公开(公告)号：US20220107176A1

公开(公告)日：2022-04-07

申请号：US17487896

申请日：2021-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan WANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G01B15/08 ,  H01J37/22 ,  H01J37/20 ,  H01J37/21

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

公开(公告)号：US20210396683A1

公开(公告)日：2021-12-23

申请号：US17283930

申请日：2019-09-20

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Yixiang WANG ,  Zhiwen KANG

IPC: G01N21/95 ,  G01N21/88

Abstract: An illumination unit comprising a first electromagnetic wave source including circuitry for outputting a first electromagnetic wave in a first direction to illuminate a first region of a sample; a second electromagnetic wave source including circuitry for outputting a second electromagnetic wave in a second direction substantially opposite to the first direction; and a reflector configured to reflect the second electromagnetic wave substantially in the first direction to illuminate a second region of the sample.

公开(公告)号：US20200279715A1

公开(公告)日：2020-09-03

申请号：US16650840

申请日：2018-09-21

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/22 ,  G02B27/42 ,  G01C3/08

Abstract: An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection grating pattern, and a projection optical unit for projecting the projection grating pattern to a sample; and a detection unit including a first detection grating mask including a first detection grating pattern, a second detection grating mask including a second detection grating pattern, and a detection optical system for forming a first grating image from the projection grating pattern onto the first detection grating mask and forming a second grating image from the projection grating pattern onto the second detection grating masks. The first and second detection grating patterns at least partially overlap the first and second grating images, respectively.

公开(公告)号：US20240402093A1

公开(公告)日：2024-12-05

申请号：US18686369

申请日：2022-08-03

Applicant: ASML Netherlands B.V.

Inventor： Xiaodong MENG ,  Zhiwen KANG ,  Jian ZHANG ,  Kangsheng QIU

IPC: G01N21/95 ,  G01B11/02 ,  G01N21/88 ,  G03F7/00

Abstract: Systems, apparatuses, and methods for detecting a location of a positioned sample may include an electrostatic holder configured to hold a sample and form a gap area between an outside edge of the sample and a structure of the electrostatic holder when the electrostatic holder holds the sample, wherein the gap area is coated with a first coating configured to reflect a first wavelength of light with first brightness and to reflect a second wavelength of the light with second brightness, the first wavelength is within a predetermined range of wavelengths, the second wavelength is outside the predetermined range of wavelengths, and the first brightness is higher than the second brightness; a light source configured to direct the light at the gap area; and an optical detector configured to image the light reflected off the gap area.

公开(公告)号：US20230096657A1

公开(公告)日：2023-03-30

申请号：US17911398

申请日：2021-02-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Yan WANG ,  Liang TANG ,  Yixiang WANG

IPC: H01J37/20 ,  H01J37/244 ,  G01B11/06 ,  H01J37/21 ,  H01J37/22

Abstract: An improved leveling sensor and method for adjusting a sample height in a charged-particle beam inspection system are disclosed. An improved leveling sensor comprises a light source configured to project a first pattern onto a sample and a detector configured to capture an image of a projected pattern after the first pattern is projected on the sample. The first pattern can comprise an irregularity to enable a determination of a vertical displacement of the sample.

公开(公告)号：US20220375715A1

公开(公告)日：2022-11-24

申请号：US17771761

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jian ZHANG ,  Ning YE ,  Yixiang WANG ,  Jie FANG

IPC: H01J37/22 ,  H01J37/28

Abstract: An apparatus for and a method of inspecting a substrate in which a charged particle beam is arranged to impinge on a portion of the substrate and a first light beam having a first wavelength and a second light beam having a second wavelength different from the first wavelength are also arranged to impinge on the portion of the substrate.

公开(公告)号：US20220270849A1

公开(公告)日：2022-08-25

申请号：US17638765

申请日：2020-08-26

Applicant: ASML Netherlands B.V.

Inventor： Jun JIANG ,  Chih-Yu JEN ,  Ning YE ,  Jian ZHANG

IPC: H01J37/28 ,  G01R31/307

Abstract: A charged particle beam system may include a primary source, a secondary source, and a controller. The primary source may be configured to emit a charged particle beam along an optical axis onto a region of a sample. The secondary source may be configured to irradiate the region of the sample. The controller may be configured to control the charged particle beam system to change a parameter of an output of the secondary source. A method of imaging may include emitting a charged particle beam onto a region of a sample, irradiating the region of the sample with a secondary source, and changing a parameter of an output of the secondary source. A method of detecting defects may include inspecting a sample, generating a first defect distribution, and generating a second defect distribution.

公开(公告)号：US20200278524A1

公开(公告)日：2020-09-03

申请号：US16650862

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G02B21/02 ,  H01J37/22 ,  H01J37/28 ,  G02B13/18 ,  G02B9/00

Abstract: An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.