公开(公告)号：US20210271178A1

公开(公告)日：2021-09-02

申请号：US17256408

申请日：2019-06-13

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald HUISMAN ,  Alessandro POLO

IPC: G03F9/00 ,  G01J9/02

Abstract: A sensor apparatus (300) for determining a position of a target (330) of a substrate (W) comprising, projection optics (315;321) configured to project a radiation beam (310) onto the substrate, collection optics (321) configured to collect measurement radiation (325) that has scattered from the target, a wavefront sensing system (335) configured to determine a pupil function variation of at least a portion (355) of the measurement radiation and output a signal (340) indicative thereof, and a measurement system (350) configured to receive the signal and to determine the position of the target in at least partial dependence on the collected measurement radiation and the determined pupil function variation of at least a portion of the measurement radiation.

公开(公告)号：US20190033725A1

公开(公告)日：2019-01-31

申请号：US16042302

申请日：2018-07-23

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Maxim PISARENCO ,  Alessandro POLO

IPC: G03F7/20 ,  G01N21/956 ,  G01N29/06

Abstract: A method and apparatus to measure overlay from images of metrology targets, images obtained using acoustic waves, for example images obtained using an acoustic microscope. The images of two targets are obtained, one image using acoustic waves and one image using optical waves, the edges of the images are determined and overlay between the two targets is obtained as the difference between the edges of the two images.

公开(公告)号：US20180329316A1

公开(公告)日：2018-11-15

申请号：US15756057

申请日：2016-08-23

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Alessandro POLO ,  Simon Gijsbert Josephus MATHIJSSEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Scott Douglas COSTON ,  Ronan James HAVELIN

IPC: G03F9/00 ,  G02B27/14 ,  G02B27/10 ,  G02B6/293

Abstract: A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target having a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components, each demultiplexing component operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.

公开(公告)号：US20180149987A1

公开(公告)日：2018-05-31

申请号：US15575069

申请日：2016-03-14

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus MATHIJSSEN ,  Arie Jeffrey DEN BOEF ,  Alessandro POLO ,  Patricius Aloysius Jacobus TINNEMANS ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  Elahe YEGANEGI DASTGERDI ,  Willem Marie Julia Marcel COENE ,  Erik Willem BOGAART ,  Simon Reinald HUISMAN

IPC: G03F9/00 ,  G03F7/20

Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.