公开(公告)号：US20110266256A1

公开(公告)日：2011-11-03

申请号：US12916462

申请日：2010-10-29

Applicant: James P. Cruse ,  Dermot Cantwell ,  Ming Xu ,  Charles Hardy ,  Benjamin Schwarz ,  Kenneth S. Collins ,  Andrew Nguyen ,  Zhifeng Sui ,  Evans Lee

Inventor： James P. Cruse ,  Dermot Cantwell ,  Ming Xu ,  Charles Hardy ,  Benjamin Schwarz ,  Kenneth S. Collins ,  Andrew Nguyen ,  Zhifeng Sui ,  Evans Lee

IPC: C23F1/00 ,  C23C16/455

CPC classification number: H01L21/6719 ,  H01J37/32899

Abstract: Methods for processing substrates in twin chamber processing systems having first and second process chambers and shared processing resources are provided herein. In some embodiments, a method may include providing a substrate to the first process chamber of the twin chamber processing system, wherein the first process chamber has a first processing volume that is independent from a second processing volume of the second process chamber; providing one or more processing resources from the shared processing resources to only the first processing volume of the first process chamber; and performing a process on the substrate in the first process chamber.

Abstract translation: 本文提供了具有第一处理室和第二处理室以及共享处理资源的双室处理系统中处理基板的方法。 在一些实施例中，方法可以包括向双室处理系统的第一处理室提供衬底，其中第一处理室具有独立于第二处理室的第二处理容积的第一处理容积; 将所述共享处理资源中的一个或多个处理资源提供给所述第一处理室的所述第一处理空间; 以及在所述第一处理室中的所述基板上进行处理。

公开(公告)号：US20110265814A1

公开(公告)日：2011-11-03

申请号：US12915240

申请日：2010-10-29

Applicant: JAMES P. CRUSE ,  DERMOT CANTWELL ,  MING XU ,  CHARLES HARDY ,  BENJAMIN SCHWARZ ,  KENNETH S. COLLINS ,  ANDREW NGUYEN ,  ZHIFENG SUI ,  EVANS LEE

Inventor： JAMES P. CRUSE ,  DERMOT CANTWELL ,  MING XU ,  CHARLES HARDY ,  BENJAMIN SCHWARZ ,  KENNETH S. COLLINS ,  ANDREW NGUYEN ,  ZHIFENG SUI ,  EVANS LEE

IPC: B08B6/00

CPC classification number: H01L21/6719 ,  H01J37/32899

Abstract: Methods for processing substrates in twin chamber processing systems having first and second process chambers and shared processing resources are provided herein. In some embodiments, a method may include flowing a process gas from a shared gas panel to a processing volume of the first process chamber and to a processing volume of the second process chamber; forming a first plasma in the first processing volume to process the first substrate and a second plasma to process the second substrate; monitoring the first processing volume and the second processing volume to determine if a process endpoint is reached in either volume; and either terminating the first and second plasma simultaneously when a first endpoint is reached; or terminating the first plasma when a first endpoint is reached in the first processing volume while continuing to provide the second plasma in the second processing volume until a second endpoint is reached.

Abstract translation: 本文提供了具有第一处理室和第二处理室以及共享处理资源的双室处理系统中处理基板的方法。 在一些实施例中，一种方法可以包括使处理气体从共用气体面板流动到第一处理室的处理容积和第二处理室的处理容积; 在所述第一处理体积中形成第一等离子体以处理所述第一基板和第二等离子体以处理所述第二基板; 监测第一处理量和第二处理量以确定任一体积中是否达到过程终点; 并且当达到第一端点时同时终止第一和第二等离子体; 或在第一处理容积中达到第一端点时终止第一等离子体，同时继续在第二处理容积中提供第二等离子体直到达到第二端点。

公开(公告)号：US20100224322A1

公开(公告)日：2010-09-09

申请号：US12699677

申请日：2010-02-03

Applicant: ZHIFENG SUI ,  Matthew F. Davis

Inventor： ZHIFENG SUI ,  Matthew F. Davis

IPC: C23F1/08 ,  B05C11/00 ,  H01L21/3065

CPC classification number: G01N21/68 ,  H01J37/32357 ,  H01J37/32963 ,  H01J37/32972

Abstract: An analysis chamber coupled to a processing chamber includes an actively switchable capacitive-inductive coupling apparatus providing excitation in a capacitively coupled mode and an inductively coupled mode.

Abstract translation: 耦合到处理室的分析室包括提供电容耦合模式和电感耦合模式的激励的可主动切换的电容感应耦合装置。