公开(公告)号：US12105432B2

公开(公告)日：2024-10-01

申请号：US17625640

申请日：2020-07-07

Applicant: ASML Netherlands B.V.

Inventor： Narjes Javaheri ,  Maurits Van Der Schaar ,  Tieh-Ming Chang ,  Hilko Dirk Bos ,  Patrick Warnaar ,  Samira Bahrami ,  Mohammadreza Hajiahmadi ,  Sergey Tarabrin ,  Mykhailo Semkiv

IPC: G03F7/00

CPC classification number: G03F7/70633

Abstract: Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.

公开(公告)号：US10794693B2

公开(公告)日：2020-10-06

申请号：US16102145

申请日：2018-08-13

Applicant: ASML Netherlands B.V.

Inventor： Farzad Farhadzadeh ,  Mohammadreza Hajiahmadi ,  Maurits Van Der Schaar ,  Murat Bozkurt

IPC: G01B11/27 ,  G03F7/20

Abstract: Disclosed is a method and associated apparatus of determining a performance parameter (e.g., overlay) of a target on a substrate, and an associated metrology apparatus. The method comprises estimating a set of narrowband measurement values from a set of wideband measurement values relating to the target and determining the performance parameter from said set of narrowband measurement values. The wideband measurement values relate to measurements of the target performed using wideband measurement radiation and may correspond to different central wavelengths. The narrowband measurement values may comprise an estimate of the measurement values which would be obtained from measurement of the target using narrowband measurement radiation having a bandwidth narrower than said wideband measurement radiation.

公开(公告)号：US20200050114A1

公开(公告)日：2020-02-13

申请号：US16655434

申请日：2019-10-17

Applicant: ASML Netherlands B.V.

Inventor： Murat Bozkurt ,  Maurits Van Der Schaar ,  Patrick Warnaar ,  Martin Jacobus Johan Jak ,  Mohammadreza Hajiahmadi ,  Grzegorz Grzela ,  Lukasz Jerzy Macht

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G01N21/47

Abstract: An overlay metrology target (600, 900, 1000) contains a plurality of overlay gratings (932-935) formed by lithography. First diffraction signals (740(1)) are obtained from the target, and first asymmetry values (As) for the target structures are derived. Second diffraction signals (740(2)) are obtained from the target, and second asymmetry values (As′) are derived. The first and second diffraction signals are obtained using different capture conditions and/or different designs of target structures and/or bias values. The first asymmetry signals and the second asymmetry signals are used to solve equations and obtain a measurement of overlay error. The calculation of overlay error makes no assumption whether asymmetry in a given target structure results from overlay in the first direction, in a second direction or in both directions. With a suitable bias scheme the method allows overlay and other asymmetry-related properties to be measured accurately, even in the presence of two-dimensional overlay structure.

公开(公告)号：US20190004437A1

公开(公告)日：2019-01-03

申请号：US16010320

申请日：2018-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Kaustuve Bhattacharyya ,  Simon Gijsbert Josephus Mathijssen ,  Marc Johannes Noot ,  Arie Jeffrey Den Boef ,  Mohammadreza Hajiahmadi ,  Farzad Farhadzadeh

IPC: G03F7/20 ,  G01B11/27

CPC classification number: G03F7/70625 ,  G01B11/272 ,  G01B2210/56 ,  G03F7/70058 ,  G03F7/70633

Abstract: A method including: for a metrology target, having a first biased target structure and a second differently biased target structure, created using a patterning process, obtaining metrology data including signal data for the first target structure versus signal data for the second target structure, the metrology data being obtained for a plurality of different metrology recipes and each metrology recipe specifying a different parameter of measurement; determining a statistic, fitted curve or fitted function through the metrology data for the plurality of different metrology recipes as a reference; and identifying at least two different metrology recipes that have a variation of the collective metrology data of the at least two different metrology recipes from a parameter of the reference that crosses or meets a certain threshold.