公开(公告)号：US20220334503A1

公开(公告)日：2022-10-20

申请号：US17640880

申请日：2020-08-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Yingchao CUI ,  Hadi YAGUBIZADE ,  Xiuhong WEI ,  Daan Maurits SLOTBOOM ,  Jeonghyun PARK ,  Sarathi ROY ,  Yichen ZHANG ,  Mohammad Reza KAMALI ,  Sang Uk KIM

IPC: G03F7/20

Abstract: A method for determining lithographic matching performance includes obtaining first monitoring data from recurrent monitoring for stability control for an available EUV scanner. For a DUV scanner, second monitoring data is similarly obtained from recurrent monitoring for stability control. The EUV first monitoring data are in a first layout. The DUV second monitoring data are in a second layout. A cross-platform overlay matching performance between the first lithographic apparatus and the second lithographic apparatus is determined based on the first monitoring data and the second monitoring data. This is done by reconstructing the first and/or second monitoring data into a common layout to allow comparison of the first and second monitoring data.

公开(公告)号：US20210397172A1

公开(公告)日：2021-12-23

申请号：US17296316

申请日：2019-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham SLACHTER ,  Wim Tjibbo TEL ,  Daan Maurits SLOTBOOM ,  Vadim Yourievich TIMOSHKOV ,  Koen Wilhelmus Cornelis Adrianus VAN DER STRATEN ,  Boris MENCHTCHIKOV ,  Simon Philip Spencer HASTINGS ,  Cyrus Emil TABERY ,  Maxime Philippe Frederic GENIN ,  Youping ZHANG ,  Yi ZOU ,  Chenxi LIN ,  Yana CHENG

IPC: G05B19/418

Abstract: A method for analyzing a process, the method including obtaining a multi-dimensional probability density function representing an expected distribution of values for a plurality of process parameters; obtaining a performance function relating values of the process parameters to a performance metric of the process; and using the performance function to map the probability density function to a performance probability function having the process parameters as arguments.

公开(公告)号：US20210302843A1

公开(公告)日：2021-09-30

申请号：US17268177

申请日：2019-08-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Maurits SLOTBOOM ,  Hermannes Theodorus HEIJMERIKX ,  Javier Augusto LOAIZA RIVAS ,  Jeroen COTTAAR

IPC: G03F7/20

Abstract: A method of configuring a step of scanning a beam of photons or particles across a patterning device for exposing a pattern onto a substrate, wherein the method includes determining a spatial resolution of a patterning correction configured to improve quality of the exposing, and determining a spatial dimension of the beam based on the determined spatial resolution of the patterning correction.

公开(公告)号：US20210247700A1

公开(公告)日：2021-08-12

申请号：US17251419

申请日：2019-05-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Wolter SIEMONS ,  Daan Maurits SLOTBOOM ,  Erik Peter DE KORT

IPC: G03F7/20

Abstract: A method for determining a correction for control of at least one manufacturing apparatus used in a manufacturing process for providing structures to a region on a substrate, the region including a plurality of sub-regions. The method includes obtaining measurement data relating to a process parameter of the manufacturing process for the region; and determining a correction for the manufacturing apparatus based on the measurement data. The correction is configured to maintain the process parameter within a specified range across a boundary between two of the sub-regions and/or to better correct the process parameter across the boundary between two of the sub-regions with respect to within the remainder of the region.