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公开(公告)号:US20230178328A1
公开(公告)日:2023-06-08
申请号:US17913141
申请日:2021-03-18
Applicant: ASML Netherlands B.V.
Inventor: Yongxin WANG , Zhonghua DONG , Xiaoyu JI , Shahedul HOQUE , Weiming REN , Xuedong LIU , Guofan YE , Kuo-Chin CHIEN
IPC: H01J37/147
CPC classification number: H01J37/1474 , H01J2237/1504
Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.
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公开(公告)号:US20230112447A1
公开(公告)日:2023-04-13
申请号:US17910752
申请日:2021-03-09
Applicant: ASML Netherlands B.V.
Inventor: Weiming REN , Yongxin WANG
IPC: H01J37/244 , G01N23/2251 , G01N23/203 , G01N23/2206 , H01J37/10 , H01J37/147
Abstract: Systems and methods of observing a sample using an electron beam apparatus are disclosed. The electron beam apparatus comprises an electron source configured to generate a primary electron beam along a primary optical axis, and a first electron detector having a first detection layer substantially parallel to the primary optical axis and configured to detect a first portion of a plurality of signal electrons generated from a probe spot on a sample. The method may comprise generating a plurality of signal electrons and detecting the signal electrons using the first electron detector substantially parallel to the primary optical axis of the primary electron beam. A method of configuring an electrostatic element or a magnetic element to detect backscattered electrons may include disposing an electron detector on an inner surface of the electrostatic or magnetic element and depositing a conducting layer on the inner surface of the electron detector.
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公开(公告)号:US20230005707A1
公开(公告)日:2023-01-05
申请号:US17944121
申请日:2022-09-13
Applicant: ASML Netherlands B.V.
Inventor: Yongxin WANG , Zhonghua DONG , Rui-Ling LAI
IPC: H01J37/244 , H01L27/146
Abstract: Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element. The detector comprises a switching element configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.
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公开(公告)号:US20220415608A1
公开(公告)日:2022-12-29
申请号:US17856848
申请日:2022-07-01
Applicant: ASML NETHERLANDS B.V.
Inventor: Yongxin WANG , Zhonghua DONG , Rui-Ling LAI
IPC: H01J37/244 , H01L27/146
Abstract: Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element, and a switching region therebetween configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.
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公开(公告)号:US20220375716A1
公开(公告)日:2022-11-24
申请号:US17713189
申请日:2022-04-04
Applicant: ASML Netherlands B.V.
Inventor: Yongxin WANG , Weiming REN , Zhonghua DONG , Zhongwei CHEN
IPC: H01J37/244 , H01J37/28 , G01N23/2251
Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.
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公开(公告)号:US20220301811A1
公开(公告)日:2022-09-22
申请号:US17633176
申请日:2020-08-20
Applicant: ASML Netherlands B.V.
Inventor: Wei FANG , Lingling PU , Bo WANG , Zhonghua DONG , Yongxin WANG
IPC: H01J37/22 , H01J37/244 , H01J37/28 , G01N23/2251 , G06T5/00 , G06T5/50
Abstract: An improved apparatus and method for enhancing an image, and more particularly an apparatus and method for enhancing an image through cross-talk cancellation in a multiple charged-particle beam inspection are disclosed. An improved method for enhancing an image includes acquiring a first image signal of a plurality of image signals from a detector of a multi-beam inspection system. The first image signal corresponds to a detected signal from a first region of the detector on which electrons of a first secondary electron beam and of a second secondary electron beam are incident. The method includes reducing, from the first image signal, cross-talk contamination originating from the second secondary electron beam using a relationship between the first image signal and beam intensities associated with the first secondary electron beam and the second secondary electron beam. The method further includes generating a first image corresponding to first secondary electron beam after reduction.
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公开(公告)号:US20200317504A1
公开(公告)日:2020-10-08
申请号:US16841044
申请日:2020-04-06
Applicant: ASML Netherlands B.V.
Inventor: Yongxin WANG , Rui-Ling LAI , Qian ZHANG
Abstract: The present disclosure describes an image forming element having a semiconductor chip with micro-electro-mechanical-system (MEMS) devices and voltage generators, each voltage generator being configured to generate a voltage used by one or more of the MEMS devices. A floating ground may be used to add a voltage to the voltage generated by the voltage generators. The semiconductor chip may include electrical connections, where each voltage generator is configured to provide the voltage to the one or more MEMS devices through the electrical connections. The MEMS devices may define a boundary in the semiconductor chip within which the MEMS devices, the voltage generators, and the electrical connections are located. Each MEMS device may generate an electrostatic field to manipulate an electron beamlet of a multi-beam charged particle microscope. The MEMS devices may be organized into groups based on a distance to a reference location (e.g., optical axis) in the semiconductor chip.
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公开(公告)号:US20250006456A1
公开(公告)日:2025-01-02
申请号:US18787932
申请日:2024-07-29
Applicant: ASML Netherlands B.V.
Inventor: Wei FANG , Lingling PU , Bo WANG , Zhonghua DONG , Yongxin WANG
IPC: H01J37/22 , G01N23/2251 , G06T5/50 , G06T5/77 , G06T5/80 , H01J37/244 , H01J37/28
Abstract: An improved apparatus and method for enhancing an image, and more particularly an apparatus and method for enhancing an image through cross-talk cancellation in a multiple charged-particle beam inspection are disclosed. An improved method for enhancing an image includes acquiring a first image signal of a plurality of image signals from a detector of a multi-beam inspection system. The first image signal corresponds to a detected signal from a first region of the detector on which electrons of a first secondary electron beam and of a second secondary electron beam are incident. The method includes reducing, from the first image signal, cross-talk contamination originating from the second secondary electron beam using a relationship between the first image signal and beam intensities associated with the first secondary electron beam and the second secondary electron beam. The method further includes generating a first image corresponding to first secondary electron beam after reduction.
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19.
公开(公告)号:US20240079204A1
公开(公告)日:2024-03-07
申请号:US18269532
申请日:2021-12-08
Applicant: ASML Netherlands B.V.
Inventor: Yongxin WANG , Oleg KRUPIN , Weiming REN , Xuerang HU , Xuedong LIU
IPC: H01J37/244 , H01J37/28
CPC classification number: H01J37/244 , H01J37/28
Abstract: A method of detecting charged particles may include detecting beam intensity as a primary charged particle beam moves along a first direction; acquiring a secondary beam spot projection pattern as the primary charged particle beam moves along a second direction; and determining a parameter of a secondary beam spot based on the acquired secondary beam spot projection pattern. A method of compensating for beam spot changes on a detector may include acquiring a beam spot projection pattern on the detector, determining a change of the beam spot projection pattern, and adjusting a parameter of a detector cell of the detector based on the change. Another method may be provided for forming virtual apertures with respect to detector cells of a detector.
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公开(公告)号:US20230335372A1
公开(公告)日:2023-10-19
申请号:US18005031
申请日:2021-07-06
Applicant: ASML Netherlands B.V.
Inventor: Yongxin WANG
IPC: H01J37/244 , G01N23/2251
CPC classification number: H01J37/244 , G01N23/2251 , H01J2237/2441 , H04N5/32
Abstract: A charged particle beam detector may include a circuit with a storage cell configured to receive a signal representing an output of a sensing element; a storage cell multiplexer configured to selectively transmit the signal representing the output of the sensing element to the storage cell; a threshold detector configured to compare the signal representing the output of the sensing element to a threshold; and a converter configured to perform signal processing on a signal transmitted from the storage cell.
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