公开(公告)号：US20150227060A1

公开(公告)日：2015-08-13

申请号：US14423405

申请日：2013-08-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Rob Johan Theodoor Rutten ,  Jan Steven Christiaan Westerlaken ,  Koen Jacobus Johannes Maria Zaal ,  Richard Henricus Adrianus Van Lieshout ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC: G03F7/20 ,  G01D5/34

CPC classification number: G03F7/70725 ,  G01D5/34 ,  G01D5/38 ,  G03F7/70775 ,  G03F7/70933

Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.

Abstract translation: 舞台系统包括可移动舞台和用于测量舞台位置的编码器，其中编码器包括用于发射编码器光束的发射器，用于与编码器光束相互作用的光栅，以及用于检测具有相互影响的编码器光束的检测器 利用光栅，编码器光束在使用中沿光路传播; 至少部分地包围光路的清洗盖; 以及用于将清洗介质供给到清洗盖中的清洗介质供给装置。