公开(公告)号：US11243470B2

公开(公告)日：2022-02-08

申请号：US16331547

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish Kumar ,  Adrianus Johannes Hendrikus Schellekens ,  Sietse Thijmen Van Der Post ,  Ferry Zijp ,  Willem Maria Julia Marcel Coene ,  Peter Danny Van Voorst ,  Duygu Akbulut ,  Sarathi Roy

IPC: G03F7/20

Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

公开(公告)号：US10725381B2

公开(公告)日：2020-07-28

申请号：US16117589

申请日：2018-08-30

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen Van Der Post ,  Stefan Michael Bruno Bäumer ,  Peter Danny Van Voorst ,  Teunis Willem Tukker ,  Ferry Zijp ,  Han-Kwang Nienhuys ,  Jacobus Maria Antonius Van Den Eerenbeemd

IPC: G21K1/00 ,  G03F7/20 ,  G21K7/00 ,  G21K1/06 ,  G02B17/04 ,  G01N21/47 ,  G01N21/95

Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.

公开(公告)号：US10248029B2

公开(公告)日：2019-04-02

申请号：US15580500

申请日：2016-07-05

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen Van Der Post ,  Ferry Zijp ,  Sander Bas Roobol

IPC: G03B27/54 ,  G03F7/20

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

公开(公告)号：US11262661B2

公开(公告)日：2022-03-01

申请号：US16431833

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Marinus Petrus Reijnders

IPC: G01N21/956 ,  G03F7/20

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US10578979B2

公开(公告)日：2020-03-03

申请号：US16279001

申请日：2019-02-19

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen Van Der Post ,  Ferry Zijp ,  Sander Bas Roobol

IPC: G03B27/54 ,  G03F7/20

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

公开(公告)号：US10185224B2

公开(公告)日：2019-01-22

申请号：US15569086

申请日：2016-04-19

Applicant: ASML Netherlands B.V.

Inventor： Ferry Zijp ,  Duygu Akbulut ,  Peter Danny Van Voorst ,  Jeroen Johan Maarten Van De Wijdeven ,  Koos Van Berkel

IPC: G03B27/52 ,  G03B27/72 ,  G03F7/20 ,  G02B21/00 ,  G01N21/956 ,  G01B11/14 ,  G02B5/30

Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.