公开(公告)号：US10857625B2

公开(公告)日：2020-12-08

申请号：US16532011

申请日：2019-08-05

Applicant: Applied Materials, Inc.

Inventor： Gang Peng ,  David W. Groechel ,  Jenn C. Chow ,  Tuochuan Huang ,  Han Wang

IPC: B23K26/352 ,  H01J37/32 ,  B23K26/12

Abstract: A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.

公开(公告)号：US11848218B2

公开(公告)日：2023-12-19

申请号：US17077711

申请日：2020-10-22

Applicant: Applied Materials, Inc.

Inventor： Katty Guyomard ,  Chidambara A. Ramalingam ,  Shawyon Jafari ,  Palash Joshi ,  Moin Ahmed Khan ,  Kirubanandan Naina Shanmugam ,  Subhaschandra Shreepad Salkod ,  Avishek Ghosh ,  David W. Groechel ,  Li Wu ,  Dorothea Buechel-Rimmel

IPC: H01L21/67 ,  B08B3/04

CPC classification number: H01L21/67057 ,  B08B3/048

Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.

公开(公告)号：US20220130692A1

公开(公告)日：2022-04-28

申请号：US17077711

申请日：2020-10-22

Applicant: Applied Materials, Inc.

Inventor： Katty Guyomard ,  Chidambara A. Ramalingam ,  Shawyon Jafari ,  Palash Joshi ,  Moin Ahmed Khan ,  Kirubanandan Naina Shanmugam ,  Subhaschandra Shreepad Salkod ,  Avishek Ghosh ,  David W. Groechel ,  Li Wu ,  Dorothea Buechel-Rimmel

IPC: H01L21/67 ,  B08B3/04

Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.