Photographic film pre-exposure apparatus and method
    11.
    发明授权
    Photographic film pre-exposure apparatus and method 失效
    摄影胶片预曝光设备及方法

    公开(公告)号:US5794087A

    公开(公告)日:1998-08-11

    申请号:US686806

    申请日:1996-07-26

    IPC分类号: G03B15/08 G03B17/24 G03B41/00

    摘要: Bulk rolls of film are pre-exposed with a latent image of artwork positioned within a film frame. Multiple frames, each having an artwork image portion and an opaque portion, are formed within an imaging filmstrip formed in a continuous loop. The continuous loop is rotated while a portion of the filmstrip is in contact with a portion of the bulk film for transferring the artwork image from the filmstrip to the bulk film. The bulk film is advanced while a light source exposes the film when in contact with the filmstrip. The pre-exposed bulk roll of film is punched at preselected sprocket holes corresponding to the filmstrip length for providing a reference sprocket hole within each length of film cut from the bulk roll for loading within a camera for double exposure of the film and placement of a second latent image in juxtaposition with the artwork.

    摘要翻译: 大片卷的胶片预先暴露在一幅位于胶卷框内的艺术品的潜像。 在连续环形成的成像胶片中形成有多个框架,每个框架具有图形图像部分和不透明部分。 旋转连续环,同时胶片的一部分与散装薄膜的一部分接触,用于将图形图像从胶卷传送到散装薄膜。 当胶片与胶片接触时,光源曝光胶片时,散装胶片前进。 预曝光的胶卷卷片在与预定的胶卷长度相对应的预定链轮孔处冲压,以在从胶卷切割的胶片的每个长度内提供参考链轮孔,以便在相机内装载以便双重曝光胶片并放置 第二个潜在的图像与艺术品并置。

    Method and apparatus for profiling structural sections
    12.
    发明授权
    Method and apparatus for profiling structural sections 失效
    剖面结构剖面的方法和装置

    公开(公告)号:US4495635A

    公开(公告)日:1985-01-22

    申请号:US533626

    申请日:1983-09-19

    申请人: John M. Dobbs

    发明人: John M. Dobbs

    IPC分类号: G01B15/04 G01G9/00 G01B15/02

    CPC分类号: G01B15/04 G01G9/00

    摘要: A system for profiling of structural sections with penetrating radiation in which a head includes a radiation source that projects a fan shaped radiation pattern from one side of the section to be profiled to a diametrically opposite side at which is located an array of detectors. The head is used to detect both attenuation of the rays by the section and the section position, and is not changed or reconfigured for variations in scale. A prior knowledge of the geometric shape of the section permits calculation of total cross-sectional area for weight determination or determination of geometric conformity to a predetermined standard, the calculations being derivable from the individual outputs of the detectors. Compensation for displacement of the profiled article during measurement is also provided.

    摘要翻译: 用于对具有穿透辐射的结构部分进行成形的系统,其中头部包括辐射源,辐射源将扇形辐射图从要成型的部分的一侧突出到位于一组检测器的径向相对侧。 头部用于通过截面和截面位置检测光线的衰减,并且不会因为刻度的变化而改变或重新配置。 对该部分的几何形状的先验知识允许计算用于重量确定或确定与预定标准的几何一致性的总横截面面积,该计算可从检测器的各个输出导出。 还提供了测量期间型材置换的补偿。

    Method for making X-ray anti-scatter grid
    13.
    发明授权
    Method for making X-ray anti-scatter grid 失效
    制造X射线防散射网格的方法

    公开(公告)号:US06807252B1

    公开(公告)日:2004-10-19

    申请号:US10280301

    申请日:2002-10-24

    申请人: John M. Dobbs

    发明人: John M. Dobbs

    IPC分类号: G21K100

    CPC分类号: G21K1/025

    摘要: A method for manufacturing an anti-scatter grid having a desired height. The method includes positioning a bottom surface of a mask of dielectric material, with a depth at least equal to the desired height of the anti-scatter grid, on a sheet of metal, cutting first and second series of intrinsically focused slots through a top surface of the mask to the sheet of metal, plating the sheet of metal at the bottom of each of the slots of the mask with a radiopaque material to form partition walls of the anti-scatter grid, and continuing to plate the radiopaque material into the slots of the mask until the desired height of the anti-scatter grid is achieved.

    摘要翻译: 一种制造具有期望高度的防散射栅格的方法。 该方法包括将电介质材料的掩模的底表面至少等于抗散射栅格的期望高度的深度定位在金属片上,通过顶表面切割第一和第二系列本征聚焦槽 的掩模涂覆到金属板上,用不透射线材料在掩模的每个槽的底部电镀金属片,以形成防散射栅格的分隔壁,并且继续将不透射线材料平板到槽中 从而达到防散射格栅的期望高度。

    Method and apparatus for stabilizing the measurement of CT numbers
    14.
    发明授权
    Method and apparatus for stabilizing the measurement of CT numbers 失效
    用于稳定CT数量测量的方法和装置

    公开(公告)号:US06748043B1

    公开(公告)日:2004-06-08

    申请号:US09982192

    申请日:2001-10-18

    申请人: John M. Dobbs

    发明人: John M. Dobbs

    IPC分类号: G01N2300

    摘要: An apparatus and method is provided for stabilizing CT number calculations by a CT system against fluctuations in the x-ray source voltage due to voltage source drift. A voltage reference level is established, by adjusting the voltage to the value which yields the correct CT number for a sample having a known CT number value. The x-ray energy spectrum measured by a kV meter is used to maintain the voltage constant at this reference level. The kV meter has a principal detector that generates a first intensity magnitude of the x-rays, and an auxiliary detector that generates a second intensity magnitude. The auxiliary detector includes an absorber that preferentially absorbs x-ray photons having a relatively low energy. A feedback controller provides to the voltage source a voltage control signal, which is continuously adjusted as a function of the first and second intensity magnitudes, so as to maintain the voltage constant at the reference level.

    摘要翻译: 提供了一种装置和方法,用于通过CT系统稳定由于电压源漂移引起的x射线源电压波动的CT数计算。 通过将电压调整为产生具有已知CT数值的样品的正确CT数的值来建立电压参考电平。 使用由kV电表测量的x射线能谱用于在该参考水平保持电压恒定。 该kV电表具有产生X射线的第一强度大小的主检测器和产生第二强度量级的辅助检测器。 辅助检测器包括优先吸收具有较低能量的x射线光子的吸收体。 反馈控制器向电压源提供电压控制信号,该电压控制信号作为第一和第二强度幅度的函数被连续调节,以便将电压保持在参考电平。

    Single use camera film pre-exposure method
    15.
    发明授权
    Single use camera film pre-exposure method 失效
    单次使用相机胶片预曝光方法

    公开(公告)号:US5546146A

    公开(公告)日:1996-08-13

    申请号:US229689

    申请日:1994-04-19

    摘要: A method for pre-exposing a variety of latent images onto a filmstrip for use in a single use camera is presented wherein the latent images are in precise registration with subsequent images placed onto the filmstrip. Pre-exposed artwork is positioned to enhance a finished photograph creating a pleasing and interesting photograph without special efforts by a user. An exposure frame opening of the single use camera has a shielded portion in registration with the pre-exposed filmstrip artwork portion of the filmstrip. To place the artwork in proper registration, an imaging filmstrip is formed having an image of the artwork. The artwork image is located using an alignment filmstrip formed using the single use camera itself. The results providing for a subsequent exposure of each frame of the pre-exposed filmstrip having images in pleasing juxtaposition.

    摘要翻译: 提出了一种用于将各种潜像预曝光到用于单次使用相机中的胶卷上的方法,其中潜像与放置在胶片上的后续图像精确配准。 预曝光的艺术品定位,以增强完整的照片,创造一个令人愉快和有趣的照片,没有用户的特别努力。 一次性照相机的曝光框架开口具有与胶片的预曝光胶片贴图部分对准的屏蔽部分。 为了正确地注册艺术品,形成具有艺术品图像的成像胶片。 艺术品图像使用使用单次使用相机本身形成的对准胶片来定位。 该结果提供了曝光前胶片的每个帧的后续曝光,其具有令人愉悦的并置的图像。

    Augmented carbonaceous substrate alteration
    16.
    发明授权
    Augmented carbonaceous substrate alteration 失效
    增强碳质底物改性

    公开(公告)号:US4698236A

    公开(公告)日:1987-10-06

    申请号:US815824

    申请日:1986-01-02

    摘要: Accurately altering a precisely located site on a substrate by: (a) providing a vacuum chamber; (b) providing an energy beam; (c) providing a source of a hydrocarbon and a conduit extending between the source and the chamber, the hydrocarbon being capable of being adsorbed in the substrate and of interacting with the energy beam to alter the substrate; (d) positioning the substrate in the chamber to be exposed to hydrocarbon delivered by the conduit; (e) introducing into the conduit a carrier having a vapor pressure above the vapor pressure of the hydrocarbon, the carrier being in vapor form under conditions existing in the conduit and having a bulk velocity that transports the hydrocarbon by molecular collisions into the chamber, the hydrocarbon being adsorbed on the surface of the substrate, free carrier molecules being drawn off sufficiently rapidly to maintain low pressure in the chamber; and (e) while maintaining the low chamber pressure, directing the energy beam to the site in the presence of the absorbed hydrocarbon, in a manner to convert the hydrocarbon to a coherent carbonaceous deposit of predetermined desired form, adherent to the substrate at the site to render the site opaque. Most preferably, a focused ion beam is used to repair an opaque defect in a photolithographic mask.

    摘要翻译: 通过以下步骤精确地改变基板上的位置:(a)提供真空室; (b)提供能量束; (c)提供烃源和在源和室之间延伸的管道,烃能够被吸附在基底中并与能量束相互作用以改变基底; (d)将基板定位在室中以暴露于由导管输送的烃; (e)将具有高于烃的蒸气压的蒸气压的载体引入导管中,载体在存在于导管中的条件下为蒸汽形式,并具有通过分子碰撞将烃输送到室中的体积速度, 烃被吸附在基材的表面上,游离的载体分子被充分快速地排出以保持室内的低压; 和(e)在保持低室压力的同时,在能量吸收存在的情况下将能量束引导到位置,以将烃转化成预定的所需形式的粘性含碳沉积物,在该位置附着于基底 使网站不透明。 最优选地,聚焦离子束用于修复光刻掩模中的不透明缺陷。