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公开(公告)号：US09625833B2
公开(公告)日：2017-04-18
申请号：US14739751
申请日：2015-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Marco Koert Stavenga , Sergei Shulepov , Koen Steffens , Mathieus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
IPC: G03B27/58 , G03F7/20 , H01L21/68 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/70866 , H01L21/68 , H01L21/68735
Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
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公开(公告)号：US12197140B2
公开(公告)日：2025-01-14
申请号：US17565144
申请日：2021-12-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Marco Koert Stavenga , Sergei Shulepov , Koen Steffens , Matheus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
IPC: G03F7/00 , H01L21/68 , H01L21/687
Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
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公开(公告)号：US11215933B2
公开(公告)日：2022-01-04
申请号：US16657267
申请日：2019-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Marco Koert Stavenga , Sergei Shulepov , Koen Steffens , Matheus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
IPC: G03F7/20 , H01L21/687 , H01L21/68
Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
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Patent Agency Ranking
公开(公告)号：US10345712B2
公开(公告)日：2019-07-09
申请号：US15918575
申请日：2018-03-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：USRE47237E1
公开(公告)日：2019-02-12
申请号：US15182514
申请日：2016-06-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
Abstract: A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
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公开(公告)号：US09927715B2
公开(公告)日：2018-03-27
申请号：US14973421
申请日：2015-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Sergei Shulepov , Raymond Wilhelmus Louis Lafarre
CPC classification number: G03F7/70341
Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
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公开(公告)号：US09448494B2
公开(公告)日：2016-09-20
申请号：US14792143
申请日：2015-07-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Sergei Shulepov
CPC classification number: G03F7/70866 , G03F7/70341 , H01L21/67034
Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.
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公开(公告)号：US09134622B2
公开(公告)日：2015-09-15
申请号：US14107734
申请日：2013-12-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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