公开(公告)号：US11099489B2

公开(公告)日：2021-08-24

申请号：US16712862

申请日：2019-12-12

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Hilko Dirk Bos ,  Erik Johan Koop ,  Armand Eugene Albert Koolen ,  Han-Kwang Nienhuys ,  Alessandro Polo ,  Jin Lian ,  Arie Jeffrey Den Boef

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956 ,  G01N21/95

Abstract: The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.

公开(公告)号：US10983445B2

公开(公告)日：2021-04-20

申请号：US16268564

申请日：2019-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh Pandey ,  Zili Zhou ,  Gerbrand Van Der Zouw ,  Arie Jeffrey Den Boef ,  Markus Gerardus Martinus Maria Van Kraaij ,  Armand Eugene Albert Koolen ,  Hugo Augustinus Joseph Cramer ,  Paul Christiaan Hinnen ,  Martinus Hubertus Maria Van Weert ,  Anagnostis Tsiatmas ,  Shu-jin Wang ,  Bastiaan Onne Fagginger Auer ,  Alok Verma

IPC: G03F7/20 ,  G01N21/21 ,  G01N21/88

Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

公开(公告)号：US20190317413A1

公开(公告)日：2019-10-17

申请号：US16379267

申请日：2019-04-09

Applicant: ASML Netherlands B.V.

Inventor： Su-Ting CHENG ,  Sergei Sokolov ,  Armand Eugene Albert Koolen

IPC: G03F7/20 ,  G01B11/26

Abstract: Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.

公开(公告)号：US20180173111A1

公开(公告)日：2018-06-21

申请号：US15833130

申请日：2017-12-06

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Armand Eugene Albert Koolen

IPC: G03F7/20 ,  H01L21/68

Abstract: Metrology apparatus and methods for measuring a structure formed on a substrate by a lithographic process are disclosed. In one arrangement an optical system illuminates the structure with radiation and detects radiation scattered by the structure. The optical system comprises a first dispersive element. The first dispersive element spectrally disperses scattered radiation exclusively from a first portion of a pupil plane field distribution along a first dispersion direction. A second dispersive element, separated from the first dispersive element, spectrally disperses scattered radiation exclusively from a second portion of the pupil plane field distribution, different from the first portion of the pupil plane field distribution, along a second dispersion direction.

公开(公告)号：US20180073866A1

公开(公告)日：2018-03-15

申请号：US15683010

申请日：2017-08-22

Applicant: ASML Netherlands B.V.

Inventor： Sergey Tarabrin ,  Simon Philip Spencer Hastings ,  Armand Eugene Albert Koolen

IPC: G01B11/27 ,  G03F7/20

Abstract: Disclosed is a method of determining a characteristic of a target on a substrate and corresponding metrology apparatus and computer program. The method comprises determining a plurality of intensity asymmetry measurements from pairs of complementary pixels comprising a first image pixel in a first image of the target and a second image pixel in a second image of the target. The first image is obtained from first radiation scattered by the target and the second image is obtained from second radiation scattered by the target, the first radiation and second radiation comprising complementary non-zero diffraction orders. The characteristic of the target is then determined from said plurality of intensity asymmetry measurements.

公开(公告)号：US09811003B2

公开(公告)日：2017-11-07

申请号：US15355334

申请日：2016-11-18

Applicant: ASML Netherlands B.V.

Inventor： Martin Jacobus Johan Jak ,  Armand Eugene Albert Koolen ,  Hendrik Jan Hidde Smilde

IPC: G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70483 ,  G03F7/70633 ,  G03F7/70683

Abstract: A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and −1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity values within each ROI are processed and compared between images, to obtain a measurement of asymmetry and hence overlay error. Separation zones are formed between the component gratings and design so as to provide dark regions in the image. In an embodiment, the ROIs are selected with their boundaries falling within the image regions corresponding to the separation zones. By this measure, the asymmetry measurement is made more tolerant of variations in the position of the ROI. The dark regions also assist in recognition of the target in the images.

公开(公告)号：US11150563B2

公开(公告)日：2021-10-19

申请号：US16708509

申请日：2019-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Sergei Sokolov ,  Sergey Tarabrin ,  Su-Ting Cheng ,  Armand Eugene Albert Koolen ,  Markus Franciscus Antonius Eurlings ,  Koenraad Remi André Maria Schreel

IPC: G03F7/20

Abstract: A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.

公开(公告)号：US10816909B2

公开(公告)日：2020-10-27

申请号：US16150879

申请日：2018-10-03

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Nitesh Pandey ,  Vasco Tomas Tenner ,  Willem Marie Julia Marcel Coene ,  Patrick Warnaar

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/47 ,  G01N21/95 ,  G01B11/06 ,  G01B11/02

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US10599048B2

公开(公告)日：2020-03-24

申请号：US16169514

申请日：2018-10-24

Applicant: ASML Netherlands B.V.

Inventor： Sergey Tarabrin ,  Armand Eugene Albert Koolen

IPC: G01J3/18 ,  G03F7/20 ,  G03F9/00 ,  G01N21/88

Abstract: Metrology apparatus and methods are disclosed for measuring a structure formed on a substrate. In one arrangement, different components of a radiation beam are selectively extracted after reflection from the structure and independently detected. For each component, radiation is selected from one of a plurality of predetermined regions in a downstream pupil plane of the optical system downstream from the structure. Radiation is further selected from one of two predetermined orthogonal polarization states. The predetermined orthogonal polarization states are oriented differently as a pair for each of at least a subset of components comprising radiation selected from different predetermined regions in the downstream pupil plane.

公开(公告)号：US20190129315A1

公开(公告)日：2019-05-02

申请号：US16169514

申请日：2018-10-24

Applicant: ASML Netherlands B.V.

Inventor： Sergey Tarabrin ,  Armand Eugene Albert Koolen

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/88 ,  G01J3/18

Abstract: Metrology apparatus and methods are disclosed for measuring a structure formed on a substrate. In one arrangement, different components of a radiation beam are selectively extracted after reflection from the structure and independently detected. For each component, radiation is selected from one of a plurality of predetermined regions in a downstream pupil plane of the optical system downstream from the structure. Radiation is further selected from one of two predetermined orthogonal polarization states. The predetermined orthogonal polarization states are oriented differently as a pair for each of at least a subset of components comprising radiation selected from different predetermined regions in the downstream pupil plane.