutually-reactive reaction gases when a predetermined film is deposited on a substrate, and a shower head used in the gas delivery method, function to increase the film deposition rate while preventing formation of contaminating particles. In this method, one reaction gas is delivered toward the edge of the substrate, and the other reaction gases are delivered toward the central portion of the substrate, each of the reaction gases being delivered via an independent gas outlet to prevent the reaction gases from being mixed. In the shower head, separate passages are provided to prevent the first reaction gas from mixing with the other reaction gases by delivering the first reaction gas from outlets formed around the edge of the bottom surface of the shower head. The other reaction gases are delivered from outlets formed in the central portion of the bottom surface of the shower head. Accordingly, one of the mutually-reactive gases is delivered toward the central portion of the substrate, and the others are delivered toward the edge of the substrate.

    Abstract translation: 当将预定的膜沉积在基底上时输送两个或更多个相互反应的反应气体的方法和用于气体输送方法的淋浴头的作用是提高膜沉积速率同时防止污染颗粒的形成。 在该方法中,一个反应气体被输送到基板的边缘,并且其它反应气体被输送到基板的中心部分,每个反应气体经由独立的气体出口输送,以防止反应气体 混合 在喷淋头中,设置分开的通道,以防止第一反应气体与其它反应气体混合,通过从喷淋头底表面的边缘周围形成的出口输送第一反应气体。 其他反应气体从形成在淋浴喷头的底面的中心部分的出口输送。 因此,相互反应的气体中的一种被输送到基板的中心部分,而其它的被传送到基板的边缘。

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