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公开(公告)号：US09785060B2
公开(公告)日：2017-10-10
申请号：US14423405
申请日：2013-08-19
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Rob Johan Theodoor Rutten , Jan Steven Christiaan Westerlaken , Koen Jacobus Johannes Maria Zaal , Richard Henricus Adrianus Van Lieshout , Engelbertus Antonius Fransiscus Van Der Pasch
CPC classification number: G03F7/70725 , G01D5/34 , G01D5/38 , G03F7/70775 , G03F7/70933
Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
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公开(公告)号：US20150227060A1
公开(公告)日：2015-08-13
申请号：US14423405
申请日：2013-08-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Rob Johan Theodoor Rutten , Jan Steven Christiaan Westerlaken , Koen Jacobus Johannes Maria Zaal , Richard Henricus Adrianus Van Lieshout , Engelbertus Antonius Fransiscus Van Der Pasch
CPC classification number: G03F7/70725 , G01D5/34 , G01D5/38 , G03F7/70775 , G03F7/70933
Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
Abstract translation: 舞台系统包括可移动舞台和用于测量舞台位置的编码器，其中编码器包括用于发射编码器光束的发射器，用于与编码器光束相互作用的光栅，以及用于检测具有相互影响的编码器光束的检测器 利用光栅，编码器光束在使用中沿光路传播; 至少部分地包围光路的清洗盖; 以及用于将清洗介质供给到清洗盖中的清洗介质供给装置。
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公开(公告)号：US10114298B2
公开(公告)日：2018-10-30
申请号：US15327343
申请日：2015-06-23
Applicant: ASML Netherlands B.V.
Abstract: A conditioning system for a lithographic apparatus having a plurality of modules. The conditioning system includes a plurality of conditioning branches conveying a common conditioning medium for the plurality of modules, one conditioning branch for each module (or a subset of modules); a plurality of thermal actuators, each thermal actuator operable to locally alter the temperature of the common conditioning medium at one of the conditioning branches; and a plurality of sensors, each sensor operable to sense the temperature of the common conditioning medium at one of the conditioning branches.
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公开(公告)号：US10095130B2
公开(公告)日：2018-10-09
申请号：US15567252
申请日：2016-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Pieter Kroes , Kevin Nicolas Stephan Couteau , Rachid El Boubsi , Rob Johan Theodoor Rutten , Patrick Johannes Cornelus Hendrik Smulders , Martijn Lambertus Peter Visser , Jan Steven Christiaan Westerlaken
Abstract: An apparatus has a first component with a first surface and a second component with a second surface, wherein the first and second components can undergo relative movement. The first surface and the second surface face each other. The first surface accommodates a barrier system to provide a barrier to reduce or prevent an inflow of ambient gas into a protected volume of gas between the first and second surfaces. The barrier system includes a curtain opening adapted for a flow of curtain gas therefrom for establishing a gas curtain enclosing part of the protected volume, and an inner entrainment opening, located inward of the curtain opening with respect to the protected volume, adapted for a flow of inner entrainment gas therefrom for being entrained into the flow of curtain gas. The apparatus is configured such that the inner entrainment gas flow is less turbulent than the curtain gas flow.
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