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11.发明授权Patterning process and chemical amplified photoresist with a photodegradable base 有权图案化过程和具有可光降解基底的化学放大光致抗蚀剂公开(公告)号：US08216767B2
公开(公告)日：2012-07-10
申请号：US12555145
申请日：2009-09-08
Applicant: Chien-Wei Wang , Ching-Yu Chang , Tsai-Sheng Gau , Burn Jeng Lin
Inventor： Chien-Wei Wang , Ching-Yu Chang , Tsai-Sheng Gau , Burn Jeng Lin
CPC classification number: G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/12 , Y10S430/128
Abstract: A method for fabricating an integrated circuit device is disclosed. The method includes providing a substrate; forming a first material layer over the substrate; forming a second material layer over the first material layer, wherein the second material layer comprises a photodegradable base material; and exposing at least a portion of the second material layer.
Abstract translation: 公开了一种用于制造集成电路器件的方法。 该方法包括提供基板; 在所述衬底上形成第一材料层; 在所述第一材料层上形成第二材料层，其中所述第二材料层包含可光降解的基材; 并暴露第二材料层的至少一部分。
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公开(公告)号：US08125611B2
公开(公告)日：2012-02-28
申请号：US11762651
申请日：2007-06-13
Applicant: Ching-Yu Chang , Tsai-Sheng Gau , Burn Jeng Lin
Inventor： Ching-Yu Chang , Tsai-Sheng Gau , Burn Jeng Lin
CPC classification number: G03F7/70341
Abstract: Immersion lithography apparatus and method using a shield module are provided. An immersion lithography apparatus including a lens module having an imaging lens, a substrate table positioned beneath the lens module and configured for holding a substrate for processing, a fluid module for providing an immersion fluid to a space between the lens module and the substrate on the substrate table, and a shield module for covering an edge of the substrate during processing.
Abstract translation: 提供了使用屏蔽模块的浸渍光刻设备和方法。 一种浸没式光刻设备，包括具有成像透镜的透镜模块，位于透镜模块下方的被配置用于保持用于处理的基板的基板台，用于在透镜模块和基板之间的空间中提供浸没流体的流体模块 衬底台和用于在处理期间覆盖衬底的边缘的屏蔽模块。
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公开(公告)号：US07986395B2
公开(公告)日：2011-07-26
申请号：US11427421
申请日：2006-06-29
Applicant: Ching-Yu Chang , Burn Jeng Lin , Chin-Hsiang Lin
Inventor： Ching-Yu Chang , Burn Jeng Lin , Chin-Hsiang Lin
IPC: G03B27/42
CPC classification number: G03F7/70925 , G03F7/70341
Abstract: A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and a cleaning module adapted to clean the lithography apparatus. The cleaning module is selected from the group consisting of an ultrasonic unit, a scrubber, a fluid jet, an electrostatic cleaner, and combinations thereof.
Abstract translation: 光刻设备包括成像透镜模块; 位于所述成像透镜模块下方且被配置为保持基板的基板台; 以及适于清洁光刻设备的清洁模块。 清洁模块选自超声波单元，洗涤器，流体射流，静电清洁器及其组合。
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公开(公告)号：US20080203322A1
公开(公告)日：2008-08-28
申请号：US12150955
申请日：2008-05-01
Applicant: Burn-Jeng Lin , Ching-Yu Chang
Inventor： Burn-Jeng Lin , Ching-Yu Chang
IPC: G21G5/00
CPC classification number: G03F7/40 , G03F7/2024
Abstract: A method, tool, and machine for hardening a photoresist image while the photoresist image is immersed in a liquid.
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公开(公告)号：US20080106715A1
公开(公告)日：2008-05-08
申请号：US11671046
申请日：2007-02-05
Applicant: Burn Jeng Lin , Ching-Yu Chang
Inventor： Burn Jeng Lin , Ching-Yu Chang
IPC: G03B27/42
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly, the wafer stage comprising a seal ring disposed on a seal ring frame along a top edge of the wafer retained on the wafer stage, the seal ring for sealing a gap between an edge of the wafer and the wafer stage. The embodiment further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid and a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank; and
Abstract translation: 描述了浸没光刻系统和使用密封晶片底部的方法。 一个实施例是一种浸没光刻设备，其包括透镜组件，该透镜组件包括成像透镜和用于将晶片保持在透镜组件下方的晶片台，晶片台包括沿着晶片的顶部边缘设置在密封环框架上的密封环， 晶片台，用于密封晶片边缘与晶片台之间的间隙的密封环。 该实施例还包括用于保持浸没流体的流体箱，相对于晶片台定位的流体箱，用于使保留在晶片台上的晶片完全浸没在浸没流体中，并且覆盖设置在流体的至少一部分上 罐，用于在流体箱内提供温度控制，流体丰富的环境; 和
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Patent Agency Ranking
公开(公告)号：US20060166143A1
公开(公告)日：2006-07-27
申请号：US11043598
申请日：2005-01-25
Applicant: Burn-Jeng Lin , Ching-Yu Chang
Inventor： Burn-Jeng Lin , Ching-Yu Chang
IPC: G03F7/00
CPC classification number: G03F7/40 , G03F7/2024
Abstract: A method, tool, and machine for hardening a photoresist image while the photoresist image is immersed in a liquid.
Abstract translation: 一种用于在光致抗蚀剂图像浸入液体中时使光致抗蚀剂图像硬化的方法，工具和机器。
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公开(公告)号：US09046789B2
公开(公告)日：2015-06-02
申请号：US13595734
申请日：2012-08-27
Applicant: Burn Jeng Lin , Ching-Yu Chang
Inventor： Burn Jeng Lin , Ching-Yu Chang
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly, the wafer stage comprising a seal ring disposed on a seal ring frame along a top edge of the wafer retained on the wafer stage, the seal ring for sealing a gap between an edge of the wafer and the wafer stage. The embodiment further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid and a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank fluid-rich environment within the fluid tank.
Abstract translation: 描述了浸没光刻系统和使用密封晶片底部的方法。 一个实施例是一种浸没光刻设备，其包括透镜组件，该透镜组件包括成像透镜和用于将晶片保持在透镜组件下方的晶片台，晶片台包括沿着晶片的顶部边缘设置在密封环框架上的密封环， 晶片台，用于密封晶片边缘与晶片台之间的间隙的密封环。 该实施例还包括用于保持浸没流体的流体箱，相对于晶片台定位的流体箱，用于使保留在晶片台上的晶片完全浸没在浸没流体中，并且覆盖设置在流体的至少一部分上 罐，用于在流体箱内的流体槽流体富含环境内提供温度控制的，富含流体的环境。
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公开(公告)号：US20120320351A1
公开(公告)日：2012-12-20
申请号：US13595734
申请日：2012-08-27
Applicant: Burn Jeng Lin , Ching-Yu Chang
Inventor： Burn Jeng Lin , Ching-Yu Chang
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly, the wafer stage comprising a seal ring disposed on a seal ring frame along a top edge of the wafer retained on the wafer stage, the seal ring for sealing a gap between an edge of the wafer and the wafer stage. The embodiment further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid and a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank; and
Abstract translation: 描述了浸没光刻系统和使用密封晶片底部的方法。 一个实施例是一种浸没光刻设备，其包括透镜组件，该透镜组件包括成像透镜和用于将晶片保持在透镜组件下方的晶片台，晶片台包括沿着晶片的顶部边缘设置在密封环框架上的密封环， 晶片台，用于密封晶片边缘与晶片台之间的间隙的密封环。 该实施例还包括用于保持浸没流体的流体箱，相对于晶片台定位的流体箱，用于使保留在晶片台上的晶片完全浸没在浸没流体中，并且覆盖设置在流体的至少一部分上 罐，用于在流体箱内提供温度控制，流体丰富的环境; 和
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公开(公告)号：US20120236276A1
公开(公告)日：2012-09-20
申请号：US13482879
申请日：2012-05-29
Applicant: Burn Jeng Lin , Ching-Yu Chang
Inventor： Burn Jeng Lin , Ching-Yu Chang
IPC: G03B27/52
CPC classification number: G03B27/52 , G03F7/70341
Abstract: Immersion lithography system and method using direction-controlling fluid inlets are described. According to one embodiment of the present disclosure, an immersion lithography apparatus includes a lens assembly having an imaging lens disposed therein and a wafer stage configured to retain a wafer beneath the lens assembly. The apparatus also includes a plurality of direction-controlling fluid inlets disposed adjacent to the lens assembly, each direction-controlling fluid inlet in the plurality of direction-controlling fluid inlets being configured to direct a flow of fluid beneath the lens assembly and being independently controllable with respect to the other fluid inlets in the plurality of direction-controlling fluid inlets.
Abstract translation: 描述了使用方向控制流体入口的浸渍光刻系统和方法。 根据本公开的一个实施例，浸没式光刻设备包括具有设置在其中的成像透镜的透镜组件和被配置为将晶片保持在透镜组件下方的晶片台。 该装置还包括多个方向控制流体入口，其邻近透镜组件设置，多个方向控制流体入口中的每个方向控制流体入口构造成将透镜流体下方的流体引导到透镜组件的下方并且可独立控制 相对于多个方向控制流体入口中的其它流体入口。
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公开(公告)号：US20080309891A1
公开(公告)日：2008-12-18
申请号：US11762651
申请日：2007-06-13
Applicant: Ching-Yu Chang , Tsai-Sheng Gau , Burn Jeng Lin
Inventor： Ching-Yu Chang , Tsai-Sheng Gau , Burn Jeng Lin
IPC: G03B27/52
CPC classification number: G03F7/70341
Abstract: Immersion lithography apparatus and method using a shield module are provided. An immersion lithography apparatus including a lens module having an imaging lens, a substrate table positioned beneath the lens module and configured for holding a substrate for processing, a fluid module for providing an immersion fluid to a space between the lens module and the substrate on the substrate table, and a shield module for covering an edge of the substrate during processing.
Abstract translation: 提供了使用屏蔽模块的浸渍光刻设备和方法。 一种浸没式光刻设备，包括具有成像透镜的透镜模块，位于透镜模块下方的被配置用于保持用于处理的基板的基板台，用于在透镜模块和基板之间的空间中提供浸没流体的流体模块 衬底台和用于在处理期间覆盖衬底的边缘的屏蔽模块。
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