-
1.发明申请公开(公告)号：US20150168852A1
公开(公告)日：2015-06-18
申请号：US14407038
申请日：2013-06-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Andre Bernardus Jeunink , Marinus Maria Johannes Van De Wal , Wilhelmus Henricus Theodorus Maria Aangenent , Richard Henricus Adrianus Van Lieshout , Henricus Martinus Johannes Van De Groes , Saartje Willemijn Van Der Hoeven
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70783
Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.
Abstract translation: 提供了一种用于在光刻设备中定位物体的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。
-
公开(公告)号：US09983482B2
公开(公告)日：2018-05-29
申请号：US14775263
申请日：2014-02-26
Applicant: ASML Netherlands B.V. , Carl Zeiss SMT GmbH
Inventor： Erik Roelof Loopstra , Olav Waldemar Vladimir Frijns , Stig Bieling , Antonius Theodorus Wilhelmus Kempen , Ivo Vanderhallen , Nicolaas Ten Kate , Ruud Antonius Catharina Maria Beerens , Richard Henricus Adrianus Van Lieshout , Theodorus Petrus Maria Cadee , Sjoerd Nicolaas Lambertus Donders , Alexander Matthijs Struycken , Marcus Petrus Scheepers
CPC classification number: G03F7/70033 , G02B5/0891 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983 , G21K1/067 , H05G2/003 , H05G2/008
Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
-
公开(公告)号：US09897926B2
公开(公告)日：2018-02-20
申请号：US15115876
申请日：2015-01-20
Applicant: ASML Netherlands B.V.
Inventor： Wilhelmus Henricus Theodorus Maria Aangenent , Lucas Franciscus Koorneef , Theo Anjes Maria Ruijl , Stanley Constant Johannes Martinus Van Den Berg , Stan Henricus Van Der Meulen , Jan Van Eijk , Pieter Hubertus Godefrida Wullms , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70716 , G03F7/70758 , G03F7/709 , H01L21/68
Abstract: A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.
-
公开(公告)号：US09726985B2
公开(公告)日：2017-08-08
申请号：US14376210
申请日：2013-01-25
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robertus Mathijs Gerardus Rijs , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70716 , G03F7/70758 , G03F7/709 , H02K41/02
Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.
-
公开(公告)号：US20140375975A1
公开(公告)日：2014-12-25
申请号：US14376210
申请日：2013-01-25
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robertus Mathijs Gerardus Rijs , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70716 , G03F7/70758 , G03F7/709 , H02K41/02
Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.
Abstract translation: 可移动台系统被配置为支撑经受光刻处理的物体。 短行程部件（SS）被配置为支撑物体（W），并且长行程部件（LS）被配置为支撑短行程部件。 短行程部分可以相对于长行程部分在相对较小的移动范围内移动。 长行程部件可相对于布置成支撑长行程部件的基座支撑件在相对较大的运动范围内移动。 屏蔽元件（SE）设置在短行程部件和长行程部件之间。 位置控制系统（PCS）在屏蔽元件和短行程部件之间保持基本恒定的距离。
-
Patent Agency Ranking
6.发明授权公开(公告)号：US10012914B2
公开(公告)日：2018-07-03
申请号：US15505885
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Ruud Antonius Catharina Maria Beerens , Sander Christiaan Broers , Jeroen Johannes Theodorus Hendrikus De Best , Adrianus Marinus Wouter Heeren , George Alois Leonie Leenknegt , Bo Lenssen , Hendrikus Johannes Schellens , Peter Van Der Krieken , Theodorus Petrus Maria Cadee , Jan Van Eijk , Richard Henricus Adrianus Van Lieshout
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
-
公开(公告)号：US09785060B2
公开(公告)日：2017-10-10
申请号：US14423405
申请日：2013-08-19
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Rob Johan Theodoor Rutten , Jan Steven Christiaan Westerlaken , Koen Jacobus Johannes Maria Zaal , Richard Henricus Adrianus Van Lieshout , Engelbertus Antonius Fransiscus Van Der Pasch
CPC classification number: G03F7/70725 , G01D5/34 , G01D5/38 , G03F7/70775 , G03F7/70933
Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
-
8.发明授权公开(公告)号：US09383659B2
公开(公告)日：2016-07-05
申请号：US14407038
申请日：2013-06-13
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Andre Bernardus Jeunink , Marinus Maria Johannes Van De Wal , Wilhelmus Henricus Theodorus Maria Aangenent , Richard Henricus Adrianus Van Lieshout , Henricus Martinus Johannes Van De Groes , Saartje Willemijn Van Der Hoeven
CPC classification number: G03F7/70775 , G03F7/70783
Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.
Abstract translation: 提供了一种用于将物体定位在光刻设备中的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。
-
9.发明授权公开(公告)号：US10061213B2
公开(公告)日：2018-08-28
申请号：US15505885
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Ruud Antonius Catharina Maria Beerens , Sander Christiaan Broers , Jeroen Johannes Theodorus Hendrikus De Best , Adrianus Marinus Wouter Heeren , George Alois Leonie Leenknegt , Bo Lenssen , Hendrikus Johannes Schellens , Peter Van Der Krieken , Theodorus Petrus Maria Cadee , Jan Van Eijk , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085 , H01L41/1132
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
-
公开(公告)号：US09360774B2
公开(公告)日：2016-06-07
申请号：US13720369
申请日：2012-12-19
Applicant: ASML Netherlands B.V.
Inventor： Johannes Hendrikus Maria Spruit , Ruud Antonius Catharina Maria Beerens , Richard Henricus Adrianus Van Lieshout , Cristian Dan
CPC classification number: G03F7/70783 , G03B27/522 , G03F7/7085
Abstract: Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.
Abstract translation: 公开了一种包括易于变形的构件的光刻设备和用于测量所述构件的变形的变形传感器。 变形传感器包括第一双折射感测元件，其被布置为根据所述构件的变形而受到应力，以及被配置为透射偏振光通过第一双折射感测元件的光系统，其中所述偏振光具有第一偏振态 通过第一双折射检测元件透射。 变形传感器还包括检测器，用于检测通过第一双折射检测元件透射后的偏振光的第二偏振态，以及计算单元，用于基于第一和第二偏振状态确定所述构件的变形。
-
-
-
-
-
-
-
-
-
Search Results
11
records
(took 0.019 seconds)
