公开(公告)号：US07789545B2

公开(公告)日：2010-09-07

申请号：US12108841

申请日：2008-04-24

Applicant: Yung-Tien Cheng ,  Liang-Ren Huang ,  Chi-Ching Huang ,  Chen-Kang Hsu

Inventor： Yung-Tien Cheng ,  Liang-Ren Huang ,  Chi-Ching Huang ,  Chen-Kang Hsu

IPC: F21S8/10

CPC classification number: F21V11/08 ,  F21S41/24 ,  F21S41/43 ,  F21S41/47

Abstract: A headlight assembly includes a housing, a light source, a light shielding plate, and a light guiding plate. The housing defines a compartment, and includes a reflector and a lens disposed in front of the reflector. The light source is mounted in the compartment and is disposed on an optical axis. The light shielding plate is mounted between the light source and the lens. The light guiding plate is disposed below the optical axis. A first portion of light beams emitted upwardly is reflected by the reflector, passes over the light shielding plate and through the lens, which refracts the first portion of the light beams to form a first illuminating pattern. A second portion of the light beams passes through the light guiding plate and through the lens, which refracts the second portion of the light beams to result in a second illuminating pattern that is directed forwardly and upwardly.

Abstract translation: 头灯组件包括壳体，光源，遮光板和导光板。 壳体限定隔室，并且包括设置在反射器前面的反射器和透镜。 光源安装在隔间内并设置在光轴上。 遮光板安装在光源和透镜之间。 导光板配置在光轴的下方。 向上发射的光束的第一部分被反射器反射，穿过遮光板并穿过透镜，该透镜折射光束的第一部分以形成第一照明图案。 光束的第二部分穿过导光板并穿过透镜，折射光束的第二部分以产生向前和向上指向的第二照明图案。

公开(公告)号：US07669171B2

公开(公告)日：2010-02-23

申请号：US11850513

申请日：2007-09-05

Applicant: Ju-Te Chen ,  Chung-An Chen ,  Chi-Ching Huang ,  Wen-Tsung Wu ,  Shih-Ming Yen

Inventor： Ju-Te Chen ,  Chung-An Chen ,  Chi-Ching Huang ,  Wen-Tsung Wu ,  Shih-Ming Yen

IPC: G06F17/50 ,  G06F19/00

CPC classification number: G03F7/70558 ,  G03F7/705

Abstract: A prediction model for exposure dose is indicated by the following formula, E=E0+EC, wherein E represents an optimized exposure dose, E0 represents a preset exposure dose of a process control system, and EC represents an exposure dose compensation value, and EC=[(MTTdiff/X)/(CDmask/X)]×(ES/A′)×(Wlast+Wavg), wherein MTTdiff represents the differences between the MTT value of a previous lot and the MTT value of a next lot, CDmask represents the actual critical dimension of the mask, X represents the magnification of the mask, ES represents the actual exposure dose of a previous lot, A′ represents an experimental value obtained from the results of different lots, Wlast represents the last batch of weights and Wavg represents an average weight, and CDmask, ES, A′, Wlast and Wavg are set parameters built into the process control system.

Abstract translation: 曝光剂量的预测模型由以下公式表示，E = E0 + EC，其中E表示优化的曝光剂量，E0表示过程控制系统的预设曝光剂量，EC表示曝光剂量补偿值，EC表示曝光剂量补偿值 = [（MTTdiff / X）/（CDmask / X）]×（ES / A'）×（Wlast + Wavg），其中MTTdiff表示先前批次的MTT值与下一批次的MTT值之间的差异， CDmask表示掩模的实际临界尺寸，X表示掩模的放大倍数，ES表示先前批次的实际曝光剂量，A'表示从不同批次的结果获得的实验值，Wlast表示最后一批重量 Wavg代表平均重量，CDmask，ES，A'，Wlast和Wavg是内置到过程控制系统中的参数。

公开(公告)号：US20070030533A1

公开(公告)日：2007-02-08

申请号：US11495559

申请日：2006-07-31

Applicant: Tse-An Lin ,  Chi-Ching Huang

Inventor： Tse-An Lin ,  Chi-Ching Huang

IPC: H04N1/04

CPC classification number: H04N1/00519 ,  H04N1/00997 ,  H04N1/02815 ,  H04N1/1017

Abstract: An image acquisition method for an image acquisition apparatus is provided. The image acquisition method includes the steps of exposing an image acquisition platform and moving an optical module from an initial position to a hiding position. The hiding position is located at an opaque area of the image acquisition platform. The opaque area is used for concealing the light emitted from the optical module. The image acquisition method of the invention prevents the light from reaching and irritating the user's eyes when the user is operating the image acquisition apparatus.

Abstract translation: 提供了一种用于图像获取装置的图像获取方法。 图像获取方法包括曝光图像采集平台并将光学模块从初始位置移动到隐藏位置的步骤。 隐藏位置位于图像采集平台的不透明区域。 不透明区域用于隐藏从光学模块发出的光。 本发明的图像获取方法在用户操作图像采集装置时防止光线到达并刺激用户的眼睛。