公开(公告)号：US20080153013A1

公开(公告)日：2008-06-26

申请号：US11695620

申请日：2007-04-03

Applicant: Chun-Hao Tung ,  Jui-Yin Chung

Inventor： Chun-Hao Tung ,  Jui-Yin Chung

IPC: G03F5/18

CPC classification number: G03F7/0007 ,  G02F1/133516 ,  G02F1/136209 ,  G02F2001/136222

Abstract: A method of fabricating a color filter layer is provided. First, an active device array substrate having an opaque metal pattern formed thereon is provided. Next, a back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix defining a plurality of pixel regions. Next, a plurality of color filter patterns is formed in the pixel regions.

Abstract translation: 提供了制造滤色器层的方法。 首先，提供其上形成有不透明金属图案的有源器件阵列基板。 接下来，使用不透明金属层作为掩模在有源器件阵列基板上进行背面曝光处理，以形成限定多个像素区域的黑矩阵。 接下来，在像素区域中形成多个滤色器图案。

公开(公告)号：US20070153194A1

公开(公告)日：2007-07-05

申请号：US11563718

申请日：2006-11-28

Applicant: Yeong-Feng Wang ,  Chun-Hao Tung ,  Liang-Bin Yu

Inventor： Yeong-Feng Wang ,  Chun-Hao Tung ,  Liang-Bin Yu

IPC: G02F1/1343

CPC classification number: G02F1/136213 ,  G02F2001/13606

Abstract: A pixel unit comprising a first metal layer and a second metal layer. The first metal layer comprises a gate electrode and a first electrode. The second metal layer comprises a drain electrode, a source electrode, and a second electrode. The drain electrode overlaps the gate electrode in a first overlapping region. The source electrode overlaps the gate electrode in a second overlapping region. The second electrode overlaps the first electrode in a third overlapping region. The size of the first electrode approximates that of the second electrode. The first electrode and the second electrode are staggered.

Abstract translation: 一种像素单元，包括第一金属层和第二金属层。 第一金属层包括栅电极和第一电极。 第二金属层包括漏电极，源电极和第二电极。 漏电极在第一重叠区域与栅电极重叠。 源电极在第二重叠区域与栅电极重叠。 第二电极在第三重叠区域与第一电极重叠。 第一电极的尺寸近似于第二电极的尺寸。 第一电极和第二电极交错。

公开(公告)号：US08178262B2

公开(公告)日：2012-05-15

申请号：US12830425

申请日：2010-07-05

Applicant: Chun-Hao Tung ,  Jui-Yin Chung

Inventor： Chun-Hao Tung ,  Jui-Yin Chung

IPC: G02B5/20

CPC classification number: G03F7/0007 ,  G02F1/133516 ,  G02F1/136209 ,  G02F2001/136222

Abstract: A method of fabricating a color filter layer is provided. An active device array substrate having an opaque metal pattern formed thereon is provided. A planarization layer covering the opaque metal pattern is formed. A back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix thereon, wherein the black matrix defines a plurality of pixel regions. A plurality of color filter patterns is formed in the pixel regions.

Abstract translation: 提供了制造滤色器层的方法。 提供了具有形成在其上的不透明金属图案的有源器件阵列基板。 形成覆盖不透明金属图案的平坦化层。 使用不透明金属层作为掩模在有源器件阵列基板上进行背面曝光处理，以在其上形成黑矩阵，其中黑矩阵限定多个像素区域。 在像素区域中形成多个滤色器图案。

公开(公告)号：US07956961B2

公开(公告)日：2011-06-07

申请号：US12111929

申请日：2008-04-29

Applicant: Chun-Hao Tung ,  Kuo-Yu Huang

Inventor： Chun-Hao Tung ,  Kuo-Yu Huang

IPC: G02F1/1335

CPC classification number: G02F1/133553 ,  G02F1/133555

Abstract: A pixel structure disposed on a substrate having a plurality of protrudent patterns is provided. An area where the protrudent patterns are disposed defines a first display area. The arrangement of the protrudent patterns forms a plurality of arc loci. The arc loci have a same arc center disposed at a corner of the first display area. The abovementioned protrudent patterns avails improvement of a displaying effect of the pixel structure.

Abstract translation: 提供了设置在具有多个凸起图案的基板上的像素结构。 突出图案的布置区域限定第一显示区域。 突出图案的布置形成多个弧形轨迹。 弧形轨迹具有设置在第一显示区域的角落处的相同弧中心。 上述突出图案可以改善像素结构的显示效果。

公开(公告)号：US20110014738A1

公开(公告)日：2011-01-20

申请号：US12923551

申请日：2010-09-28

Applicant: Yeong-Feng Wang ,  Liang-Bin Yu ,  Chih-Jui Pan ,  Chun-Hao Tung

Inventor： Yeong-Feng Wang ,  Liang-Bin Yu ,  Chih-Jui Pan ,  Chun-Hao Tung

IPC: H01L21/84

CPC classification number: H01L27/1288 ,  H01L27/1255

Abstract: Lift-off method and half-tone photolithography are used to fabricate LCD TFT array plate. Only two photo masks are used to respectively define a first and a second metal layers to accomplish the LCD TFT array plate.

Abstract translation: 用于制造LCD TFT阵列板的剥离法和半色调光刻法。 仅使用两个光掩模来分别限定第一和第二金属层以完成LCD TFT阵列板。

公开(公告)号：US07871868B2

公开(公告)日：2011-01-18

申请号：US11907470

申请日：2007-10-12

Applicant: Yeong-Feng Wang ,  Liang-Bin Yu ,  Chih-Jui Pan ,  Chun-Hao Tung

Inventor： Yeong-Feng Wang ,  Liang-Bin Yu ,  Chih-Jui Pan ,  Chun-Hao Tung

IPC: H01L21/00 ,  H01L21/84

CPC classification number: H01L27/1288 ,  H01L27/1255

Abstract: Lift-off method and half-tone photolithography are used to fabricate LCD TFT array plate. Only two photo masks are used to respectively define a first and a second metal layers to accomplish the LCD TFT array plate.

公开(公告)号：US20100291479A1

公开(公告)日：2010-11-18

申请号：US12830425

申请日：2010-07-05

Applicant: Chun-Hao Tung ,  Jui-Yin Chung

Inventor： Chun-Hao Tung ,  Jui-Yin Chung

IPC: G03F7/20

CPC classification number: G03F7/0007 ,  G02F1/133516 ,  G02F1/136209 ,  G02F2001/136222

Abstract: A method of fabricating a color filter layer is provided. An active device array substrate having an opaque metal pattern formed thereon is provided. A planarization layer covering the opaque metal pattern is formed. A back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix thereon, wherein the black matrix defines a plurality of pixel regions. A plurality of color filter patterns is formed in the pixel regions.

Abstract translation: 提供了制造滤色器层的方法。 提供了具有形成在其上的不透明金属图案的有源器件阵列基板。 形成覆盖不透明金属图案的平坦化层。 使用不透明金属层作为掩模在有源器件阵列基板上进行背面曝光处理，以在其上形成黑矩阵，其中黑矩阵限定多个像素区域。 在像素区域中形成多个滤色器图案。

公开(公告)号：US20080213949A1

公开(公告)日：2008-09-04

申请号：US12005289

申请日：2007-12-27

Applicant: Chun-Hao Tung

Inventor： Chun-Hao Tung

IPC: H01L21/84

CPC classification number: H01L27/1288 ,  H01L27/1214

Abstract: A method for manufacturing a substrate for a flat panel display device is disclosed. The present method uses photolithography with four masks to manufacture a TFT-LCD. After the third half-tone mask is used, the manufacturing of the TFTs and the defining of the pixel area of the substrate can be completed. The present method can avoid the alignment deviation and the generation of parasitic capacitance happened on the substrate made through the conventional photolithography with five masks. Therefore, the present method can reduce the costs and increase the yield. Moreover, the substrate for the TFT-LCD made by the present method can define a channel region in the semiconductor layer after the second half-tone mask. Hence, the subsequent manufacturing for forming a transparent conductive layer, a source, and a drain can be achieved by wet etching to effectively reduce the non-homogeneous etching for the channel region in the semiconductor layer.

Abstract translation: 公开了一种用于制造平板显示装置用基板的方法。 本方法使用具有四个掩模的光刻制造TFT-LCD。 在使用第三半色调掩模之后，可以完成TFT的制造和衬底的像素区域的限定。 本方法可以避免通过具有五个掩模的常规光刻制成的衬底上发生的对准偏差和寄生电容的产生。 因此，本方法可以降低成本并提高产量。 此外，通过本方法制造的用于TFT-LCD的衬底可以在第二半色调掩模之后限定半导体层中的沟道区。 因此，用于形成透明导电层，源极和漏极的后续制造可以通过湿式蚀刻来实现，以有效地减少半导体层中的沟道区域的非均匀蚀刻。

公开(公告)号：US20070154816A1

公开(公告)日：2007-07-05

申请号：US11413735

申请日：2006-04-28

Applicant: Chun-Hao Tung

Inventor： Chun-Hao Tung

IPC: G03C5/00 ,  G03F1/00

CPC classification number: G03F1/32 ,  G03F1/50 ,  G03F1/54

Abstract: A mask including a transparent substrate, a semi-transparent layer and a film layer is provided. The transparent substrate at least has a first region, a second region and a third region. The semi-transparent layer covers the second region and the third region of the transparent substrate and exposes the first region. The film layer covers the halftone layer disposed at the third region, to make the transmittance of the third region lower than that of the second region. The halftone layer and the film can be made of phase shift layers, to form a phase shift mask. Besides, several fabrication methods of the mask are also disclosed to form the above-mentioned mask.

Abstract translation: 提供了包括透明基板，半透明层和膜层的掩模。 透明基板至少具有第一区域，第二区域和第三区域。 半透明层覆盖透明基板的第二区域和第三区域并暴露第一区域。 膜层覆盖设置在第三区域的半色调层，以使第三区域的透射率低于第二区域的透射率。 半色调层和膜可以由相移层制成，以形成相移掩模。 此外，还公开了掩模的几种制造方法以形成上述掩模。

公开(公告)号：US20070059611A1

公开(公告)日：2007-03-15

申请号：US11444546

申请日：2006-05-31

Applicant: Chun-Hao Tung ,  Chia-Tsung Lee ,  Hsien-Kai Tseng ,  Horino Shigekazu

Inventor： Chun-Hao Tung ,  Chia-Tsung Lee ,  Hsien-Kai Tseng ,  Horino Shigekazu

IPC: G03C5/00 ,  G03F1/00

CPC classification number: G03F1/32 ,  G03F1/54

Abstract: A mask and a manufacturing method thereof are provided. A transparent substrate having three regions is provided first. A non-transmitting layer is formed in a first region of the transparent substrate. Then, a first photoresist layer is formed on the transparent substrate, and the first photoresist layer exposes a second region of the transparent substrate. Next, a first transmitting layer is formed on the transparent substrate and the first photoresist layer. Finally, the first photoresist layer is removed. The first transmitting layer on the first photoresist layer is removed at the same time and the first transmitting layer in the second region of the transparent substrate is remained and a third region of the transparent substrate is exposed. A lift-off process is used in the mask manufacturing method of the present invention to form the transmitting layer.

Abstract translation: 提供了一种掩模及其制造方法。 首先设置具有三个区域的透明基板。 在透明基板的第一区域中形成非透光层。 然后，在透明基板上形成第一光致抗蚀剂层，第一光致抗蚀剂层露出透明基板的第二区域。 接下来，在透明基板和第一光致抗蚀剂层上形成第一透光层。 最后，去除第一光致抗蚀剂层。 同时去除第一光致抗蚀剂层上的第一透射层，并且保留透明基板的第二区域中的第一透射层，并露出透明基板的第三区域。 在本发明的掩模制造方法中使用剥离处理来形成透射层。