公开(公告)号：US20160189912A1

公开(公告)日：2016-06-30

申请号：US14978089

申请日：2015-12-22

Applicant: Axcelis Technologies, Inc.

Inventor： Edward C. Eisner ,  Bo H. Vanderberg

IPC: H01J37/12 ,  H01J37/20 ,  H01J37/05 ,  H01J37/30 ,  H01J37/147

CPC classification number: H01J37/12 ,  H01J37/05 ,  H01J37/1472 ,  H01J37/20 ,  H01J37/30 ,  H01J37/3171 ,  H01J2237/31705

Abstract: A system and method are provided for implanting ions at low energies into a workpiece. An ion source configured to generate an ion beam is provided, wherein a mass resolving magnet is configured to mass resolve the ion beam. The ion beam may be a ribbon beam or a scanned spot ion beam. A mass resolving aperture positioned downstream of the mass resolving magnet filters undesirable species from the ion beam. A combined electrostatic lens system is positioned downstream of the mass analyzer, wherein a path of the ion beam is deflected and contaminants are generally filtered out of the ion beam, while concurrently decelerating and parallelizing the ion beam. A workpiece scanning system is further positioned downstream of the combined electrostatic lens system, and is configured to selectively translate a workpiece in one or more directions through the ion beam, therein implanting ions into the workpiece.

Abstract translation: 提供了一种用于将低能量离子注入工件的系统和方法。 提供了一种被配置为产生离子束的离子源，其中质量分辨磁体构造成质量分辨离子束。 离子束可以是带状束或扫描的点离子束。 位于质量分辨磁体下游的质量分辨孔径从离子束过滤不期望的物质。 组合的静电透镜系统位于质量分析器的下游，其中离子束的路径被偏转并且污染物通常从离子束过滤掉，同时使离子束同时减速和平行化。 工件扫描系统还位于组合的静电透镜系统的下游，并且被配置为在一个或多个方向上选择性地平移通过离子束的工件，其中将离子注入到工件中。