公开(公告)号：US20150268559A1

公开(公告)日：2015-09-24

申请号：US14439476

申请日：2013-10-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Ramin Badie ,  Vadim Yevgenyevich Banine ,  Johan Frederik Dijksman ,  Antonius Theodorus Wilhelmus Kempen ,  Andrei Mikhailovich Yakunin ,  Hendrikus Robertus Marie Van Greevenbroek ,  Koen Gerhardus Winkels

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A radiation source (e.g., LPP— laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。

公开(公告)号：US20150002832A1

公开(公告)日：2015-01-01

申请号：US14377141

申请日：2013-02-04

Applicant: ASML Netherlands B.V.

Inventor： Theodorus Petrus Maria Cadee ,  Vadim Yevgenyevich Banine ,  Koen Jacobus Johannes Maria Zaal ,  Ramin Badie ,  Harmeet Singh

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70708 ,  G03F7/70733 ,  H01L21/6875

Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.

Abstract translation: 光刻设备具有一个支撑件，该支撑件设置有用于保持物体的毛刺。 已经利用诸如MEMS技术的光刻制造方法来制造支撑件，以便产生其取向或位置可单独地电可控制的孔。

公开(公告)号：US20180074411A1

公开(公告)日：2018-03-15

申请号：US15818232

申请日：2017-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Henrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US09715174B2

公开(公告)日：2017-07-25

申请号：US14443965

申请日：2013-10-30

Applicant: ASML Netherlands B.V.

Inventor： Johan Frederik Dijksman ,  Ramin Badie ,  Ronald Johannes Hultermans ,  Dzmitry Labetski

IPC: G03B27/54 ,  G03F7/20 ,  H05G2/00 ,  B05B17/06

CPC classification number: G03F7/70033 ,  B05B17/06 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.

公开(公告)号：US09442380B2

公开(公告)日：2016-09-13

申请号：US14439476

申请日：2013-10-03

Applicant: ASML Netherlands B.V.

Inventor： Ramin Badie ,  Vadim Yevgenyevich Banine ,  Johan Frederik Dijksman ,  Antonius Theodorus Wilhelmus Kempen ,  Andrei Mikhailovich Yakunin ,  Hendrikus Robertus Marie Van Greevenbroek ,  Koen Gerhardus Winkels

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。