专利检索 ap:("David K. Hanzel" OR "Geoff Otto" OR "Paul Peluso" OR "Thang Pham" OR "David R. Rank" OR "Paul Mitsis" OR "Fred Christians" OR "Arek Bibillo" OR "Insil Park" OR "Sonya Clark" OR "John Lyle") AND inv:"David R. Rank" 第 2 页

11.

发明授权
Articles having localized molecules disposed thereon and methods of producing same 有权

公开(公告)号：US09944980B2

公开(公告)日：2018-04-17

申请号：US11982465

申请日：2007-10-31

申请人： David R. Rank , Jonas Korlach , Yue Xu , Stephen Turner , Jeffery Wegener , Daniel Roitman , John Lyle

发明人： David R. Rank , Jonas Korlach , Yue Xu , Stephen Turner , Jeffery Wegener , Daniel Roitman , John Lyle

IPC分类号： C12Q1/68 , B01J19/00 , B82Y20/00 , B82Y30/00

CPC分类号： C12Q1/6874 , B01J19/0046 , B01J2219/00427 , B01J2219/0045 , B01J2219/00605 , B01J2219/0061 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00635 , B01J2219/00637 , B01J2219/00639 , B01J2219/00659 , B01J2219/00711 , B01J2219/00722 , B82Y20/00 , B82Y30/00 , C12Q1/6837 , Y10T29/49002 , C12Q2565/629 , C12Q2527/127

摘要： Methods of producing substrates having selected active chemical regions by employing elements of the substrates in assisting the localization of active chemical groups in desired regions of the substrate. The methods may include optical, chemical and/or mechanical processes for the deposition, removal, activation and/or deactivation of chemical groups in selected regions of the substrate to provide selective active regions of the substrate.