CHEMICAL VAPOR DEPOSITION FLOW INLET ELEMENTS AND METHODS
    12.
    发明申请
    CHEMICAL VAPOR DEPOSITION FLOW INLET ELEMENTS AND METHODS 有权
    化学气相沉积流入元件和方法

    公开(公告)号:US20100143588A1

    公开(公告)日:2010-06-10

    申请号:US12631079

    申请日:2009-12-04

    IPC分类号: C23C16/44 C23C16/00

    摘要: A flow inlet element (22) for a chemical vapor deposition reactor (10) is formed from a plurality of elongated tubular elements (64, 65) extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier (14) rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane (108) extending through the axis.

    摘要翻译: 用于化学气相沉积反应器(10)的流入口元件(22)由多个细长管状元件(64,65)形成,所述多个细长管状元件(64,65)在横向于上游到下游方向的平面中彼此并排延伸 反应堆。 管状元件具有用于沿下游方向喷射气体的入口。 晶片载体(14)围绕上游到下游轴线旋转。 气体分布元件可以提供相对于延伸穿过轴线的中间平面(108)不对称的气体分布图案。

    CHEMICAL VAPOR DEPOSITION FLOW INLET ELEMENTS AND METHODS
    14.
    发明申请
    CHEMICAL VAPOR DEPOSITION FLOW INLET ELEMENTS AND METHODS 有权
    化学气相沉积流入元件和方法

    公开(公告)号:US20120325151A1

    公开(公告)日:2012-12-27

    申请号:US13606130

    申请日:2012-09-07

    IPC分类号: C23C16/458 B05B1/00

    摘要: A flow inlet element (22) for a chemical vapor deposition reactor (10) is formed from a plurality of elongated tubular elements (64, 65) extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier (14) rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane (108) extending through the axis.

    摘要翻译: 用于化学气相沉积反应器(10)的流入口元件(22)由多个细长管状元件(64,65)形成,所述多个细长管状元件(64,65)在横向于上游到下游方向的平面中彼此并排延伸 反应堆。 管状元件具有用于沿下游方向喷射气体的入口。 晶片载体(14)围绕上游到下游轴线旋转。 气体分布元件可以提供相对于延伸穿过轴线的中间平面(108)不对称的气体分布图案。

    Chemical vapor deposition flow inlet elements and methods
    15.
    发明授权
    Chemical vapor deposition flow inlet elements and methods 有权
    化学气相沉积流入口元素及方法

    公开(公告)号:US08303713B2

    公开(公告)日:2012-11-06

    申请号:US12631079

    申请日:2009-12-04

    摘要: A flow inlet element (22) for a chemical vapor deposition reactor (10) is formed from a plurality of elongated tubular elements (64, 65) extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier (14) rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane (108) extending through the axis.

    摘要翻译: 用于化学气相沉积反应器(10)的流入口元件(22)由多个细长管状元件(64,65)形成,所述多个细长管状元件(64,65)在横向于上游到下游方向的平面中彼此并排延伸 反应堆。 管状元件具有用于沿下游方向喷射气体的入口。 晶片载体(14)围绕上游到下游轴线旋转。 气体分布元件可以提供相对于延伸穿过轴线的中间平面(108)不对称的气体分布图案。

    Chemical vapor deposition flow inlet elements and methods
    16.
    发明授权
    Chemical vapor deposition flow inlet elements and methods 有权
    化学气相沉积流入口元素及方法

    公开(公告)号:US08636847B2

    公开(公告)日:2014-01-28

    申请号:US13606130

    申请日:2012-09-07

    IPC分类号: C23C16/00 C23C16/455

    摘要: A flow inlet element (22) for a chemical vapor deposition reactor (10) is formed from a plurality of elongated tubular elements (64, 65) extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier (14) rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane (108) extending through the axis.

    摘要翻译: 用于化学气相沉积反应器(10)的流入口元件(22)由多个细长管状元件(64,65)形成,所述多个细长管状元件(64,65)在横向于上游到下游方向的平面中彼此并排延伸 反应堆。 管状元件具有用于沿下游方向喷射气体的入口。 晶片载体(14)围绕上游到下游轴线旋转。 气体分布元件可以提供相对于延伸穿过轴线的中间平面(108)不对称的气体分布图案。