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公开(公告)号：US11366399B2
公开(公告)日：2022-06-21
申请号：US16765364
申请日：2018-10-26
Applicant: ASML Netherlands B.V.
Abstract: A laser beam monitoring system configured to monitor an attribute of an incident laser beam (24), the laser beam monitoring system comprising a beam separating element (30) and a plurality of sensors (34a-34d), wherein the beam separating element is configured to form a plurality of sub-beams (24a-24d) from the incident laser beam (24), a first sub-beam being directed towards a first sensor of the plurality of sensors and a second sub-beam being directed towards a second sensor of the plurality of sensors, wherein relative intensities of the first and second sub-beams are determined by a spatial position at which the incident laser beam is incident upon the beam separating element.
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Patent Agency Ranking
公开(公告)号：US09778575B2
公开(公告)日：2017-10-03
申请号：US14988944
申请日：2016-01-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen , Patricius Aloysius Jacobus Tinnemans , Wilfred Edward Endendijk
CPC classification number: G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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公开(公告)号：US20150268559A1
公开(公告)日：2015-09-24
申请号：US14439476
申请日：2013-10-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Ramin Badie , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Antonius Theodorus Wilhelmus Kempen , Andrei Mikhailovich Yakunin , Hendrikus Robertus Marie Van Greevenbroek , Koen Gerhardus Winkels
CPC classification number: G03F7/70033 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A radiation source (e.g., LPP— laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.
Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。
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公开(公告)号：US10222703B2
公开(公告)日：2019-03-05
申请号：US15653380
申请日：2017-07-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen , Patricius Aloysius Jacobus Tinnemans , Wilfred Edward Endendijk
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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公开(公告)号：US09442380B2
公开(公告)日：2016-09-13
申请号：US14439476
申请日：2013-10-03
Applicant: ASML Netherlands B.V.
Inventor： Ramin Badie , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Antonius Theodorus Wilhelmus Kempen , Andrei Mikhailovich Yakunin , Hendrikus Robertus Marie Van Greevenbroek , Koen Gerhardus Winkels
CPC classification number: G03F7/70033 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.
Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。
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6.发明授权Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensor 有权光刻设备和使用可调节偏振器和干涉测量传感器确定投影系统的偏振特性的方法公开(公告)号：US09170498B2
公开(公告)日：2015-10-27
申请号：US13786400
申请日：2013-03-05
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel François Hubert Klaassen , Martijn Gerard Dominique Wehrens , Haico Victor Kok , Wilhelmus Jacobus Maria Rooijakkers , Tammo Uitterdijk
IPC: G03F7/20
CPC classification number: G03F7/70133 , G03F7/70566 , G03F7/70591 , G03F7/7085
Abstract: A lithographic apparatus includes an illumination system, support constructed to support patterning device, a projection system, an interferometric sensor and a detector. The interferometric sensor is designed to measure one or more wavefronts of a radiation beam projected by the projection system from an adjustable polarizer. The interferometric sensor includes a diffractive element disposed at a level of a substrate in the lithographic apparatus and a detector spaced apart from the diffractive element, the diffractive element being arranged to provide shearing interferometry between at least two wavefronts mutually displaced in a direction of shear. The detector is designed to determine, from the wavefront measurements, information on polarization affecting properties of the projection system.
Abstract translation: 光刻设备包括照明系统，构造成支撑图案形成装置的支撑，投影系统，干涉测量传感器和检测器。 干涉测量传感器被设计成测量由可调偏振器投射的投影系统投影的辐射束的一个或多个波前。 所述干涉测量传感器包括设置在所述光刻设备中的基底水平处的衍射元件和与所述衍射元件间隔开的检测器，所述衍射元件被布置成在剪切方向上相互移位的至少两个波前之间提供剪切干涉测量。 该检测器设计用于从波前测量中确定投影系统对偏振影响特性的信息。
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