公开(公告)号：US10451978B2

公开(公告)日：2019-10-22

申请号：US16010320

申请日：2018-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Kaustuve Bhattacharyya ,  Simon Gijsbert Josephus Mathijssen ,  Marc Johannes Noot ,  Arie Jeffrey Den Boef ,  Mohammadreza Hajiahmadi ,  Farzad Farhadzadeh

IPC: G03B27/42 ,  G03F7/20 ,  G01B11/27

Abstract: A method including: for a metrology target, having a first biased target structure and a second differently biased target structure, created using a patterning process, obtaining metrology data including signal data for the first target structure versus signal data for the second target structure, the metrology data being obtained for a plurality of different metrology recipes and each metrology recipe specifying a different parameter of measurement; determining a statistic, fitted curve or fitted function through the metrology data for the plurality of different metrology recipes as a reference; and identifying at least two different metrology recipes that have a variation of the collective metrology data of the at least two different metrology recipes from a parameter of the reference that crosses or meets a certain threshold.

公开(公告)号：US12112260B2

公开(公告)日：2024-10-08

申请号：US16424811

申请日：2019-05-29

Applicant: ASML Netherlands B.V.

Inventor： Lorenzo Tripodi ,  Patrick Warnaar ,  Grzegorz Grzela ,  Mohammadreza Hajiahmadi ,  Farzad Farhadzadeh ,  Patricius Aloysius Jacobus Tinnemans ,  Scott Anderson Middlebrooks ,  Adrianus Cornelis Matheus Koopman ,  Frank Staals ,  Brennan Peterson ,  Anton Bernhard Van Oosten

IPC: G06N3/08 ,  G01B11/02 ,  G01N21/55 ,  G06T7/00

CPC classification number: G06N3/08 ,  G01B11/02 ,  G01N21/55 ,  G06T7/0006 ,  G06T7/001 ,  G01B2210/56 ,  G06T2207/20081 ,  G06T2207/20084 ,  G06T2207/30148

Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.

公开(公告)号：US10794693B2

公开(公告)日：2020-10-06

申请号：US16102145

申请日：2018-08-13

Applicant: ASML Netherlands B.V.

Inventor： Farzad Farhadzadeh ,  Mohammadreza Hajiahmadi ,  Maurits Van Der Schaar ,  Murat Bozkurt

IPC: G01B11/27 ,  G03F7/20

Abstract: Disclosed is a method and associated apparatus of determining a performance parameter (e.g., overlay) of a target on a substrate, and an associated metrology apparatus. The method comprises estimating a set of narrowband measurement values from a set of wideband measurement values relating to the target and determining the performance parameter from said set of narrowband measurement values. The wideband measurement values relate to measurements of the target performed using wideband measurement radiation and may correspond to different central wavelengths. The narrowband measurement values may comprise an estimate of the measurement values which would be obtained from measurement of the target using narrowband measurement radiation having a bandwidth narrower than said wideband measurement radiation.

公开(公告)号：US20190004437A1

公开(公告)日：2019-01-03

申请号：US16010320

申请日：2018-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Kaustuve Bhattacharyya ,  Simon Gijsbert Josephus Mathijssen ,  Marc Johannes Noot ,  Arie Jeffrey Den Boef ,  Mohammadreza Hajiahmadi ,  Farzad Farhadzadeh

IPC: G03F7/20 ,  G01B11/27

CPC classification number: G03F7/70625 ,  G01B11/272 ,  G01B2210/56 ,  G03F7/70058 ,  G03F7/70633

Abstract: A method including: for a metrology target, having a first biased target structure and a second differently biased target structure, created using a patterning process, obtaining metrology data including signal data for the first target structure versus signal data for the second target structure, the metrology data being obtained for a plurality of different metrology recipes and each metrology recipe specifying a different parameter of measurement; determining a statistic, fitted curve or fitted function through the metrology data for the plurality of different metrology recipes as a reference; and identifying at least two different metrology recipes that have a variation of the collective metrology data of the at least two different metrology recipes from a parameter of the reference that crosses or meets a certain threshold.