公开(公告)号：US12077860B2

公开(公告)日：2024-09-03

申请号：US17366832

申请日：2021-07-02

Applicant: Applied Materials, Inc.

Inventor： Andrew Ceballos ,  Ludovic Godet ,  Karl J. Armstrong ,  Rami Hourani

IPC: G02B1/10 ,  C23C16/455 ,  C23C16/56

CPC classification number: C23C16/45563 ,  C23C16/56 ,  G02B1/10

Abstract: Embodiments of the present disclosure generally relate to methods and materials for optical device fabrication. More specifically, embodiments described herein provide for optical film deposition methods and materials to expand the process window for amorphous optical film deposition via incorporation of dopant atoms by suppressing the crystal growth of optical materials during deposition. By enabling amorphous films to be deposited at higher temperatures, significant cost savings and increased throughput are possible.

公开(公告)号：US12044963B2

公开(公告)日：2024-07-23

申请号：US16941304

申请日：2020-07-28

Applicant: Applied Materials, Inc.

Inventor： Amita Joshi ,  Ian Matthew McMackin ,  Rami Hourani ,  Yingdong Luo ,  Sivapackia Ganapathiappan ,  Ludovic Godet

IPC: G03F7/00 ,  B29C59/00 ,  B29C71/02 ,  B29C71/04 ,  C01G23/04 ,  C01G25/02 ,  C01G33/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  B29C59/005 ,  B29C71/02 ,  B29C71/04 ,  C01G23/043 ,  C01G25/02 ,  C01G33/00 ,  B82Y10/00 ,  B82Y40/00 ,  C01P2004/64

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.